Inventor
MAKIYAMA KOZO
JP73 patents
⚠️ This page may combine multiple inventors who share the name “MAKIYAMA KOZO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJITSU LTD
40 patentsUS7718541B2May 18, 2010
Method of processing resist, semiconductor device, and method of producing the same
FUJITSU LTD34 citations92
US7429446B2Sep 30, 2008
Resist pattern forming method and semiconductor device fabrication method
FUJITSU LTD19 citations92
US5818078AOct 6, 1998
Semiconductor device having a regrowth crystal region
FUJITSU LTD20 citations92
US6717271B2Apr 6, 2004
Semiconductor device with mushroom electrode and manufacture method thereof
FUJITSU LTD18 citations90
US10263103B2Apr 16, 2019
Semiconductor apparatus
FUJITSU LTD7 citations84
US8916459B2Dec 23, 2014
Compound semiconductor device with mesa structure
FUJITSU LTD9 citations84
US7419894B2Sep 2, 2008
Gate electrode and manufacturing method thereof, and semiconductor device and manufacturing method thereof
FUJITSU LTD7 citations74
US11024730B2Jun 1, 2021
Nitride semiconductor device and manufacturing method for the same
FUJITSU LTD2 citations73
US10992269B2Apr 27, 2021
Compound semiconductor device with high power and reduced off-leakage and method for manufacturing the same
FUJITSU LTD3 citations73
US9412830B2Aug 9, 2016
Semiconductor device and method of manufacturing semiconductor device
FUJITSU LTD3 citations73
US6784036B2Aug 31, 2004
Method for making semiconductor device
FUJITSU LTD10 citations70
US6620716B2Sep 16, 2003
Method for making semiconductor device
FUJITSU LTD6 citations70
US9324821B2Apr 26, 2016
Compound semiconductor device and manufacturing method of the same
FUJITSU LTD2 citations63
US7948062B2May 24, 2011
Semiconductor device and method for manufacturing semiconductor device
FUJITSU LTD6 citations63
US7906417B2Mar 15, 2011
Compound semiconductor device with T-shaped gate electrode and its manufacture
FUJITSU LTD4 citations63
US7220628B2May 22, 2007
Semiconductor device and manufacturing method thereof, and gate electrode and manufacturing method thereof
FUJITSU LTD5 citations63
US11094813B2Aug 17, 2021
Compound semiconductor device, method of manufacturing compound semiconductor device, and amplifier
FUJITSU LTD0 citations62
US10916645B2Feb 9, 2021
Compound semiconductor device including protective layer and ohmic electrode
FUJITSU LTD0 citations62
US10796917B2Oct 6, 2020
Method for manufacturing gate insulator for HEMT
FUJITSU LTD1 citations62
US10964805B2Mar 30, 2021
Compound semiconductor device
FUJITSU LTD0 citations60
US7335542B2Feb 26, 2008
Semiconductor device with mushroom electrode and manufacture method thereof
FUJITSU LTD2 citations60
US11688663B2Jun 27, 2023
Semiconductor device, semiconductor device fabrication method, and electronic device
FUJITSU LTD0 citations59
US12283922B2Apr 22, 2025
Manufacturing method for compound semiconductor device
FUJITSU LTD0 citations52
US11646366B2May 9, 2023
Semiconductor device
FUJITSU LTD0 citations52
US10804358B2Oct 13, 2020
Compound semiconductor device and method with high concentration dopant layer in regrown compound semiconductor
FUJITSU LTD0 citations52
US10727305B2Jul 28, 2020
Semiconductor device and fabrication method therefor, and high-frequency amplifier
FUJITSU LTD0 citations52
US10312094B2Jun 4, 2019
AlOx/InOx gate insulator for HEMT
FUJITSU LTD0 citations52
US10217829B2Feb 26, 2019
Compound semiconductor device including diffusion preventing layer to suppress current collapse phenomenon, method of manufacturing compound semiconductor device, power supply unit, and amplifier
FUJITSU LTD0 citations52
US10002942B2Jun 19, 2018
Semiconductor device and method of manufacturing semiconductor device
FUJITSU LTD0 citations52
US9941401B2Apr 10, 2018
Semiconductor device, power supply apparatus and high-frequency amplifier
FUJITSU LTD0 citations52
US9779933B2Oct 3, 2017
Semiconductor device and method of manufacturing semiconductor device
FUJITSU LTD0 citations52
US9722037B2Aug 1, 2017
Compound semiconductor device and manufacturing method of the same
FUJITSU LTD0 citations52
US9647084B2May 9, 2017
Semiconductor device and method of manufacturing the same
FUJITSU LTD0 citations52
US9548383B2Jan 17, 2017
HEMT with a metal film between the gate electrode and the drain electrode
FUJITSU LTD0 citations52
US9514930B2Dec 6, 2016
Method for manufacturing semiconductor HEMT device with stoichiometric silicon nitride layer
FUJITSU LTD0 citations52
US9496222B2Nov 15, 2016
Semiconductor device including insulating films with different moisture resistances and fabrication method thereof
FUJITSU LTD0 citations52
US9368359B2Jun 14, 2016
Method of manufacturing compound semiconductor device
FUJITSU LTD1 citations52
US9257514B2Feb 9, 2016
Semiconductor device with plural electrodes formed on substrate
FUJITSU LTD0 citations52
US9224668B2Dec 29, 2015
Semiconductor HEMT device with stoichiometric silicon nitride layer
FUJITSU LTD0 citations52
US9184273B2Nov 10, 2015
Compound semiconductor device and method of manufacturing the same
FUJITSU LTD0 citations52
MAKIYAMA KOZO
5 patentsUS8587092B2Nov 19, 2013
Semiconductor device and manufacturing method of the same
MAKIYAMA KOZO8 citations84
US8183558B2May 22, 2012
Compound semiconductor device with T-shaped gate electrode
MAKIYAMA KOZO7 citations84
US8816408B2Aug 26, 2014
Compound semiconductor device and manufacturing method thereof
MAKIYAMA KOZO2 citations62
US8410616B2Apr 2, 2013
Method of processing resist, semiconductor device, and method of producing the same
MAKIYAMA KOZO1 citations62
US8133775B2Mar 13, 2012
Semiconductor device with mushroom electrode and manufacture method thereof
MAKIYAMA KOZO2 citations60
KANAMURA MASAHITO
1 patentEUDYNA DEVICES INC
1 patentOHKI TOSHIHIRO
1 patentFUJITSU QUANTUM DEVICES LTD
1 patentKURAHASHI NAOKO
1 patentShowing the top 50 of 73 patents by PatentIndex Score.