Inventor

LIN YIH-ANN

TW64 patents

⚠️ This page may combine multiple inventors who share the name “LIN YIH-ANN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIN YIH-ANN

TAIWAN SEMICONDUCTOR MFG CO LTD

FinFET device

Fin field-effect transistor devices and methods of forming the same

Self-aligned contact air gap formation

Method of forming an integrated circuit using a patterned mask layer

FinFET device

Method of forming a single metal that performs N work function and P work function in a high-k/metal gate process

Method of forming an integrated circuit using a patterned mask layer

Method of forming an integrated circuit using a patterned mask layer

Integrated high-K/metal gate in CMOS process flow

V-shape recess profile for embedded source/drain epitaxy

Self-aligned contact air gap formation

Method of forming an integrated circuit using a patterned mask layer

Methods for forming fin field-effect transistors

Air spacers around contact plugs and method forming same

Air spacers around contact plugs and method forming same

Semiconductor fin structures

Method of making a FinFET device including a step of removing a portion of a fin

Air spacers around contact plugs and method forming same

Self-aligned contact air gap formation

Methods for forming fin field-effect transistors

Method of forming an integrated circuit using a patterned mask layer

Gate stacks for semiconductor devices of different conductivity types

Method of making a FinFET device including a step of recessing a subset of the fins

Methods for forming fin field-effect transistors

Fin field-effect transistor devices and methods of forming the same

Single metal that performs N work function and P work function in a high-K/metal gate

Residue removal in metal gate cutting process

V-shape recess profile for embedded source/drain epitaxy

FinFET device with fins of non-uniform width

Methods for forming Fin field-effect transistors

Tunable structure profile

TAIWAN SEMICONDUCTOR MFG

Integrated high-K/metal gate in CMOS process flow

Method of making a FinFET device

Method of reducing a critical dimension of a semiconductor device

Integrated high-k/metal gate in CMOS process flow

Patterning methodology for uniformity control

Method of integrating high-K/metal gate in CMOS process flow

Wet cleaning method to eliminate copper corrosion

Method of forming an integrated circuit using a patterned mask layer

Method to enhance the adhesion between dry film and seed metal

Integrated high-k/metal gate in CMOS process flow

Solution for polymer and capping layer removing with wet dipping in HK metal gate etching process

Method for improved photomask alignment after epitaxial process through 90° orientation change

LIN YIH-ANN

Method of forming a single metal that performs N work function and P work function in a high-k/metal gate process

Methods of fabricating high-k metal gate devices

HSIEH TZU-YEN

Method of forming an integrated circuit

Lin yu chao

Patterning methodology for uniformity control

CHEN RYAN CHIA-JEN

Semiconductor fin structures and methods for forming the same

LIN CHIH-HAN

Method of forming a semiconductor device

LIN JR JUNG

Method to integrate gate etching as all-in-one process for high K metal gate