Inventor
CHEN HSIN-YU
TW157 patents
⚠️ This page may combine multiple inventors who share the name “CHEN HSIN-YU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
19 patentsUS9748190B2Aug 29, 2017
Low cost and ultra-thin chip on wafer on substrate (CoWoS) formation
TAIWAN SEMICONDUCTOR MFG CO LTD25 citations93
US9786580B2Oct 10, 2017
Self-alignment for redistribution layer
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations83
US9449898B2Sep 20, 2016
Semiconductor device having backside interconnect structure through substrate via and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations83
US11454820B2Sep 27, 2022
Multifunctional collimator for contact image sensors
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations82
US11789360B2Oct 17, 2023
Photomask assembly and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11415878B2Aug 16, 2022
Pellicle frame with stress relief trenches
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US11392024B2Jul 19, 2022
Photomask assembly and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11305980B2Apr 19, 2022
Anti-stiction process for MEMS device
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US11056419B2Jul 6, 2021
Semiconductor device having backside interconnect structure on through substrate via and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US10513432B2Dec 24, 2019
Anti-stiction process for MEMS device
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10510641B2Dec 17, 2019
Semiconductor device having backside interconnect structure on through substrate via and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US10290604B2May 14, 2019
Substrateless integrated circuit packages and methods of forming same
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US10131536B2Nov 20, 2018
Heater design for MEMS chamber pressure control
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US9884758B2Feb 6, 2018
Selective nitride outgassing process for MEMS cavity pressure control
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US9842825B2Dec 12, 2017
Substrateless integrated circuit packages and methods of forming same
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations72
US12094870B2Sep 17, 2024
Electrostatic discharge circuits and methods for operating the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11798936B2Oct 24, 2023
Electrostatic discharge circuits and methods for operating the same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations71
US11782284B2Oct 10, 2023
Multifunctional collimator for contact image sensors
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11726342B2Aug 15, 2023
Multifunctional collimator for contact image sensors
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations71
UNITED MICROELECTRONICS CORP
15 patentsUS10008578B1Jun 26, 2018
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP17 citations94
US9953880B1Apr 24, 2018
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP20 citations94
US9502519B2Nov 22, 2016
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP19 citations92
US11581422B2Feb 14, 2023
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP3 citations84
US10943993B2Mar 9, 2021
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP7 citations84
US10153210B1Dec 11, 2018
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP5 citations84
US9972623B1May 15, 2018
Semiconductor device including barrier layer and manufacturing method thereof
UNITED MICROELECTRONICS CORP10 citations84
US11527638B2Dec 13, 2022
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP3 citations73
US10483395B2Nov 19, 2019
Method for fabricating semiconductor device
UNITED MICROELECTRONICS CORP2 citations73
US10340272B2Jul 2, 2019
Manufacturing method of semiconductor device
UNITED MICROELECTRONICS CORP2 citations73
US10141228B1Nov 27, 2018
FinFET device having single diffusion break structure
UNITED MICROELECTRONICS CORP4 citations73
US9627268B2Apr 18, 2017
Method for fabricating semiconductor device
UNITED MICROELECTRONICS CORP5 citations73
US9871102B2Jan 16, 2018
Method of forming a single-crystal nanowire finFET
UNITED MICROELECTRONICS CORP4 citations72
US9281400B1Mar 8, 2016
Method of fabricating a semiconductor device with fin-shaped structures
UNITED MICROELECTRONICS CORP3 citations72
US8748066B2Jun 10, 2014
Method for forming photomasks
UNITED MICROELECTRONICS CORP4 citations72
TAIWAN SEMICONDUCTOR MFG
3 patentsUS8956966B2Feb 17, 2015
TSV structures and methods for forming the same
TAIWAN SEMICONDUCTOR MFG11 citations84
US8673775B2Mar 18, 2014
Methods of forming semiconductor structures
TAIWAN SEMICONDUCTOR MFG8 citations84
US9252110B2Feb 2, 2016
Interconnect structure and method of forming same
TAIWAN SEMICONDUCTOR MFG6 citations83
CHEN HSIN-YU
3 patentsLIN YUNG-CHI
1 patent(unassigned)
1 patentGOOGLE LLC
1 patentACER INC
1 patentADVANCED RISC MACH LTD
1 patentLIN JING-CHENG
1 patentQUANTA COMP INC
1 patentCHANG HSIN
1 patentIDGUNJI SACHIN SATISH
1 patentHUANG KUO-HSIUNG
1 patentShowing the top 50 of 157 patents by PatentIndex Score.