US11664377B2ActiveUtilityA1

Forksheet transistor architectures

94
Assignee: INTEL CORPPriority: Mar 23, 2020Filed: Dec 9, 2021Granted: May 30, 2023
Est. expiryMar 23, 2040(~13.7 yrs left)· nominal 20-yr term from priority
H10W 20/435H10D 30/6735H10D 62/121H10D 84/0149H10D 84/0144H10D 84/0135H10D 84/0128H10D 84/038H10D 30/6757H10D 62/235H10D 30/797H10D 30/43H10D 64/017H10D 30/014H10D 62/822H10D 88/00H10D 84/0188H10D 84/0186H10D 84/0172H10D 84/0151H10D 88/01H10D 64/512H10D 84/834H10D 84/856H10D 84/85H10D 30/62B82Y 10/00H01L 29/1033H01L 27/0922H01L 23/5283
94
PatentIndex Score
2
Cited by
5
References
20
Claims

Abstract

Embodiments disclosed herein include a semiconductor device. In an embodiment, the semiconductor device comprises a first transistor strata. The first transistor strata comprises a first backbone, a first transistor adjacent to a first edge of the first backbone, and a second transistor adjacent to a second edge of the first backbone. In an embodiment, the semiconductor device further comprises a second transistor strata over the first transistor strata. The second transistor strata comprises a second backbone, a third transistor adjacent to a first edge of the second backbone, and a fourth transistor adjacent to a second edge of the second backbone.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. An integrated circuit structure, comprising:
 a first dielectric backbone structure having a first side opposite a second side; 
 a first plurality of vertically stacked horizontal channel structures along the first side of the first dielectric backbone structure; 
 a second plurality of vertically stacked horizontal channel structures along the second side of the first dielectric backbone structure; 
 a first gate structure over and around the first plurality of vertically stacked horizontal channel structures; 
 a second gate structure over and around the second plurality of vertically stacked horizontal channel structures; 
 a second dielectric backbone structure having a first side opposite a second side, the second dielectric backbone structure separate and distinct from the first dielectric backbone, and the second dielectric backbone structure at least partially vertically overlapping with the first dielectric backbone structure or the first plurality of vertically stacked horizontal channel structures or the second plurality of vertically stacked horizontal channel structures; 
 a third plurality of vertically stacked horizontal channel structures along the first side of the second dielectric backbone structure; 
 a fourth plurality of vertically stacked horizontal channel structures along the second side of the second dielectric backbone structure; 
 a third gate structure over and around the third plurality of vertically stacked horizontal channel structures; and 
 a fourth gate structure over and around the fourth plurality of vertically stacked horizontal channel structures. 
 
     
     
       2. The integrated circuit structure of  claim 1 , wherein the second dielectric backbone structure is in vertical alignment with the first dielectric backbone structure. 
     
     
       3. The integrated circuit structure of  claim 1 , wherein the second dielectric backbone structure is vertically offset from the first dielectric backbone structure. 
     
     
       4. The integrated circuit structure of  claim 1 , wherein the first and second pluralities of vertically stacked horizontal channel structures are in direct contact with the first dielectric backbone structure. 
     
     
       5. The integrated circuit structure of  claim 1 , wherein the third and fourth pluralities of vertically stacked horizontal channel structures are in direct contact with the second dielectric backbone structure. 
     
     
       6. The integrated circuit structure of  claim 1 , wherein the first and second pluralities of vertically stacked horizontal channel structures are in direct contact with the first dielectric backbone structure, and wherein the third and fourth pluralities of vertically stacked horizontal channel structures are in direct contact with the second dielectric backbone structure. 
     
     
       7. The integrated circuit structure of  claim 1 , wherein the first and second gate structures are N-type gate structures, and the third and fourth gate structures are P-type gate structures. 
     
     
       8. The integrated circuit structure of  claim 1 , wherein the first and second gate structures are P-type gate structures, and the third and fourth gate structures are N-type gate structures. 
     
     
       9. The integrated circuit structure of  claim 1 , wherein the first and third gate structures are N-type gate structures, and the second and fourth gate structures are P-type gate structures. 
     
     
       10. The integrated circuit structure of  claim 1 , wherein the first and third gate structures are P-type gate structures, and the second and fourth gate structures are N-type gate structures. 
     
     
       11. A computing device, comprising:
 a board; and 
 a component coupled to the board, the component including an integrated circuit structure, comprising:
 a first dielectric backbone structure having a first side opposite a second side; 
 a first plurality of vertically stacked horizontal channel structures along the first side of the first dielectric backbone structure; 
 a second plurality of vertically stacked horizontal channel structures along the second side of the first dielectric backbone structure; 
 a first gate structure over and around the first plurality of vertically stacked horizontal channel structures; 
 a second gate structure over and around the second plurality of vertically stacked horizontal channel structures; 
 a second dielectric backbone structure having a first side opposite a second side, the second dielectric backbone structure separate and distinct from the first dielectric backbone, and the second dielectric backbone structure at least partially vertically overlapping with the first dielectric backbone structure or the first plurality of vertically stacked horizontal channel structures or the second plurality of vertically stacked horizontal channel structures; 
 a third plurality of vertically stacked horizontal channel structures along the first side of the second dielectric backbone structure; 
 a fourth plurality of vertically stacked horizontal channel structures along the second side of the second dielectric backbone structure; 
 a third gate structure over and around the third plurality of vertically stacked horizontal channel structures; and 
 a fourth gate structure over and around the fourth plurality of vertically stacked horizontal channel structures. 
 
 
     
     
       12. The computing device of  claim 11 , further comprising:
 a memory coupled to the board. 
 
     
     
       13. The computing device of  claim 11 , further comprising:
 a communication chip coupled to the board. 
 
     
     
       14. The computing device of  claim 11 , further comprising:
 a processor coupled to the board. 
 
     
     
       15. The computing device of  claim 11 , further comprising:
 a battery coupled to the board. 
 
     
     
       16. The computing device of  claim 11 , further comprising:
 a GPS coupled to the board. 
 
     
     
       17. The computing device of  claim 11 , further comprising:
 a compass coupled to the board. 
 
     
     
       18. The computing device of  claim 11 , further comprising:
 a speaker coupled to the board. 
 
     
     
       19. The computing device of  claim 11 , wherein the component is a packaged integrated circuit die. 
     
     
       20. The computing device of  claim 11 , wherein the component is selected from the group consisting of a processor, a communications chip, and a digital signal processor.

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