P

Inventor

HSU WEI-YUNG

US50 patents
⚠️ This page may combine multiple inventors who share the name “HSU WEI-YUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TEXAS INSTRUMENTS INC

32 patents
US5796151AAug 18, 1998

Semiconductor stack having a dielectric sidewall for prevention of oxidation of tungsten in tungsten capped poly-silicon gate electrodes

TEXAS INSTRUMENTS INC112 citations98
US6245605B1Jun 12, 2001

Method to protect metal from oxidation during poly-metal gate formation in semiconductor device manufacturing

TEXAS INSTRUMENTS INC62 citations96
US6207561B1Mar 27, 2001

Selective oxidation methods for metal oxide deposition on metals in capacitor fabrication

TEXAS INSTRUMENTS INC62 citations96
US6143645ANov 7, 2000

Reduced temperature contact/via filling

TEXAS INSTRUMENTS INC77 citations96
US6100188AAug 8, 2000

Stable and low resistance metal/barrier/silicon stack structure and related process for manufacturing

TEXAS INSTRUMENTS INC55 citations96
US6077774AJun 20, 2000

Method of forming ultra-thin and conformal diffusion barriers encapsulating copper

TEXAS INSTRUMENTS INC82 citations96
US6008117ADec 28, 1999

Method of forming diffusion barriers encapsulating copper

TEXAS INSTRUMENTS INC78 citations96
US5892282AApr 6, 1999

Barrier-less plug structure

TEXAS INSTRUMENTS INC46 citations96
US5528153AJun 18, 1996

Method for non-destructive, non-contact measurement of dielectric constant of thin films

TEXAS INSTRUMENTS INC68 citations96
US6334249B2Jan 1, 2002

Cavity-filling method for reducing surface topography and roughness

TEXAS INSTRUMENTS INC48 citations93
US6323553B1Nov 27, 2001

Reduced temperature contact/via filling

TEXAS INSTRUMENTS INC25 citations93
US6245672B1Jun 12, 2001

Method of forming diffusion barriers for copper metallization in integrated cirucits

TEXAS INSTRUMENTS INC20 citations93
US6150252ANov 21, 2000

Multi-stage semiconductor cavity filling process

TEXAS INSTRUMENTS INC38 citations93
US6120842ASep 19, 2000

TiN+Al films and processes

TEXAS INSTRUMENTS INC22 citations93
US6077782AJun 20, 2000

Method to improve the texture of aluminum metallization

TEXAS INSTRUMENTS INC25 citations93
US6054382AApr 25, 2000

Method of improving texture of metal films in semiconductor integrated circuits

TEXAS INSTRUMENTS INC36 citations93
US5985763ANov 16, 1999

Method for producing barrier-less plug structures

TEXAS INSTRUMENTS INC26 citations93
US5573979ANov 12, 1996

Sloped storage node for a 3-D dram cell structure

TEXAS INSTRUMENTS INC56 citations93
US6184129B1Feb 6, 2001

Low resistivity poly-silicon gate produced by selective metal growth

TEXAS INSTRUMENTS INC43 citations92
US6194313B1Feb 27, 2001

Method for reducing recess for the formation of local interconnect and or plug trench fill for etchback process

TEXAS INSTRUMENTS INC41 citations91
US5998296ADec 7, 1999

Method of forming contacts and vias in semiconductor

TEXAS INSTRUMENTS INC28 citations90
US6660650B1Dec 9, 2003

Selective aluminum plug formation and etchback process

TEXAS INSTRUMENTS INC15 citations84
US6573167B2Jun 3, 2003

Using a carbon film as an etch hardmask for hard-to-etch materials

TEXAS INSTRUMENTS INC13 citations84
US6329282B1Dec 11, 2001

Method of improving the texture of aluminum metallization for tungsten etch back processing

TEXAS INSTRUMENTS INC15 citations84
US6680249B2Jan 20, 2004

Si-rich surface layer capped diffusion barriers

TEXAS INSTRUMENTS INC14 citations83
US6689686B2Feb 10, 2004

System and method for electroplating fine geometries

TEXAS INSTRUMENTS INC8 citations74
US6037013AMar 14, 2000

Barrier/liner with a SiNx-enriched surface layer on MOCVD prepared films

TEXAS INSTRUMENTS INC15 citations74
US6641867B1Nov 4, 2003

Methods for chemical vapor deposition of tungsten on silicon or dielectric

TEXAS INSTRUMENTS INC8 citations71
US6911689B2Jun 28, 2005

Versatile system for chromium based diffusion barriers in electrode structures

TEXAS INSTRUMENTS INC4 citations62
US6451677B1Sep 17, 2002

Plasma-enhanced chemical vapor deposition of a nucleation layer in a tungsten metallization process

TEXAS INSTRUMENTS INC6 citations60
US6677232B2Jan 13, 2004

Method for fabricating metal conductors and multi-level interconnects in a semiconductor device

TEXAS INSTRUMENTS INC2 citations57
US6424040B1Jul 23, 2002

Integration of fluorinated dielectrics in multi-level metallizations

TEXAS INSTRUMENTS INC0 citations52

APPLIED MATERIALS INC

16 patents
US6811680B2Nov 2, 2004

Planarization of substrates using electrochemical mechanical polishing

APPLIED MATERIALS INC102 citations98
US7175505B1Feb 13, 2007

Method for adjusting substrate processing times in a substrate polishing system

APPLIED MATERIALS INC21 citations93
US6884724B2Apr 26, 2005

Method for dishing reduction and feature passivation in polishing processes

APPLIED MATERIALS INC50 citations93
US7323416B2Jan 29, 2008

Method and composition for polishing a substrate

APPLIED MATERIALS INC20 citations92
US7993485B2Aug 9, 2011

Methods and apparatus for processing a substrate

APPLIED MATERIALS INC24 citations91
US6811470B2Nov 2, 2004

Methods and compositions for chemical mechanical polishing shallow trench isolation substrates

APPLIED MATERIALS INC20 citations90
US8043870B2Oct 25, 2011

CMP pad thickness and profile monitoring system

APPLIED MATERIALS INC18 citations84
US6677239B2Jan 13, 2004

Methods and compositions for chemical mechanical polishing

APPLIED MATERIALS INC16 citations84
US7037174B2May 2, 2006

Methods for reducing delamination during chemical mechanical polishing

APPLIED MATERIALS INC15 citations82
US7520795B2Apr 21, 2009

Grooved retaining ring

APPLIED MATERIALS INC8 citations81
US6896776B2May 24, 2005

Method and apparatus for electro-chemical processing

APPLIED MATERIALS INC4 citations63
US7749048B2Jul 6, 2010

Polishing pad conditioning process

APPLIED MATERIALS INC2 citations62
US8012000B2Sep 6, 2011

Extended pad life for ECMP and barrier removal

APPLIED MATERIALS INC2 citations61
US7390429B2Jun 24, 2008

Method and composition for electrochemical mechanical polishing processing

APPLIED MATERIALS INC3 citations61
US7244168B2Jul 17, 2007

Methods for reducing delamination during chemical mechanical polishing

APPLIED MATERIALS INC3 citations60
US7323095B2Jan 29, 2008

Integrated multi-step gap fill and all feature planarization for conductive materials

APPLIED MATERIALS INC0 citations52

CHUNG HUA

2 patents