Inventor

LIAN JIAN-JOU

TW40 patents

⚠️ This page may combine multiple inventors who share the name “LIAN JIAN-JOU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIAN JIAN-JOU

TAIWAN SEMICONDUCTOR MFG CO LTD

Surface modification layer for conductive feature formation

Semiconductor device and method

Wet etch chemistry for selective silicon etch

Fin field-effect transistor device and method of forming the same

Fin field-effect transistor device and method of forming the same

Surface modification layer for conductive feature formation

Semiconductor device and method of manufacture

Wet etch chemistry for selective silicon etch

Fin Field-Effect Transistor device and method of forming the same

Surface modification layer for conductive feature formation

Fin field-effect transistor device and method of forming the same

Semiconductor device and method of manufacture

Fin field-effect transistor with a gate structure having a dielectric protection layer

Fin field-effect transistor and method of forming the same

Fin field-effect transistor and method of forming the same

Semiconductor device and method of manufacture

Fin field-effect transistor device and method of forming the same

Surface modification layer for conductive feature formation

Fin field-effect transistor and method of forming the same

Fin field-effect transistor device and method of forming the same

Method for processing substrate

Methods of forming a semiconductor device with a gate structure having a dielectric protection layer

Fin field-effect transistor and method of forming the same

Semiconductor device and method of manufacture

Fin field-effect transistor and method of forming the same

Substrate processing apparatus and method for processing substrate

Chemical composition for tri-layer removal

Semiconductor device and method of manufacture

Fin field-effect transistor and method of forming the same

Fin field-effect transistor device and method of forming the same

Semiconductor device and method of manufacture

Semiconductor device and method of manufacture

Selective removal of carbon-containing and nitrogen-containing silicon residues

Method for improving profile of interconnect structure

Patterning method and structures resulting therefrom

Semiconductor device and method

Chemical composition for tri-layer removal

Semiconductor device and method of manufacture

Method of forming semiconductor device

TAIWAN SEMICONDUTOR MFG COMPANY LTD

Semiconductor devices and methods of manufacturing thereof