P

Inventor

YOSHIOKA KEN

JP79 patents
⚠️ This page may combine multiple inventors who share the name “YOSHIOKA KEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI LTD

34 patents
US5855726AJan 5, 1999

Vacuum processing apparatus and semiconductor manufacturing line using the same

HITACHI LTD407 citations99
US6245202B1Jun 12, 2001

Plasma treatment device

HITACHI LTD115 citations98
US6833051B2Dec 21, 2004

Plasma processing apparatus and method

HITACHI LTD33 citations96
US6519504B1Feb 11, 2003

Vacuum processing apparatus and semiconductor manufacturing line using the same

HITACHI LTD45 citations96
US6388382B1May 14, 2002

Plasma processing apparatus and method

HITACHI LTD78 citations96
US6373681B2Apr 16, 2002

Electrostatic chuck, and method of and apparatus for processing sample using the chuck

HITACHI LTD67 citations96
US6243251B1Jun 5, 2001

Electrostatic chuck, and method of and apparatus for processing sample using the chuck

HITACHI LTD50 citations96
US6180019B1Jan 30, 2001

Plasma processing apparatus and method

HITACHI LTD51 citations96
US5946184AAug 31, 1999

Electrostatic chuck, and method of and apparatus for processing sample

HITACHI LTD87 citations96
US6499424B2Dec 31, 2002

Plasma processing apparatus and method

HITACHI LTD23 citations93
US6172321B1Jan 9, 2001

Method and apparatus for plasma processing apparatus

HITACHI LTD26 citations93
US6034346AMar 7, 2000

Method and apparatus for plasma processing apparatus

HITACHI LTD27 citations93
US6756737B2Jun 29, 2004

Plasma processing apparatus and method

HITACHI LTD37 citations92
US6677244B2Jan 13, 2004

Specimen surface processing method

HITACHI LTD18 citations92
US6549393B2Apr 15, 2003

Semiconductor wafer processing apparatus and method

HITACHI LTD19 citations92
US5874013AFeb 23, 1999

Semiconductor integrated circuit arrangement fabrication method

HITACHI LTD18 citations92
US6596551B1Jul 22, 2003

Etching end point judging method, etching end point judging device, and insulating film etching method using these methods

HITACHI LTD17 citations84
US6846363B2Jan 25, 2005

Plasma processing apparatus and method

HITACHI LTD11 citations82
US6188935B1Feb 13, 2001

Vacuum processing apparatus and semiconductor manufacturing line using the same

HITACHI LTD9 citations82
US7347656B2Mar 25, 2008

Vacuum processing apparatus and semiconductor manufacturing line using the same

HITACHI LTD3 citations74
US7288166B2Oct 30, 2007

Plasma processing apparatus

HITACHI LTD6 citations74
US6759338B2Jul 6, 2004

Plasma processing apparatus and method

HITACHI LTD9 citations74
US6752579B2Jun 22, 2004

Vacuum processing apparatus and semiconductor manufacturing line using the same

HITACHI LTD7 citations74
US6752580B2Jun 22, 2004

Vacuum processing apparatus and semiconductor manufacturing line using the same

HITACHI LTD3 citations74
US6705828B2Mar 16, 2004

Vacuum processing apparatus and semiconductor manufacturing line using the same

HITACHI LTD11 citations74
US6672819B1Jan 6, 2004

Vacuum processing apparatus and semiconductor manufacturing line using the same

HITACHI LTD7 citations74
US6649021B2Nov 18, 2003

Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield

HITACHI LTD9 citations74
US6526330B2Feb 25, 2003

Vacuum processing apparatus and semiconductor manufacturing line using the same

HITACHI LTD5 citations74
US6481370B2Nov 19, 2002

Plasma processsing apparatus

HITACHI LTD10 citations74
US6309980B1Oct 30, 2001

Semiconductor integrated circuit arrangement fabrication method

HITACHI LTD4 citations74
US6253117B1Jun 26, 2001

Vacuum processing apparatus and semiconductor manufacturing line using the same

HITACHI LTD3 citations74
US6074958AJun 13, 2000

Semiconductor integrated circuit arrangement fabrication method

HITACHI LTD9 citations74
US5962347AOct 5, 1999

Semiconductor integrated circuit arrangement fabrication method

HITACHI LTD8 citations74
US5424702AJun 13, 1995

Superconducting magnet

HITACHI LTD7 citations72

HITACHI HIGH TECH CORP

11 patents
US6646233B2Nov 11, 2003

Wafer stage for wafer processing apparatus and wafer processing method

HITACHI HIGH TECH CORP89 citations98
US7138606B2Nov 21, 2006

Wafer processing method

HITACHI HIGH TECH CORP53 citations96
US6895179B2May 17, 2005

Wafer stage for wafer processing apparatus

HITACHI HIGH TECH CORP37 citations92
US6825617B2Nov 30, 2004

Semiconductor processing apparatus

HITACHI HIGH TECH CORP37 citations92
US7224568B2May 29, 2007

Plasma processing method and plasma processing apparatus

HITACHI HIGH TECH CORP12 citations83
US7833429B2Nov 16, 2010

Plasma processing method

HITACHI HIGH TECH CORP7 citations74
US7744721B2Jun 29, 2010

Plasma processing apparatus

HITACHI HIGH TECH CORP7 citations74
US7740739B2Jun 22, 2010

Plasma processing apparatus and method

HITACHI HIGH TECH CORP5 citations74
US6850012B2Feb 1, 2005

Plasma processing apparatus

HITACHI HIGH TECH CORP10 citations74
US9378929B2Jun 28, 2016

Plasma processing apparatus and plasma processing method

HITACHI HIGH TECH CORP4 citations72
US8951385B2Feb 10, 2015

Plasma processing apparatus and plasma processing method

HITACHI HIGH TECH CORP5 citations72

TOMOEGAWA PAPER CO LTD

1 patent
US6187874B1Feb 13, 2001

Adhesive for electronic parts and adhesive tape for electronic parts

TOMOEGAWA PAPER CO LTD22 citations92

TOYODA GOSEI KK

1 patent
US6430878B2Aug 13, 2002

Glass guide

TOYODA GOSEI KK23 citations90

NISHIKAWA RUBBER CO LTD

1 patent
US6837005B2Jan 4, 2005

Weatherstrip for automobile

NISHIKAWA RUBBER CO LTD30 citations86

YOSHIOKA KEN

1 patent
US8252132B2Aug 28, 2012

Method and apparatus for repairing an electrostatic chuck device, and the electrostatic chuck device

YOSHIOKA KEN9 citations82

MIYA GO

1 patent
US8083889B2Dec 27, 2011

Apparatus and method for plasma etching

MIYA GO6 citations72

Showing the top 50 of 79 patents by PatentIndex Score.