Inventor

LIN YI-TANG

TW64 patents

⚠️ This page may combine multiple inventors who share the name “LIN YI-TANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIN YI-TANG

TAIWAN SEMICONDUCTOR MFG CO LTD

Semiconductor logic circuits fabricated using multi-layer structures

Selective Fin-shaping process

Methods for forming STI regions in integrated circuits

Structure and method for providing line end extensions for fin-type active regions

Structure and method for providing line end extensions for fin-type active regions

Systems and methods for a semiconductor structure having multiple semiconductor-device layers

Systems and methods for a semiconductor structure having multiple semiconductor-device layers

Systems and methods for a semiconductor structure having multiple semiconductor-device layers

Structure and method for transistors with line end extension

Multi-layer semiconductor device structure

Structure and method for providing line end extensions for fin-type active regions

Systems and methods for a semiconductor structure having multiple semiconductor-device layers

System and methods for converting planar design to FinFET design

Eliminating fin mismatch using isolation last

Systems and methods for a semiconductor structure having multiple semiconductor-device layers

Inter-level connection for multi-layer structures

Inter-level connection for multi-layer structures

Semiconductor device and manufacturing method thereof

Systems and methods for a semiconductor structure having multiple semiconductor-device layers

FinFETs and the methods for forming the same

Adjusted fin width in integrated circuitry

Systems and methods for a semiconductor structure having multiple semiconductor-device layers

Forming STI regions to separate semiconductor Fins

Inter-level connection for multi-layer structures

Systems and methods for a semiconductor structure having multiple semiconductor-device layers

TAIWAN SEMICONDUCTOR MFG

System and methods for converting planar design to FinFET design

Method of forming a fin-like BJT

Multi-layer semiconductor device structure

FinFETs and the methods for forming the same

Method and device for increasing fin device density for unaligned fins

FinFETs and the methods for forming the same

Systems and methods for integrating different channel materials into a CMOS circuit by using a semiconductor structure having multiple transistor layers

Systems and methods for dopant activation using pre-amorphization implantation and microwave radiation

WANN CLEMENT HSINGJEN

System and methods for converting planar design to FinFET design

Selective fin-shaping process using plasma doping and etching for 3-dimensional transistor applications

Fin field effect transistors and methods for fabricating the same

System and methods for converting planar design to FinFET design

WANG CHIEN-HSUN

Device and method for forming Fins in integrated circuitry

Method for adjusting fin width in integrated circuitry

Method and device for increasing fin device density for unaligned fins

HO CHIA-CHENG

FinFETs and the methods for forming the same

FinFETs and the methods for forming the same

CHANG CHIH-SHENG

Fin-like BJT

Monitor test key of epi profile

YU SHAO-MING

Structure and method for transistor with line end extension

SHIEH MING-FENG

Mandrel modification for achieving single fin fin-like field effect transistor (FinFET) device

LIN YI-TANG

System and methods for converting planar design to FinFET design

LEI CHEOK-KEI

System and methods for converting planar design to FinFET design

MOSAID TECH INCORPORATED

Structure and method for providing line end extensions for fin-type active regions

MOSAID TECHNOLOGIES INC

Structure and method for providing line end extensions for fin-type active regions