P

Inventor

WATANABE SATOSHI

423 patents
⚠️ This page may combine multiple inventors who share the name “WATANABE SATOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHINETSU CHEMICAL CO

18 patents
US5942367AAug 24, 1999

Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group

SHINETSU CHEMICAL CO91 citations99
US7303855B2Dec 4, 2007

Photoresist undercoat-forming material and patterning process

SHINETSU CHEMICAL CO85 citations98
US6440634B1Aug 27, 2002

Onium salts, photoacid generators for resist compositions, resist compositions, and patterning process

SHINETSU CHEMICAL CO76 citations96
US5876900AMar 2, 1999

Chemically amplified positive resist composition

SHINETSU CHEMICAL CO68 citations96
US5880169AMar 9, 1999

Sulfonium salts and chemically amplified positive resist compositions

SHINETSU CHEMICAL CO59 citations95
US8361693B2Jan 29, 2013

Chemically amplified positive photoresist composition and pattern forming process

SHINETSU CHEMICAL CO32 citations93
US7090961B2Aug 15, 2006

Photo acid generator, chemical amplification resist material and pattern formation method

SHINETSU CHEMICAL CO18 citations93
US6703183B2Mar 9, 2004

Polymer, resist composition and patterning process

SHINETSU CHEMICAL CO23 citations93
US6605408B2Aug 12, 2003

Resist composition and patterning process

SHINETSU CHEMICAL CO29 citations93
US6416928B1Jul 9, 2002

Onium salts, photoacid generators, resist compositions, and patterning process

SHINETSU CHEMICAL CO41 citations93
US6338931B1Jan 15, 2002

Resist compositions and patterning process

SHINETSU CHEMICAL CO35 citations93
US6312869B1Nov 6, 2001

Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group

SHINETSU CHEMICAL CO20 citations93
US6114462ASep 5, 2000

Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group

SHINETSU CHEMICAL CO28 citations93
US6106993AAug 22, 2000

Chemically amplified positive resist composition

SHINETSU CHEMICAL CO44 citations93
US6027854AFeb 22, 2000

Polymers chemically amplified positive resist compositions, and patterning method

SHINETSU CHEMICAL CO21 citations93
US5972559AOct 26, 1999

Chemically amplified positive resist compositions

SHINETSU CHEMICAL CO20 citations93
US7501223B2Mar 10, 2009

Polymer, resist composition and patterning process using the same

SHINETSU CHEMICAL CO20 citations92
US6156477ADec 5, 2000

Polymers and chemically amplified positive resist compositions

SHINETSU CHEMICAL CO33 citations92

FUJITSU LTD

3 patents

TOSHIBA SILICONE

3 patents

AGILENT TECHNOLOGIES INC

2 patents

HONDA MOTOR CO LTD

2 patents

PHILIPS LUMILEDS LIGHTING CO

2 patents

SHIMANO KK

2 patents

OKAYA ELECTRIC INDUSTRY CO

2 patents

CANON KK

2 patents

SEIKO INSTR INC

2 patents

WATANABE SATOSHI

2 patents

HIROSE ELECTRIC CO LTD

2 patents

YAMAGUCHI SHINGO

1 patent

KUMIAI CHEMICAL INDUSTRY CO

1 patent

SHI ETSU CHEMICAL CO LTD

1 patent

GUNZE KK

1 patent

LUMILEDS LIGHTING LLC

1 patent

HITCHI LTD

1 patent

CHORAKU KOHEI

1 patent

OKI ELECTRIC IND CO LTD

1 patent

Showing the top 50 of 423 patents by PatentIndex Score.