Inventor

NAM SEOK-WOO

KR33 patents

⚠️ This page may combine multiple inventors who share the name “NAM SEOK-WOO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NAM SEOK-WOO

SAMSUNG ELECTRONICS CO LTD

Methods of forming isolation trenches including damaging a trench isolation mask

DRAM cell capacitor and method for manufacturing the same

Semiconductor device and method of fabricating the same

Semiconductor device and method of fabricating the same

Methods of forming integrated circuit capacitors having U-shaped electrodes

Semiconductor devices including diffusion barriers with high electronegativity metals

Methods of fabricating stack type capacitors of semiconductor devices

Etch stop structure and method of manufacture, and semiconductor device and method of manufacture

Method for manufacturing a DRAM cell capacitor

Semiconductor device and method of fabricating the same

Methods of forming capacitors of semiconductor devices including silicon-germanium and metallic electrodes

Dram cell capacitors having U-shaped electrodes with rough inner and outer surfaces

Semiconductor devices including buried channels

Semiconductor device and method of fabricating the same

Semiconductor device and method of fabricating the same

Method of forming an oxinitride layer

Storage electrode of a semiconductor device and method of forming the same

DRAM cell capacitor having hemispherical grain silicon on a selected portion of a storage node

Semiconductor device and method of fabricating the same

Semiconductor device

Semiconductor device and method of fabricating the same

Method of forming an oxide layer including increasing the temperature during oxidation

Method of forming a storage electrode of a semiconductor device

Methods of forming a capacitor structure and methods of manufacturing a semiconductor device using the same

Method of oxidizing a silicon substrate and method of forming an oxide layer using the same

Precursor composition for deposition of silicon dioxide film and method for fabricating semiconductor device using the same

Method of processing a substrate using an ion beam and apparatus for performing the same

Semiconductor memory device and method of manufacturing for preventing bit line oxidation

KIM JUNG-HWAN

Semiconductor device and method of fabricating the same

Semiconductor device and method of fabricating the same

SON YONG HOON

Semiconductor device including channel structure

LEE KWANG-WOOK

Semiconductor devices including gate structure and method of fabricating the same

CHUNG SEUNG-SIK

Method of forming semiconductor device having a capacitor