Inventor
VOKOUN EDWARD
US2 patents
Patents
2 patentsUS7396617B2Jul 8, 2008
Photomask reticle having multiple versions of the same mask pattern with different biases
PHOTRONICS INC6 citations64
US7435533B2Oct 14, 2008
Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases
PHOTRONICS INC3 citations53