Inventor
SCHWAB MARKUS
DE40 patents
⚠️ This page may combine multiple inventors who share the name “SCHWAB MARKUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
15 patentsUS10527832B2Jan 7, 2020
Imaging optical unit and projection exposure apparatus including same
ZEISS CARL SMT GMBH23 citations94
US10545323B2Jan 28, 2020
Projection optical unit for EUV projection lithography
ZEISS CARL SMT GMBH13 citations85
US10656400B2May 19, 2020
Imaging optical unit and projection exposure unit including same
ZEISS CARL SMT GMBH7 citations84
US10146033B2Dec 4, 2018
Projection optical unit for imaging an object field into an image field, and projection exposure apparatus comprising such a projection optical unit
ZEISS CARL SMT GMBH5 citations84
US9983483B2May 29, 2018
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations73
US9759550B2Sep 12, 2017
Projection exposure apparatus for microlithography comprising an optical distance measurement system
ZEISS CARL SMT GMBH2 citations73
US9678438B2Jun 13, 2017
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations73
US9213244B2Dec 15, 2015
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations63
US9477157B2Oct 25, 2016
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations62
US9170499B2Oct 27, 2015
Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing element
ZEISS CARL SMT GMBH1 citations62
US10558026B2Feb 11, 2020
Projection optical unit for imaging an object field into an image field, and projection exposure apparatus comprising such a projection optical unit
ZEISS CARL SMT GMBH0 citations52
US10288894B2May 14, 2019
Optical component for use in a radiation source module of a projection exposure system
ZEISS CARL SMT GMBH0 citations52
US10012911B2Jul 3, 2018
Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator
ZEISS CARL SMT GMBH1 citations52
US9535331B2Jan 3, 2017
Optical system for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations51
US10162267B2Dec 25, 2018
Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations
ZEISS CARL SMT GMBH0 citations41
ZEISS CARL SMT AG
4 patentsUS7408616B2Aug 5, 2008
Microlithographic exposure method as well as a projection exposure system for carrying out the method
ZEISS CARL SMT AG70 citations97
US7847921B2Dec 7, 2010
Microlithographic exposure method as well as a projection exposure system for carrying out the method
ZEISS CARL SMT AG30 citations92
US7508489B2Mar 24, 2009
Method of manufacturing a miniaturized device
ZEISS CARL SMT AG2 citations63
US7808615B2Oct 5, 2010
Projection exposure apparatus and method for operating the same
ZEISS CARL SMT AG2 citations62
RIVER STONE BIOTECH LLC
3 patentsUS11965181B2Apr 23, 2024
Increased biosynthesis of benzylisoquinoline alkaloids and benzylisoquinoline alkaloid precursors in a recombinant host cell
RIVER STONE BIOTECH LLC0 citations52
US11060071B2Jul 13, 2021
Increased biosynthesis of benzylisoquinoline alkaloids and benzylisoquinoline alkaloid precursors in a recombinant host cell
RIVER STONE BIOTECH LLC0 citations52
US11781164B2Oct 10, 2023
Demethylation of reticuline and derivatives thereof with fungal cytochrome P450
RIVER STONE BIOTECH LLC0 citations40
FIOLKA DAMIAN
2 patentsROQUETTE FRERES
2 patentsAJINOMOTO KK
2 patentsSCHWAB MARKUS
2 patentsUS8542342B2Sep 24, 2013
Method of manufacturing a miniaturized device
SCHWAB MARKUS0 citations47
US8537335B2Sep 17, 2013
Illumination system for a microlithography projection exposure apparatus, microlithography projection exposure apparatus comprising such an illumination system, and fourier optical system
SCHWAB MARKUS0 citations46