P

Inventor

Pan Kuan-Ting

TW100 patents

Patents

50 patents
US10181426B1Jan 15, 2019

Etch profile control of polysilicon structures of semiconductor devices

TAIWAN SEMICONDUCTOR MFG CO LTD15 citations94
US11616062B2Mar 28, 2023

Gate isolation for multigate device

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations86
US10943830B2Mar 9, 2021

Self-aligned structure for semiconductor devices

TAIWAN SEMICONDUCTOR MFG CO LTD13 citations86
US10825918B2Nov 3, 2020

Semiconductor device structure and method for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US10290635B2May 14, 2019

Buried interconnect conductor

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US12272690B2Apr 8, 2025

Gate isolation for multigate device

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations75
US12199097B2Jan 14, 2025

Seam free isolation structures and method for making the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations75
US11948973B2Apr 2, 2024

Gate-all-around field-effect transistor device

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations75
US12080776B2Sep 3, 2024

Field effect transistor with fin isolation structure and method

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11916122B2Feb 27, 2024

Gate all around transistor with dual inner spacers

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11735482B2Aug 22, 2023

Semiconductor device structure and methods of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11637102B2Apr 25, 2023

Gate isolation for multigate device

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11621195B2Apr 4, 2023

Semiconductor device and method of manufacturing the same

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11563106B2Jan 24, 2023

Formation method of isolation feature of semiconductor device structure

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11502187B2Nov 15, 2022

Semiconductor device structure and method for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11355396B2Jun 7, 2022

Method of forming a semiconductor structure including laterally etching semiconductor material in fin recess region and depositing metal gate therein

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11355398B2Jun 7, 2022

Semiconductor device structure and methods of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11329165B2May 10, 2022

Structure and formation method of semiconductor device with isolation structure

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11328963B2May 10, 2022

Multi-gate device and related methods

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11114529B2Sep 7, 2021

Gate-all-around field-effect transistor device

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10985277B2Apr 20, 2021

Method for forming semiconductor device structure

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10985072B2Apr 20, 2021

Etch profile control of polysilicon structures of semiconductor devices

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10886269B2Jan 5, 2021

Semiconductor device and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10658245B2May 19, 2020

Etch profile control of polysilicon structures of semiconductor devices

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10658490B2May 19, 2020

Structure and formation method of isolation feature of semiconductor device structure

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10516051B2Dec 24, 2019

FinFET and method of fabrication thereof

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10510873B2Dec 17, 2019

Semiconductor device and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9741821B1Aug 22, 2017

Two-step dummy gate formation

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations73
US12593475B2Mar 31, 2026

Field effect transistor with isolation structure and method

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12563816B2Feb 24, 2026

Method for forming sidewall spacers disposed above mask layer and semiconductor devices fabricated thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12557317B2Feb 17, 2026

Semiconductor devices with fin-top hard mask and methods for fabrication thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12520518B2Jan 6, 2026

Semiconductor device structure and methods of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12477802B2Nov 18, 2025

Structure of isolation feature of semiconductor device structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12471316B2Nov 11, 2025

Semiconductor device and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12439680B2Oct 7, 2025

Multi-gate device and related methods

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12419094B2Sep 16, 2025

Semiconductor device with trimmed channel region and method of making the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12349407B2Jul 1, 2025

Method for manufacturing semiconductor structure with dielectric feature

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12349456B2Jul 1, 2025

Semiconductor device structure and methods of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12349378B2Jul 1, 2025

Semiconductor devices with Fin-top hard mask and methods for fabrication thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12324225B2Jun 3, 2025

Self-aligned structure for semiconductor devices

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12237405B2Feb 25, 2025

Semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12165926B2Dec 10, 2024

FinFET device structure having dielectric features between a plurality of gate electrodes and methods of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12148815B2Nov 19, 2024

Fin field effect transistor device structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12142692B2Nov 12, 2024

Semiconductor device with isolation structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12107153B2Oct 1, 2024

Semiconductor device and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12107006B2Oct 1, 2024

Method for manufacturing semiconductor structure with dielectric feature

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations63
US12087636B2Sep 10, 2024

Semiconductor device including a FinFET structure and method for fabricating the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12087768B2Sep 10, 2024

Semiconductor device structure and method for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12057507B2Aug 6, 2024

Method for manufacturing semiconductor device structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12051693B2Jul 30, 2024

Method for manufacturing semiconductor structure with isolation strips

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

Showing the top 50 of 100 patents by PatentIndex Score.