Inventor
ENDO KOTARO
JP49 patents
⚠️ This page may combine multiple inventors who share the name “ENDO KOTARO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
19 patentsUS9703653B2Jul 11, 2017
Cloud system management apparatus, cloud system, reallocation method, and computer program product
TOSHIBA KK24 citations94
US6721863B1Apr 13, 2004
Disk control mechanism preferable for random disk write
TOSHIBA KK39 citations92
US5978939ANov 2, 1999
Timeout monitoring system
TOSHIBA KK64 citations92
US7171465B1Jan 30, 2007
Method for determining a server computer which carried out a process most recently, and high availability computer system
TOSHIBA KK10 citations84
US6799222B1Sep 28, 2004
Method for synchronizing program applied to distributed computer system
TOSHIBA KK13 citations84
US6073126AJun 6, 2000
Multi-computer system capable of abstractly and integrally describing system configuration and control contents
TOSHIBA KK16 citations77
US7620845B2Nov 17, 2009
Distributed system and redundancy control method
TOSHIBA KK4 citations63
US7272632B2Sep 18, 2007
Distributed system and multiplexing control method for the system
TOSHIBA KK5 citations63
US12309280B2May 20, 2025
Tampering validation method and tampering validation system
TOSHIBA KK0 citations52
US11461118B2Oct 4, 2022
Flow-based programming environment for persistent execution and recovery
TOSHIBA KK0 citations52
US11424935B2Aug 23, 2022
Tampering detection system and method for detecting tampering
TOSHIBA KK0 citations52
US12399951B2Aug 26, 2025
Information processing device, non-transitory storage medium, information processing method and electronic circuit
TOSHIBA KK0 citations51
US12033090B2Jul 9, 2024
Information processing device, PUBO solver, information processing method and non-transitory storage medium
TOSHIBA KK0 citations50
US10514850B2Dec 24, 2019
Information processing system, server device, Information processing method, and computer program product
TOSHIBA KK0 citations42
US10489239B2Nov 26, 2019
Multiplexing system, multiplexing method, and computer program product
TOSHIBA KK0 citations42
US10303565B2May 28, 2019
Multicasting system voting on server data
TOSHIBA KK0 citations42
US10165086B2Dec 25, 2018
Information processing system, server apparatus, information processing method, and computer program product
TOSHIBA KK0 citations42
US10162719B2Dec 25, 2018
Ordering device, data processing device, ordering method, computer program product, and multiplex system
TOSHIBA KK0 citations42
US7523113B2Apr 21, 2009
Distributed system, computer and state transition control method for distributed system
TOSHIBA KK0 citations42
TOKYO OHKA KOGYO CO LTD
18 patentsUS7264918B2Sep 4, 2007
Resist composition for liquid immersion exposure process and method of forming resist pattern therewith
TOKYO OHKA KOGYO CO LTD69 citations97
US7879529B2Feb 1, 2011
Material for formation of resist protection film and method of forming resist pattern therewith
TOKYO OHKA KOGYO CO LTD37 citations91
US7846637B2Dec 7, 2010
Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective film
TOKYO OHKA KOGYO CO LTD40 citations91
US9851637B2Dec 26, 2017
Resist composition, method of forming resist pattern, compound, and acid diffusion control agent
TOKYO OHKA KOGYO CO LTD7 citations83
US6683202B2Jan 27, 2004
Fluorine-containing monomeric ester compound for base resin in photoresist composition
TOKYO OHKA KOGYO CO LTD8 citations74
US8795947B2Aug 5, 2014
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations73
US7799507B2Sep 21, 2010
Positive resist composition for immersion lithography and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD6 citations63
US10180625B2Jan 15, 2019
Resist composition, method of forming resist pattern, compound, and acid diffusion control agent
TOKYO OHKA KOGYO CO LTD1 citations62
US7592122B2Sep 22, 2009
Photoresist composition, and low-molecular compound and high-molecular compound for the photoresist composition
TOKYO OHKA KOGYO CO LTD3 citations62
US7326512B2Feb 5, 2008
Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound
TOKYO OHKA KOGYO CO LTD4 citations62
US7951523B2May 31, 2011
Material for forming resist protective film and method for forming resist pattern using same
TOKYO OHKA KOGYO CO LTD2 citations61
US6846949B2Jan 25, 2005
Fluorine-containing monomeric ester compound for base resin in photoresist composition
TOKYO OHKA KOGYO CO LTD0 citations52
US10921711B2Feb 16, 2021
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations50
US9244357B2Jan 26, 2016
Method for forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations41
US7700257B2Apr 20, 2010
Photoresist composition and resist pattern formation method by the use thereof
TOKYO OHKA KOGYO CO LTD0 citations41
US10627717B2Apr 21, 2020
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations39
US9890233B2Feb 13, 2018
Resist composition, method of forming resist pattern, and polymeric compound
TOKYO OHKA KOGYO CO LTD0 citations39
US9682951B2Jun 20, 2017
Resist composition, method of forming resist pattern, acid generator, photoreactive quencher, and compound
TOKYO OHKA KOGYO CO LTD0 citations38