Inventor
HIRAOKA HIROYUKI
US19 patents
⚠️ This page may combine multiple inventors who share the name “HIRAOKA HIROYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
15 patentsUS4999280AMar 12, 1991
Spray silylation of photoresist images
IBM100 citations96
US4507331AMar 26, 1985
Dry process for forming positive tone micro patterns
IBM102 citations96
US4119688AOct 10, 1978
Electro-lithography method
IBM74 citations96
US4464460AAug 7, 1984
Process for making an imaged oxygen-reactive ion etch barrier
IBM27 citations91
US4770974ASep 13, 1988
Microlithographic resist containing poly(1,1-dialkylsilazane)
IBM19 citations82
US3964908AJun 22, 1976
Positive resists containing dimethylglutarimide units
IBM23 citations80
US4690838ASep 1, 1987
Process for enhancing the resistance of a resist image to reactive ion etching and to thermal flow
IBM12 citations73
US4460436AJul 17, 1984
Deposition of polymer films by means of ion beams
IBM13 citations73
US4004043AJan 18, 1977
Nitrated polymers as positive resists
IBM11 citations73
US4875124AOct 17, 1989
Thin film magnetic heads with thermally crosslinked insulation
IBM10 citations71
US4389482AJun 21, 1983
Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light
IBM16 citations68
US5270151ADec 14, 1993
Spin on oxygen reactive ion etch barrier
IBM6 citations62
US4482427ANov 13, 1984
Process for forming via holes having sloped walls
IBM5 citations62
US4452665AJun 5, 1984
Polymeric halocarbons as plasma etch barriers
IBM2 citations62
US4379826AApr 12, 1983
Positive electron beam resists of ortho chloro substituted phenol or cresol condensed with formaldehyde
IBM5 citations60