Inventor

KISHIMOTO KATSUSHI

KR31 patents

⚠️ This page may combine multiple inventors who share the name “KISHIMOTO KATSUSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KISHIMOTO KATSUSHI

SAMSUNG DISPLAY CO LTD

Oxide sputtering target, and thin film transistor using the same

Apparatus for transferring substrate

Method of manufacturing light-emitting display device with reduced pressure drying

Bake system and method of fabricating display device using the same

Organic light emitting device and method of manufacturing the same

Organic light-emitting display apparatus having pixel electrodes with varying flatness

Vacuum drying apparatus and method of manufacturing film using the same

Oxide sputtering target, and thin film transistor using the same

Thin-film transistor with crystallized active layer, method of manufacturing the same, and organic light-emitting display device including the same

Thin film transistor array panel and manufacturing method thereof

Sputtering device and gas supply pipe for sputtering device

Oxide sputtering target, thin film transistor using the same, and method for manufacturing thin film transistor

Organic light emitting device and method of manufacturing the same

Oxide semiconductor depositing apparatus and method of manufacturing oxide semiconductor using the same

SHARP KK

Photovoltaic device and process for producing the same

Thin-film solar cell module

Method for manufacturing photoelectric conversion device

Thin film formation apparatus including engagement members for support during thermal expansion

Generation facility management system

Plasma processing apparatus and semiconductor device manufactured by the same apparatus

Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same

Plasma processing apparatus

Silicon-based thin-film photoelectric conversion device and method of manufacturing thereof

Semiconductor manufacturing apparatus and semiconductor manufacturing method using the same

Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same

Semiconductor device manufacturing unit and semiconductor device manufacturing method

KISHIMOTO KATSUSHI

Plasma processing apparatus and semiconductor device manufactured by the same apparatus

Substrate transfer apparatus and substrate transfer method

Plasma processing apparatus with an exhaust port above the substrate

Semiconductor layer manufacturing method, semiconductor layer manufacturing apparatus, and semiconductor device manufactured using such method and apparatus

FUKUOKA YUSUKE

Plasma processing apparatus and plasma processing method