Inventor
SHIMADA MASAKAZU
JP26 patents
⚠️ This page may combine multiple inventors who share the name “SHIMADA MASAKAZU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI INT ELECTRIC INC
5 patentsUS11293096B2Apr 5, 2022
Substrate processing apparatus, method for manufacturing semiconductor device and vaporizer
HITACHI INT ELECTRIC INC8 citations85
US8030599B2Oct 4, 2011
Substrate processing apparatus, heating device, and semiconductor device manufacturing method
HITACHI INT ELECTRIC INC12 citations84
US9437421B2Sep 6, 2016
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC2 citations62
US7700054B2Apr 20, 2010
Substrate processing apparatus having gas side flow via gas inlet
HITACHI INT ELECTRIC INC5 citations62
US7863204B2Jan 4, 2011
Substrate processing apparatus, heating apparatus for use in the same, method of manufacturing semiconductors with those apparatuses, and heating element supporting structure
HITACHI INT ELECTRIC INC3 citations61
OLYMPUS OPTICAL CO
4 patentsUS6025956AFeb 15, 2000
Incident-light fluorescence microscope
OLYMPUS OPTICAL CO168 citations98
US6563634B2May 13, 2003
Microscope with aberration correcting function
OLYMPUS OPTICAL CO91 citations97
US6043475AMar 28, 2000
Focal point adjustment apparatus and method applied to microscopes
OLYMPUS OPTICAL CO71 citations94
US6034815AMar 7, 2000
Laser scan microscope
OLYMPUS OPTICAL CO5 citations63
UENO MASAAKI
3 patentsUS8501599B2Aug 6, 2013
Substrate processing apparatus and substrate processing method
UENO MASAAKI470 citations97
US8148271B2Apr 3, 2012
Substrate processing apparatus, coolant gas supply nozzle and semiconductor device manufacturing method
UENO MASAAKI22 citations91
US8507296B2Aug 13, 2013
Substrate processing method and film forming method
UENO MASAAKI4 citations60
KOKUSAI ELECTRIC CO LTD
3 patentsUS5735961AApr 7, 1998
Semiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method for generating native oxide
KOKUSAI ELECTRIC CO LTD38 citations92
US5277215AJan 11, 1994
Method for supplying and discharging gas to and from semiconductor manufacturing equipment and system for executing the same
KOKUSAI ELECTRIC CO LTD27 citations87
US5879415AMar 9, 1999
Semiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method for generating native oxide
KOKUSAI ELECTRIC CO LTD11 citations74
KOKUSAI ELECTRIC CORP
3 patentsUS10876207B2Dec 29, 2020
Substrate processing apparatus, liquid precursor replenishment system, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP3 citations72
US11970771B2Apr 30, 2024
Vaporizer, substrate processing apparatus and method for manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations62
US11031270B2Jun 8, 2021
Substrate processing apparatus, substrate holder and mounting tool
KOKUSAI ELECTRIC CORP1 citations62
HAYASHIDA AKIRA
3 patentsUS8158911B2Apr 17, 2012
Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and extending member
HAYASHIDA AKIRA3 citations59
US8116618B2Feb 14, 2012
Heating apparatus, substrate processing apparatus, and method of manufacturing semiconductor devices
HAYASHIDA AKIRA2 citations59
US9184069B2Nov 10, 2015
Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and insulator
HAYASHIDA AKIRA1 citations48