Inventor

BRCKA JOZEF

US46 patents

⚠️ This page may combine multiple inventors who share the name “BRCKA JOZEF”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BRCKA JOZEF

TOKYO ELECTRON LTD

Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma using an internal inductive element

Embedded plasma source for plasma density improvement

Plasma enhanced atomic layer deposition system and method

Plasma enhanced atomic layer deposition system and method

Ring-shaped high-density plasma source and method

Method and apparatus for ionized physical vapor deposition

Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma

Ionized physical vapor deposition (IPVD) apparatus and method for an inductively coupled plasma sweeping source

Immersed inductively—coupled plasma source

Method and apparatus for ionized physical vapor deposition

Embedded multi-inductive large area plasma source

Control of ion angular distribution function at wafer surface

Solid precursor vaporization system for use in chemical vapor deposition

Method and system for depositing material on a substrate using a solid precursor

Protection of dielectric window in inductively coupled plasma generation

Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma

Inductively-coupled plasma processing system

Method for characterizing the performance of an electrostatic chuck

Etch system with integrated inductive coupling

Highly ionized PVD with moving magnetic field envelope for uniform coverage of feature structure and wafer

Integrated electrostatic inductive coupling for plasma processing

Apparatus and methods for compensating plasma sheath non-uniformities at the substrate in a plasma processing system

Plasma processing system with locally-efficient inductive plasma coupling

Plasma processing system with locally-efficient inductive plasma coupling

Modulated gap segmented antenna for inductively-coupled plasma processing system

Locally-efficient inductive plasma coupling for plasma processing system

Modified transfer function deposition baffles and high density plasma ignition therewith in semiconductor processing

Plasma processing system with locally-efficient inductive plasma coupling

Methods and systems for dielectrophoresis (DEP) separation

Method for saturating a carrier gas with precursor vapor

Selective-redeposition structures for calibrating a plasma process

RLSA CVD deposition control using halogen gas for hydrogen scavenging

Enhanced reliability deposition baffle for iPVD

Ionized PVD with sequential deposition and etching

Method and apparatus for monitoring the thickness of a conductive coating

Poly-phased inductively coupled plasma source

Compact, distributed inductive element for large scale inductively-coupled plasma sources

Selective-redeposition sources for calibrating a plasma process

Method of cleaning the filament and reactor&#39;s interior in FACVD

BRCKA JOZEF

Multi-zone gas distribution system for a treatment system

Control of ion angular distribution function at wafer surface

Plasma fluid modeling with transient to stochastic transformation

Multiple gas plasma forming method and ICP source

System and method for tissue construction using an electric field applicator

Method and device for controlling pattern and structure formation by an electric field

Method and apparatus of distributed plasma processing system for conformal ion stimulated nanoscale deposition process

Method of cleaning the filament and reactor's interior in FACVD