Inventor
LILAK AARON D
US74 patents
⚠️ This page may combine multiple inventors who share the name “LILAK AARON D”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INTEL CORP
49 patentsUS11239236B2Feb 1, 2022
Forksheet transistor architectures
INTEL CORP9 citations86
US11201221B2Dec 14, 2021
Backside contact structures and fabrication for metal on both sides of devices
INTEL CORP9 citations86
US11437283B2Sep 6, 2022
Backside contacts for semiconductor devices
INTEL CORP12 citations85
US10026829B2Jul 17, 2018
Semiconductor device with isolated body portion
INTEL CORP8 citations83
US12107085B2Oct 1, 2024
Interconnect techniques for electrically connecting source/drain regions of stacked transistors
INTEL CORP2 citations73
US11742346B2Aug 29, 2023
Interconnect techniques for electrically connecting source/drain regions of stacked transistors
INTEL CORP3 citations73
US11676966B2Jun 13, 2023
Stacked transistors having device strata with different channel widths
INTEL CORP2 citations73
US11664377B2May 30, 2023
Forksheet transistor architectures
INTEL CORP2 citations73
US11658221B2May 23, 2023
Backside contact structures and fabrication for metal on both sides of devices
INTEL CORP3 citations73
US11640961B2May 2, 2023
III-V source/drain in top NMOS transistors for low temperature stacked transistor contacts
INTEL CORP2 citations73
US11573798B2Feb 7, 2023
Stacked transistors with different gate lengths in different device strata
INTEL CORP1 citations73
US11538808B2Dec 27, 2022
Structures and methods for memory cells
INTEL CORP4 citations73
US11393818B2Jul 19, 2022
Stacked transistors with Si PMOS and high mobility thin film transistor NMOS
INTEL CORP2 citations73
US11257738B2Feb 22, 2022
Vertically stacked transistor devices with isolation wall structures containing an electrical conductor
INTEL CORP3 citations73
US11075198B2Jul 27, 2021
Stacked transistor architecture having diverse fin geometry
INTEL CORP3 citations73
US10892335B2Jan 12, 2021
Device isolation by fixed charge
INTEL CORP6 citations73
US10784358B2Sep 22, 2020
Backside contact structures and fabrication for metal on both sides of devices
INTEL CORP3 citations73
US10600810B2Mar 24, 2020
Backside fin recess control with multi-hsi option
INTEL CORP2 citations73
US10546873B2Jan 28, 2020
Integrated circuit with stacked transistor devices
INTEL CORP5 citations73
US11348916B2May 31, 2022
Leave-behind protective layer having secondary purpose
INTEL CORP3 citations72
US11342432B2May 24, 2022
Gate-all-around integrated circuit structures having insulator fin on insulator substrate
INTEL CORP1 citations72
US7129533B2Oct 31, 2006
High concentration indium fluorine retrograde wells
INTEL CORP6 citations72
US6838329B2Jan 4, 2005
High concentration indium fluorine retrograde wells
INTEL CORP7 citations72
US11444148B2Sep 13, 2022
Recoiled metal thin film for 3D inductor with tunable core
INTEL CORP2 citations67
US12538470B2Jan 27, 2026
Structures and methods for memory cells
INTEL CORP1 citations64
US12288810B2Apr 29, 2025
Backside contact structures and fabrication for metal on both sides of devices
INTEL CORP0 citations63
US12057494B2Aug 6, 2024
Stacked transistors
INTEL CORP0 citations63
US11935933B2Mar 19, 2024
Backside contact structures and fabrication for metal on both sides of devices
INTEL CORP0 citations63
US11894262B2Feb 6, 2024
Back side processing of integrated circuit structures to form insulation structure between adjacent transistor structures
INTEL CORP0 citations63
US11658183B2May 23, 2023
Metallization structures under a semiconductor device layer
INTEL CORP0 citations63
US11616056B2Mar 28, 2023
Vertical diode in stacked transistor architecture
INTEL CORP1 citations63
US11605556B2Mar 14, 2023
Back side processing of integrated circuit structures to form insulation structure between adjacent transistor structures
INTEL CORP0 citations63
US11374024B2Jun 28, 2022
Integrated circuits with stacked transistors and methods of manufacturing the same using processes which fabricate lower gate structures following completion of portions of an upper transistor
INTEL CORP0 citations63
US11257929B2Feb 22, 2022
Stacked transistors
INTEL CORP1 citations63
US11152396B2Oct 19, 2021
Semiconductor device having stacked transistors and multiple threshold voltage control
INTEL CORP1 citations63
US11107811B2Aug 31, 2021
Metallization structures under a semiconductor device layer
INTEL CORP0 citations63
US11107924B2Aug 31, 2021
Systems and methods to reduce FinFET gate capacitance
INTEL CORP0 citations63
US10937665B2Mar 2, 2021
Methods and apparatus for gettering impurities in semiconductors
INTEL CORP0 citations63
US10910405B2Feb 2, 2021
Backside fin recess control with multi-HSI option
INTEL CORP0 citations63
US12288813B2Apr 29, 2025
Gate-all-around integrated circuit structures having insulator fin on insulator substrate
INTEL CORP0 citations62
US12033896B2Jul 9, 2024
Isolation wall stressor structures to improve channel stress and their methods of fabrication
INTEL CORP0 citations62
US11996408B2May 28, 2024
Leave-behind protective layer having secondary purpose
INTEL CORP0 citations62
US11869894B2Jan 9, 2024
Metallization structures for stacked device connectivity and their methods of fabrication
INTEL CORP0 citations62
US11862702B2Jan 2, 2024
Gate-all-around integrated circuit structures having insulator FIN on insulator substrate
INTEL CORP0 citations62
US11784239B2Oct 10, 2023
Subfin leakage suppression using fixed charge
INTEL CORP0 citations62
US11699637B2Jul 11, 2023
Vertically stacked transistor devices with isolation wall structures containing an electrical conductor
INTEL CORP0 citations62
US11672133B2Jun 6, 2023
Vertically stacked memory elements with air gap
INTEL CORP1 citations62
US11658072B2May 23, 2023
Vertically stacked transistors in a fin
INTEL CORP0 citations62
US11616060B2Mar 28, 2023
Techniques for forming gate structures for transistors arranged in a stacked configuration on a single fin structure
INTEL CORP0 citations62
CAPPELLANI ANNALISA
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