Inventor
KE CHIH-MING
TW49 patents
⚠️ This page may combine multiple inventors who share the name “KE CHIH-MING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
23 patentsUS7252909B2Aug 7, 2007
Method to reduce CD non-uniformity in IC manufacturing
TAIWAN SEMICONDUCTOR MFG199 citations99
US6774044B2Aug 10, 2004
Reducing photoresist shrinkage via plasma treatment
TAIWAN SEMICONDUCTOR MFG19 citations89
US9053284B2Jun 9, 2015
Method and system for overlay control
TAIWAN SEMICONDUCTOR MFG8 citations83
US7580129B2Aug 25, 2009
Method and system for improving accuracy of critical dimension metrology
TAIWAN SEMICONDUCTOR MFG8 citations83
US7259850B2Aug 21, 2007
Approach to improve ellipsometer modeling accuracy for solving material optical constants N & K
TAIWAN SEMICONDUCTOR MFG8 citations74
USRE45943EMar 22, 2016
Measurement of overlay offset in semiconductor processing
TAIWAN SEMICONDUCTOR MFG3 citations73
US7732109B2Jun 8, 2010
Method and system for improving critical dimension uniformity
TAIWAN SEMICONDUCTOR MFG6 citations73
US6979820B2Dec 27, 2005
CD SEM automatic focus methodology and apparatus for constant electron beam dosage control
TAIWAN SEMICONDUCTOR MFG9 citations73
US6083834AJul 4, 2000
Zincate catalysis electroless metal deposition for via metal interconnection
TAIWAN SEMICONDUCTOR MFG11 citations72
US9070622B2Jun 30, 2015
Systems and methods for similarity-based semiconductor process control
TAIWAN SEMICONDUCTOR MFG4 citations70
US7897297B2Mar 1, 2011
Method and system for optimizing intra-field critical dimension uniformity using a sacrificial twin mask
TAIWAN SEMICONDUCTOR MFG3 citations63
US7858404B2Dec 28, 2010
Measurement of overlay offset in semiconductor processing
TAIWAN SEMICONDUCTOR MFG3 citations63
US7796249B2Sep 14, 2010
Mask haze early detection
TAIWAN SEMICONDUCTOR MFG5 citations62
US7135259B2Nov 14, 2006
Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control
TAIWAN SEMICONDUCTOR MFG4 citations62
US7393616B2Jul 1, 2008
Line end spacing measurement
TAIWAN SEMICONDUCTOR MFG6 citations60
US7356380B2Apr 8, 2008
Process control method
TAIWAN SEMICONDUCTOR MFG4 citations57
US7751025B2Jul 6, 2010
Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control
TAIWAN SEMICONDUCTOR MFG0 citations52
US8592107B2Nov 26, 2013
Method and apparatus of providing overlay
TAIWAN SEMICONDUCTOR MFG0 citations51
US8027529B2Sep 27, 2011
System for improving critical dimension uniformity
TAIWAN SEMICONDUCTOR MFG1 citations51
US7349086B2Mar 25, 2008
Systems and methods for optical measurement
TAIWAN SEMICONDUCTOR MFG1 citations51
US9360767B2Jun 7, 2016
Method and apparatus for maintaining depth of focus
TAIWAN SEMICONDUCTOR MFG0 citations50
US9025130B2May 5, 2015
Method and apparatus for maintaining depth of focus
TAIWAN SEMICONDUCTOR MFG0 citations50
US7777884B2Aug 17, 2010
Method and system for optimizing sub-nanometer critical dimension using pitch offset
TAIWAN SEMICONDUCTOR MFG0 citations50
TAIWAN SEMICONDUCTOR MFG CO LTD
19 patentsUS10031426B2Jul 24, 2018
Method and system for overlay control
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations83
US10281827B2May 7, 2019
Noise reduction for overlay control
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations82
US10983005B2Apr 20, 2021
Spectroscopic overlay metrology
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations73
US9766554B2Sep 19, 2017
Method and apparatus for estimating focus and dose of an exposure process
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10866524B2Dec 15, 2020
Method and system for overlay control
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US10514612B2Dec 24, 2019
Method and system for overlay control
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US9418199B2Aug 16, 2016
Method and apparatus for extracting systematic defects
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US10684556B2Jun 16, 2020
Noise reduction for overlay control
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations71
US10031997B1Jul 24, 2018
Forecasting wafer defects using frequency domain analysis
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11656391B2May 23, 2023
Aperture design and methods thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11513444B2Nov 29, 2022
Noise reduction for overlay control
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12062582B2Aug 13, 2024
Method of manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations58
US10663633B2May 26, 2020
Aperture design and methods thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10867116B2Dec 15, 2020
Forecasting wafer defects using frequency domain analysis
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US10521548B2Dec 31, 2019
Forecasting wafer defects using frequency domain analysis
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US9594309B2Mar 14, 2017
Method and apparatus to characterize photolithography lens quality
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations50
US10274839B2Apr 30, 2019
Two-dimensional marks
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
US10163733B2Dec 25, 2018
Method of extracting defects
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations45
US9690212B2Jun 27, 2017
Hybrid focus-exposure matrix
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations41