P

Inventor

MAKIYAMA KOZO

JP73 patents
⚠️ This page may combine multiple inventors who share the name “MAKIYAMA KOZO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUJITSU LTD

40 patents
US7718541B2May 18, 2010

Method of processing resist, semiconductor device, and method of producing the same

FUJITSU LTD34 citations92
US7429446B2Sep 30, 2008

Resist pattern forming method and semiconductor device fabrication method

FUJITSU LTD19 citations92
US5818078AOct 6, 1998

Semiconductor device having a regrowth crystal region

FUJITSU LTD20 citations92
US6717271B2Apr 6, 2004

Semiconductor device with mushroom electrode and manufacture method thereof

FUJITSU LTD18 citations90
US10263103B2Apr 16, 2019

Semiconductor apparatus

FUJITSU LTD7 citations84
US8916459B2Dec 23, 2014

Compound semiconductor device with mesa structure

FUJITSU LTD9 citations84
US7419894B2Sep 2, 2008

Gate electrode and manufacturing method thereof, and semiconductor device and manufacturing method thereof

FUJITSU LTD7 citations74
US11024730B2Jun 1, 2021

Nitride semiconductor device and manufacturing method for the same

FUJITSU LTD2 citations73
US10992269B2Apr 27, 2021

Compound semiconductor device with high power and reduced off-leakage and method for manufacturing the same

FUJITSU LTD3 citations73
US9412830B2Aug 9, 2016

Semiconductor device and method of manufacturing semiconductor device

FUJITSU LTD3 citations73
US6784036B2Aug 31, 2004

Method for making semiconductor device

FUJITSU LTD10 citations70
US6620716B2Sep 16, 2003

Method for making semiconductor device

FUJITSU LTD6 citations70
US9324821B2Apr 26, 2016

Compound semiconductor device and manufacturing method of the same

FUJITSU LTD2 citations63
US7948062B2May 24, 2011

Semiconductor device and method for manufacturing semiconductor device

FUJITSU LTD6 citations63
US7906417B2Mar 15, 2011

Compound semiconductor device with T-shaped gate electrode and its manufacture

FUJITSU LTD4 citations63
US7220628B2May 22, 2007

Semiconductor device and manufacturing method thereof, and gate electrode and manufacturing method thereof

FUJITSU LTD5 citations63
US11094813B2Aug 17, 2021

Compound semiconductor device, method of manufacturing compound semiconductor device, and amplifier

FUJITSU LTD0 citations62
US10916645B2Feb 9, 2021

Compound semiconductor device including protective layer and ohmic electrode

FUJITSU LTD0 citations62
US10796917B2Oct 6, 2020

Method for manufacturing gate insulator for HEMT

FUJITSU LTD1 citations62
US10964805B2Mar 30, 2021

Compound semiconductor device

FUJITSU LTD0 citations60
US7335542B2Feb 26, 2008

Semiconductor device with mushroom electrode and manufacture method thereof

FUJITSU LTD2 citations60
US11688663B2Jun 27, 2023

Semiconductor device, semiconductor device fabrication method, and electronic device

FUJITSU LTD0 citations59
US12283922B2Apr 22, 2025

Manufacturing method for compound semiconductor device

FUJITSU LTD0 citations52
US11646366B2May 9, 2023

Semiconductor device

FUJITSU LTD0 citations52
US10804358B2Oct 13, 2020

Compound semiconductor device and method with high concentration dopant layer in regrown compound semiconductor

FUJITSU LTD0 citations52
US10727305B2Jul 28, 2020

Semiconductor device and fabrication method therefor, and high-frequency amplifier

FUJITSU LTD0 citations52
US10312094B2Jun 4, 2019

AlOx/InOx gate insulator for HEMT

FUJITSU LTD0 citations52
US10217829B2Feb 26, 2019

Compound semiconductor device including diffusion preventing layer to suppress current collapse phenomenon, method of manufacturing compound semiconductor device, power supply unit, and amplifier

FUJITSU LTD0 citations52
US10002942B2Jun 19, 2018

Semiconductor device and method of manufacturing semiconductor device

FUJITSU LTD0 citations52
US9941401B2Apr 10, 2018

Semiconductor device, power supply apparatus and high-frequency amplifier

FUJITSU LTD0 citations52
US9779933B2Oct 3, 2017

Semiconductor device and method of manufacturing semiconductor device

FUJITSU LTD0 citations52
US9722037B2Aug 1, 2017

Compound semiconductor device and manufacturing method of the same

FUJITSU LTD0 citations52
US9647084B2May 9, 2017

Semiconductor device and method of manufacturing the same

FUJITSU LTD0 citations52
US9548383B2Jan 17, 2017

HEMT with a metal film between the gate electrode and the drain electrode

FUJITSU LTD0 citations52
US9514930B2Dec 6, 2016

Method for manufacturing semiconductor HEMT device with stoichiometric silicon nitride layer

FUJITSU LTD0 citations52
US9496222B2Nov 15, 2016

Semiconductor device including insulating films with different moisture resistances and fabrication method thereof

FUJITSU LTD0 citations52
US9368359B2Jun 14, 2016

Method of manufacturing compound semiconductor device

FUJITSU LTD1 citations52
US9257514B2Feb 9, 2016

Semiconductor device with plural electrodes formed on substrate

FUJITSU LTD0 citations52
US9224668B2Dec 29, 2015

Semiconductor HEMT device with stoichiometric silicon nitride layer

FUJITSU LTD0 citations52
US9184273B2Nov 10, 2015

Compound semiconductor device and method of manufacturing the same

FUJITSU LTD0 citations52

MAKIYAMA KOZO

5 patents

KANAMURA MASAHITO

1 patent

EUDYNA DEVICES INC

1 patent

OHKI TOSHIHIRO

1 patent

FUJITSU QUANTUM DEVICES LTD

1 patent

KURAHASHI NAOKO

1 patent

Showing the top 50 of 73 patents by PatentIndex Score.