Inventor

TODOROW VALENTIN N

US45 patents

⚠️ This page may combine multiple inventors who share the name “TODOROW VALENTIN N”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TODOROW VALENTIN N

APPLIED MATERIALS INC

Inductively coupled plasma reactor having RF phase control and methods of use thereof

Plasma reactor having a symmetric parallel conductor coil antenna

Plasma reactor having a symmetrical parallel conductor coil antenna

Plasma reactor apparatus with independent capacitive and toroidal plasma sources

Pulsed RF power delivery for plasma processing

Plasma reactor having a symmetrical parallel conductor coil antenna

Plasma reactor having a symmetric parallel conductor coil antenna

Pulsed-voltage hardware assembly for use in a plasma processing system

Plasma reactor having a symmetric parallel conductor coil antenna

Method and apparatus for stable plasma processing

Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution

Pulsed-plasma system with pulsed reaction gas replenish for etching semiconductors structures

Pulsed-plasma system for etching semiconductor structures

Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency

Plasma processing using pulsed-voltage and radio-frequency power

Plasma processing assembly using pulsed-voltage and radio-frequency power

Plasma processing assembly using pulsed-voltage and radio-frequency power

Dual-level pulse tuning

Process for wafer backside polymer removal and wafer front side photoresist removal

Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection

Cathode liner with wafer edge gas injection in a plasma reactor chamber

Plasma processing assembly using pulsed-voltage and radio-frequency power

Method and apparatus for stable plasma processing

Plasma reactor with uniform process rate distribution by improved RF ground return path

Inductively coupled plasma apparatus

Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection

Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density

Processing chamber with substrate edge enhancement processing

Cooling mechanism utilized in a plasma reactor with enhanced temperature regulation

Shielded lid heater assembly

Cooling mechanism utlized in a plasma reactor with enhanced temperature regulation

Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process

Power deposition control in inductively coupled plasma (ICP) reactors

Enhanced plasma source for a plasma reactor

(unassigned)

Plasma reactor having a symmetric parallel conductor coil antenna

Method and apparatus to monitor electrical states at a workpiece in a semiconductor processing chamber

WILLWERTH MICHAEL D

Shielded lid heater assembly

Shielded lid heater assembly

BALAKRISHNA AJIT

Gas flow equalizer plate suitable for use in a substrate process chamber

GRIMBERGEN MICHAEL N

Inductively coupled plasma reactor having RF phase control and methods of use thereof

TODOROW VALENTIN N

Field enhanced inductively coupled plasma (Fe-ICP) reactor

KATZ DAN

Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias

BELEN RODOLFO P

Method to control uniformity using tri-zone showerhead

BANNA SAMER

Methods for calibrating RF power applied to a plurality of RF coils in a plasma processing system

LERAY GARY

Apparatus for forming a magnetic field and methods of use thereof