Inventor
SCUDDER LANCE
US23 patents
⚠️ This page may combine multiple inventors who share the name “SCUDDER LANCE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MIE FUJITSU SEMICONDUCTOR LTD
8 patentsUS9299698B2Mar 29, 2016
Semiconductor structure with multiple transistors having various threshold voltages
MIE FUJITSU SEMICONDUCTOR LTD7 citations83
US9112057B1Aug 18, 2015
Semiconductor devices with dopant migration suppression and method of fabrication thereof
MIE FUJITSU SEMICONDUCTOR LTD17 citations83
US9105711B2Aug 11, 2015
Semiconductor structure with reduced junction leakage and method of fabrication thereof
MIE FUJITSU SEMICONDUCTOR LTD0 citations52
US10217838B2Feb 26, 2019
Semiconductor structure with multiple transistors having various threshold voltages
MIE FUJITSU SEMICONDUCTOR LTD0 citations51
US10014387B2Jul 3, 2018
Semiconductor structure with multiple transistors having various threshold voltages
MIE FUJITSU SEMICONDUCTOR LTD0 citations51
US9812550B2Nov 7, 2017
Semiconductor structure with multiple transistors having various threshold voltages
MIE FUJITSU SEMICONDUCTOR LTD0 citations51
US9793172B2Oct 17, 2017
Reducing or eliminating pre-amorphization in transistor manufacture
MIE FUJITSU SEMICONDUCTOR LTD0 citations51
US9391076B1Jul 12, 2016
CMOS structures and processes based on selective thinning
MIE FUJITSU SEMICONDUCTOR LTD1 citations51
APPLIED MATERIALS INC
7 patentsUS6562720B2May 13, 2003
Apparatus and method for surface finishing a silicon film
APPLIED MATERIALS INC99 citations95
US6489241B1Dec 3, 2002
Apparatus and method for surface finishing a silicon film
APPLIED MATERIALS INC110 citations95
US5198071AMar 30, 1993
Process for inhibiting slip and microcracking while forming epitaxial layer on semiconductor wafer
APPLIED MATERIALS INC65 citations95
US6774040B2Aug 10, 2004
Apparatus and method for surface finishing a silicon film
APPLIED MATERIALS INC16 citations79
US11348783B2May 31, 2022
Methods and apparatus for dynamical control of radial uniformity with two-story microwave cavities
APPLIED MATERIALS INC1 citations62
US11378511B2Jul 5, 2022
Methods and apparatus for detecting corrosion of conductive objects
APPLIED MATERIALS INC0 citations59
US11355317B2Jun 7, 2022
Methods and apparatus for dynamical control of radial uniformity in microwave chambers
APPLIED MATERIALS INC0 citations52
SCUDDER LANCE
3 patentsUS8569156B1Oct 29, 2013
Reducing or eliminating pre-amorphization in transistor manufacture
SCUDDER LANCE25 citations90
US8999861B1Apr 7, 2015
Semiconductor structure with substitutional boron and method for fabrication thereof
SCUDDER LANCE5 citations71
US8778786B1Jul 15, 2014
Method for substrate preservation during transistor fabrication
SCUDDER LANCE4 citations71