Inventor
HONG SHIH-PING
TW26 patents
⚠️ This page may combine multiple inventors who share the name “HONG SHIH-PING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MACRONIX INT CO LTD
15 patentsUS7183205B2Feb 27, 2007
Method of pitch dimension shrinkage
MACRONIX INT CO LTD195 citations98
US7053406B1May 30, 2006
One-time programmable read only memory and manufacturing method thereof
MACRONIX INT CO LTD20 citations92
US9589979B2Mar 7, 2017
Vertical and 3D memory devices and methods of manufacturing the same
MACRONIX INT CO LTD16 citations84
US7314815B2Jan 1, 2008
Manufacturing method of one-time programmable read only memory
MACRONIX INT CO LTD11 citations84
US9559049B1Jan 31, 2017
Memory device and method of manufacturing the same
MACRONIX INT CO LTD8 citations81
US9905509B2Feb 27, 2018
Inverted-T shaped via for reducing adverse stress-migration effects
MACRONIX INT CO LTD7 citations78
US7279114B1Oct 9, 2007
Method for stabilizing etching performance
MACRONIX INT CO LTD2 citations62
US9418939B2Aug 16, 2016
Contact structure for NAND based non-volatile memory device and a method of manufacture
MACRONIX INT CO LTD2 citations60
US7410593B2Aug 12, 2008
Plasma etching methods using nitrogen memory species for sustaining glow discharge
MACRONIX INT CO LTD0 citations52
US10607848B2Mar 31, 2020
Method of fabricating semiconductor device
MACRONIX INT CO LTD0 citations51
US9953841B2Apr 24, 2018
Semiconductor device and method of fabricating the same
MACRONIX INT CO LTD0 citations51
US9299667B2Mar 29, 2016
Method of shaping densely arranged PL gates and peripheral MOS gates for ILD oxide fill-in
MACRONIX INT CO LTD0 citations50
US7723240B2May 25, 2010
Methods of low temperature oxidation
MACRONIX INT CO LTD1 citations48
US7960835B2Jun 14, 2011
Fabrication of metal film stacks having improved bottom critical dimension
MACRONIX INT CO LTD0 citations47
US9825052B2Nov 21, 2017
Memory device and method of forming the same
MACRONIX INT CO LTD0 citations39
TAIWAN SEMICONDUCTOR MFG CO LTD
4 patentsUS9985023B1May 29, 2018
Structure and formation method of semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD51 citations92
US9595448B2Mar 14, 2017
Method for cleaning plasma processing chamber and substrate
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10020184B2Jul 10, 2018
Method for cleaning substrate
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US11404250B2Aug 2, 2022
Plasma etcher edge ring with a chamfer geometry and impedance design
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations46