Inventor

CHIBA KEIKO

JP40 patents

⚠️ This page may combine multiple inventors who share the name “CHIBA KEIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHIBA KEIKO

CANON KK

X-ray mask, and exposure method and apparatus using the same

X-ray mask structure, process for production thereof, apparatus and method for X-ray exposure with the X-ray mask structure, and semiconductor device produced by the X-ray exposure method

X-ray mask, and exposure method and apparatus using the same

Mask structure exposure method

X-ray mask and X-ray exposure method using the same

X-ray mask structure and manufacturing methods including forming a metal oxide film on a portion of an X-ray permeable film having no X-ray absorber thereon

Lithographic mask structure and lithographic process

Reflection-type mask for use in pattern exposure, manufacturing method therefor, exposure apparatus, and method of manufacturing a device

Reflection type mask

Optical system and optical instrument with diffractive optical element

X-ray mask structure, and X-ray exposure method and apparatus using the same

Mask structure and method of manufacturing the same

Exposure apparatus, and device manufacturing method

Exposure method and X-ray mask structure for use with the same

Resist solution for photolithography including a base resin and an oxygen-free or low-oxygen solvent

Membrane and mask, and exposure apparatus using the mask, and device producing method using the mask

X-ray mask and fabrication process using it

Mask structure and exposure method and apparatus using the same

Mask and exposure apparatus using the same

Lithographic mask structure and method of producing the same comprising W and molybdenum alloy absorber

Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold

Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold

Imprinting method and curable composition for imprinting

Pattern forming method and methods for manufacturing processed substrate, optical component and quartz mold replica as well as coating material for imprint pretreatment and set thereof with imprint resist

Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold

Method of producing a patterned film

Three-dimensional structure forming method

Method for manufacturing optical element, optical element, optical system using optical element, optical apparatus and exposure apparatus using optical system, and method for manufacturing device

Method of manufacturing semiconductor devices by performing coating, heating, exposing and developing in a low-oxygen or oxygen free controlled environment

Method of making X-ray mask structure

Photomask comprising a holding frame and reinforcing member with a ceramic oxide bond

Molding apparatus, molding method, and template

Planarization method and photocurable composition

Method of forming pattern on a substrate

Planarization method and photocurable composition

Device manufacturing method

X-ray mask structure, and X-ray exposure method and apparatus using the same

Exposure apparatus and device manufacturing method

Photocurable composition, methods for producing film, optical component, circuit board, and electronic component by using the same, and cured product

TERUMO CORP

2,4-pentadienoic acid derivatives and platelet aggregation inhibitors containing the same