Mask holding method, mask and mask chuck, exposure apparatus using the mask and the mask chuck, and device production method using the exposure apparatus

Abstract

V-shaped linear groove portions are formed at regular intervals and at three positions (with 120° pitches) on a periphery, concentric with a ring-shaped support frame, of an X-ray mask to extend in the radial direction. On the other hand, corresponding mounts, as projecting portions, each having a spherical leading end are disposed at three positions on a mask chuck. The mask is held on the mask chuck at the three positions by engaging the corresponding V-shaped linear groove portions and the projecting portions.

What is claimed is: 
     
       1. A method of holding a mask on a mask, chuck, said method comprising: providing a mask in which V-shaped linear groove portions are disposed at not less than three positions on a holding surface of the mask;   providing a mask chuck in which projecting portions are disposed at not less than three positions on a holding plane of the mask chuck;   aligning the V-shaped linear groove portions of the mask with the projecting portions of the mask chuck; and   engaging the V-shaped linear groove portions of the mask with corresponding projecting portions of the mask chuck to hold the mask on the mask chuck.   
     
     
       2. A mask holding method according to claim 1, wherein the mask is an X-ray mask. 
     
     
       3. A mask holding method according to claim 1, wherein the positions on the holding surface of the mask are equidistant and the positions on the holding plane of the mask chuck are equidistant. 
     
     
       4. A method of holding a mask on a mask chuck, said method comprising: providing a mask in which projecting portions are disposed at not less than three positions on a holding surface of the mask;   providing a mask chuck in which V-shaped linear groove portions are disposed at not less than three positions on a holding plane of the mask chuck;   aligning the projecting portions of the mask with the V-shaped linear groove portions of the mask chuck; and   engaging the projecting portions of the mask with corresponding V-shaped linear groove portions of the mask chuck to hold the mask on the mask chuck.   
     
     
       5. A mask holding method according to claim 4, wherein the mask is an X-ray mask. 
     
     
       6. A mask holding method according to claim 4, wherein the positions on the holding surface of the mask are equidistant and the positions on the holding plane of the mask chuck are equidistant. 
     
     
       7. A mask, comprising: a transfer pattern; and   a mask support frame having a holding surface, said mask support frame comprising one of V-shaped linear groove portions and projecting portions disposed at not less than three positions on the holding surface,   wherein one of the V-shaped linear groove portions and the projecting portions at the three positions on said mask support frame respectively engage with corresponding ones of projecting portions and V-shaped linear groove portions, respectively, disposed at not less than three positions on a holding plane of a mask chuck when said mask is held on the mask chuck.   
     
     
       8. A mask according to claim 7, wherein said mask is an X-ray mask. 
     
     
       9. A mask according to claim 7, wherein the positions on the holding surface of the mask are equidistant and the positions on the holding plane of the mask chuck are equidistant. 
     
     
       10. A mask chuck for holding a mask, comprising: a holding plane for holding the mask;   means for attracting the mask to said holding plane; and   one of projecting portions and V-shaped linear groove portions disposed at not less than three positions on said holding plane,   wherein one of the projecting portions and the V-shaped linear groove portions disposed at the three positions on said holding plane respectively engage with corresponding ones of V-shaped linear groove portions and projecting portions, respectively, disposed at not less than three positions on the mask when the mask is held on said holding plane.   
     
     
       11. A mask chuck according to claim 10, wherein the mask is an X-ray mask. 
     
     
       12. A mask chuck according to claim 10, wherein the positions on the holding surface of the mask are equidistant and the positions on the holding plane of the mask chuck are equidistant. 
     
     
       13. An exposure apparatus, comprising: a mask chuck for holding a mask, said mask chuck including a mask chuck holding plane having one of projecting portions and V-shaped linear groove portions disposed at not less than three positions thereon;   a mask including a mask holding plane having one of V-shaped linear groove portions and projecting portions, respectively corresponding to the projecting portions and the V-shaped linear groove portions of said mask chuck being disposed at not less than three positions on the mask holding plane, wherein corresponding portions of said mask chuck engage with those of said mask when said mask is held on said mask chuck; and   exposure means for transferring a pattern of said mask held on said mask chuck onto a wafer by exposure.   
     
     
       14. An exposure apparatus according to claim 13, wherein said exposure means performs exposure transfer by using X-rays. 
     
     
       15. An exposure apparatus according to claim 13, wherein the positions on the holding surface of the mask are equidistant and the positions on the holding plane of the mask chuck are equidistant.