Inventor

OR DAVID T

US20 patents

⚠️ This page may combine multiple inventors who share the name “OR DAVID T”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

OR DAVID T

APPLIED MATERIALS INC

300 mm CVD chamber design for metal-organic thin film deposition

Silicon oxide recess etch

Reduced friction lift pin

Magnetron with cooling system for process chamber of processing system

Substrate support lift pin

Substrate support lift mechanism

Directional SiO2 etch using plasma pre-treatment and high-temperature etchant deposition

Directional SiO2 etch using plasma pre-treatment and high-temperature etchant deposition

Directional SIO2 etch using low-temperature etchant deposition and plasma post-treatment

Multi-step pre-clean for selective metal gap fill

Multi-step pre-clean for selective metal gap fill

Method for forming a metal gapfill

Directional SiO2 etch using plasma pre-treatment and high-temperature etchant deposition

Directional SiO2 etch using low-temperature etchant deposition and plasma post-treatment

Direct real-time monitoring and feedback control of RF plasma output for wafer processing

Plasma cleaning apparatus and method

Method of forming a MEOL contact structure

KAO CHIEN-TEH

Process chamber lid design with built-in plasma source for short lifetime species

LU XINLIANG

Selective etching of silicon nitride

DEEHAN MARTIN

Plasma cleaning apparatus and method