Inventor

KELLY ANDREW JOSEPH

TW35 patents

⚠️ This page may combine multiple inventors who share the name “KELLY ANDREW JOSEPH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KELLY ANDREW JOSEPH

TAIWAN SEMICONDUCTOR MFG CO LTD

Method for forming semiconductor structure with metallic layer over source/drain structure

Forming a cavity with a wet etch for backside contact formation

Etch method with surface modification treatment for forming semiconductor structure

Semiconductor structure with contact over source/drain structure and method for forming the same

Forming a cavity with a wet etch for backside contact formation

Contact etchback in room temperature ionic liquid

Method of fabricating gate oxide of semiconductor device

Solvent-based oxidation on germanium and III-V compound semiconductor materials

Transistor device for source/drain backside contact and method of forming cavity

Method and system of control of epitaxial growth

Semiconductor device

Method for forming semiconductor structure with contact over source/drain structure

Method and system of control of epitaxial growth

Semiconductor fabrication with electrochemical apparatus

FinFET device with epitaxial structure

Method for forming semiconductor structure with contact over source/drain structure

Semiconductor fabrication with electrochemical apparatus

Semiconductor fabrication with electrochemical apparatus

Method for forming semiconductor structure with contact over source/drain structure

Thin oxide formation by wet chemical oxidation of semiconductor surface when the one component of the oxide is water soluble

Surface passivation on indium-based materials

Method of removing oxide on semiconductor surface by layer of sulfur

Gap filling method in semiconductor manufacturing process

Doping of high-K dielectric oxide by wet chemical treatment

TAIWAN SEMICONDUCTOR MFG

FinFET device with epitaxial structure

FinFET device with epitaxial structure

Thin oxide formation by wet chemical oxidation of semiconductor surface when the one component of the oxide is water soluble

FinFET with metal gate stressor

FinFET with metal gate stressor

Semiconductor device and method of forming the same

KELLY ANDREW JOSEPH

Method of making a FinFET device

FinFET with metal gate stressor

Gate structure for semiconductor device

WANN CLEMENT HSINGJEN

Semiconductor device and method of forming the same

CHIEN PEI-SHAN

Metal gate structure of a semiconductor device