Inventor
WATANABE SATOSHI
423 patents
⚠️ This page may combine multiple inventors who share the name “WATANABE SATOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
18 patentsUS5942367AAug 24, 1999
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
SHINETSU CHEMICAL CO91 citations99
US7303855B2Dec 4, 2007
Photoresist undercoat-forming material and patterning process
SHINETSU CHEMICAL CO85 citations98
US6440634B1Aug 27, 2002
Onium salts, photoacid generators for resist compositions, resist compositions, and patterning process
SHINETSU CHEMICAL CO76 citations96
US5876900AMar 2, 1999
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO68 citations96
US5880169AMar 9, 1999
Sulfonium salts and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO59 citations95
US8361693B2Jan 29, 2013
Chemically amplified positive photoresist composition and pattern forming process
SHINETSU CHEMICAL CO32 citations93
US7090961B2Aug 15, 2006
Photo acid generator, chemical amplification resist material and pattern formation method
SHINETSU CHEMICAL CO18 citations93
US6703183B2Mar 9, 2004
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO23 citations93
US6605408B2Aug 12, 2003
Resist composition and patterning process
SHINETSU CHEMICAL CO29 citations93
US6416928B1Jul 9, 2002
Onium salts, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO41 citations93
US6338931B1Jan 15, 2002
Resist compositions and patterning process
SHINETSU CHEMICAL CO35 citations93
US6312869B1Nov 6, 2001
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
SHINETSU CHEMICAL CO20 citations93
US6114462ASep 5, 2000
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
SHINETSU CHEMICAL CO28 citations93
US6106993AAug 22, 2000
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO44 citations93
US6027854AFeb 22, 2000
Polymers chemically amplified positive resist compositions, and patterning method
SHINETSU CHEMICAL CO21 citations93
US5972559AOct 26, 1999
Chemically amplified positive resist compositions
SHINETSU CHEMICAL CO20 citations93
US7501223B2Mar 10, 2009
Polymer, resist composition and patterning process using the same
SHINETSU CHEMICAL CO20 citations92
US6156477ADec 5, 2000
Polymers and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO33 citations92
FUJITSU LTD
3 patentsUS9791893B2Oct 17, 2017
Electronic device and method of assembling the electronic device
FUJITSU LTD23 citations93
US9167876B2Oct 27, 2015
Waterproofing case and method of manufacturing waterproofing case
FUJITSU LTD31 citations93
US6444923B1Sep 3, 2002
Method of connecting printed wiring boards with each other, and printed circuit board
FUJITSU LTD30 citations92
TOSHIBA SILICONE
3 patentsAGILENT TECHNOLOGIES INC
2 patentsHONDA MOTOR CO LTD
2 patentsPHILIPS LUMILEDS LIGHTING CO
2 patentsSHIMANO KK
2 patentsOKAYA ELECTRIC INDUSTRY CO
2 patentsCANON KK
2 patentsSEIKO INSTR INC
2 patentsWATANABE SATOSHI
2 patentsHIROSE ELECTRIC CO LTD
2 patentsYAMAGUCHI SHINGO
1 patentKUMIAI CHEMICAL INDUSTRY CO
1 patentSHI ETSU CHEMICAL CO LTD
1 patentGUNZE KK
1 patentLUMILEDS LIGHTING LLC
1 patentHITCHI LTD
1 patentCHORAKU KOHEI
1 patentOKI ELECTRIC IND CO LTD
1 patentShowing the top 50 of 423 patents by PatentIndex Score.