Inventor
HARA SHINICHI
JP93 patents
⚠️ This page may combine multiple inventors who share the name “HARA SHINICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CANON KK
35 patentsUS5374829ADec 20, 1994
Vacuum chuck
CANON KK135 citations98
US5220171AJun 15, 1993
Wafer holding device in an exposure apparatus
CANON KK117 citations98
US6317479B1Nov 13, 2001
X-ray mask, and exposure method and apparatus using the same
CANON KK75 citations96
US6084938AJul 4, 2000
X-ray projection exposure apparatus and a device manufacturing method
CANON KK52 citations96
US5854819ADec 29, 1998
Mask supporting device and correction method therefor, and exposure apparatus and device producing method utilizing the same
CANON KK60 citations96
US5413167AMay 9, 1995
Wafer cooling device
CANON KK75 citations96
US5093579AMar 3, 1992
Exposure apparatus with a substrate holding mechanism
CANON KK61 citations96
US5063582ANov 5, 1991
Liquid cooled x-ray lithographic exposure apparatus
CANON KK91 citations96
US4969168ANov 6, 1990
Wafer supporting apparatus
CANON KK54 citations96
US5608773AMar 4, 1997
Mask holding device, and an exposure apparatus and a device manufacturing method using the device
CANON KK90 citations95
US6087053AJul 11, 2000
Device manufacturing method with transfer magnification adjustment to correct thermal distortion of substrate
CANON KK29 citations93
US5593800AJan 14, 1997
Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus
CANON KK52 citations93
US5544213AAug 6, 1996
Mask holding method, mask and mask chuck, exposure apparatus using the mask and the mask chuck, and device production method using the exposure apparatus
CANON KK32 citations93
US5323440AJun 21, 1994
X-ray lithography apparatus including a dose detectable mask
CANON KK21 citations93
US5157700AOct 20, 1992
Exposure apparatus for controlling intensity of exposure radiation
CANON KK41 citations93
US5155523AOct 13, 1992
Workpiece supporting mechanism
CANON KK35 citations93
US6984362B2Jan 10, 2006
Processing apparatus, measuring apparatus, and device manufacturing method
CANON KK26 citations92
US6728332B2Apr 27, 2004
X-ray mask, and exposure method and apparatus using the same
CANON KK20 citations92
US6616898B2Sep 9, 2003
Processing apparatus with pressure control and gas recirculation system
CANON KK36 citations92
US6069931AMay 30, 2000
Mask structure and mask holding mechanism for exposure apparatus
CANON KK20 citations92
US5999589ADec 7, 1999
Substrate holding device and exposing apparatus using the same
CANON KK28 citations92
US5883932AMar 16, 1999
Substrate holding device and exposing apparatus using the same
CANON KK38 citations92
US5485495AJan 16, 1996
X-ray mask, and exposure apparatus and device production using the mask
CANON KK34 citations92
US7212274B2May 1, 2007
Cooling system, exposure apparatus having the same, and device manufacturing method
CANON KK13 citations84
US6750946B2Jun 15, 2004
Processing apparatus for processing sample in predetermined atmosphere
CANON KK14 citations84
US6714277B2Mar 30, 2004
Exposure apparatus, gas replacement method, semiconductor device manufacturing method, semiconductor manufacturing factory and exposure apparatus maintenance method
CANON KK16 citations81
US7191599B2Mar 20, 2007
Cooling apparatus and method, and exposure apparatus having the cooling apparatus
CANON KK7 citations74
US7081949B2Jul 25, 2006
Illumination apparatus, projection exposure apparatus, and device fabrication method
CANON KK9 citations74
US7072438B2Jul 4, 2006
Reflection type mask
CANON KK5 citations74
US7068348B2Jun 27, 2006
Holding mechanism in exposure apparatus, and device manufacturing method
CANON KK10 citations74
US6804323B2Oct 12, 2004
Mask pattern magnification correction method, magnification correction apparatus, and mask structure
CANON KK11 citations74
US6584168B2Jun 24, 2003
X-ray projection exposure apparatus and a device manufacturing method
CANON KK5 citations74
US6310934B1Oct 30, 2001
X-ray projection exposure apparatus and a device manufacturing method
CANON KK8 citations74
US6005910ADec 21, 1999
Holding mechanism, and exposure apparatus using the mechanism
CANON KK13 citations74
US5825463AOct 20, 1998
Mask and mask supporting mechanism
CANON KK15 citations74
HITACHI LTD
2 patentsSHIBUYA KOGYO CO LTD
2 patentsNEC CORP
2 patentsFUJITSU LTD
1 patentCOMPUTER BASIC TECH RES
1 patentNEC ELECTRONICS CORP
1 patentMITSUBISHI PAPER MILLS LTD
1 patentTOSOH CORP
1 patentKOMATSU MFG CO LTD
1 patentCOMPUTER BASIC TECHNOLOGY ASS
1 patentMITUTOYO CORP
1 patentNAGANO HIDEKI
1 patentShowing the top 50 of 93 patents by PatentIndex Score.