Inventor
WANG CHENG-TE
TW19 patents
⚠️ This page may combine multiple inventors who share the name “WANG CHENG-TE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNITED MICROELECTRONICS CORP
10 patentsUS8701052B1Apr 15, 2014
Method of optical proximity correction in combination with double patterning technique
UNITED MICROELECTRONICS CORP7 citations83
US8627242B1Jan 7, 2014
Method for making photomask layout
UNITED MICROELECTRONICS CORP9 citations83
US9104833B2Aug 11, 2015
Mask set for double exposure process and method of using the mask set
UNITED MICROELECTRONICS CORP5 citations71
US9047658B2Jun 2, 2015
Method of optical proximity correction
UNITED MICROELECTRONICS CORP4 citations71
US9785046B2Oct 10, 2017
Pattern verifying method
UNITED MICROELECTRONICS CORP4 citations67
US8383299B2Feb 26, 2013
Double patterning mask set and method of forming thereof
UNITED MICROELECTRONICS CORP3 citations60
US9171898B2Oct 27, 2015
Method for manufacturing semiconductor layout pattern, method for manufacturing semiconductor device, and semiconductor device
UNITED MICROELECTRONICS CORP0 citations50
US8745547B1Jun 3, 2014
Method for making photomask layout
UNITED MICROELECTRONICS CORP0 citations50
US9262820B2Feb 16, 2016
Method and apparatus for integrated circuit design
UNITED MICROELECTRONICS CORP0 citations40
US10474026B2Nov 12, 2019
Method for correcting bevel corners of a layout pattern
UNITED MICROELECTRONICS CORP0 citations35