Inventor
HSU WEI-YUNG
US50 patents
⚠️ This page may combine multiple inventors who share the name “HSU WEI-YUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TEXAS INSTRUMENTS INC
32 patentsUS5796151AAug 18, 1998
Semiconductor stack having a dielectric sidewall for prevention of oxidation of tungsten in tungsten capped poly-silicon gate electrodes
TEXAS INSTRUMENTS INC112 citations98
US6245605B1Jun 12, 2001
Method to protect metal from oxidation during poly-metal gate formation in semiconductor device manufacturing
TEXAS INSTRUMENTS INC62 citations96
US6207561B1Mar 27, 2001
Selective oxidation methods for metal oxide deposition on metals in capacitor fabrication
TEXAS INSTRUMENTS INC62 citations96
US6143645ANov 7, 2000
Reduced temperature contact/via filling
TEXAS INSTRUMENTS INC77 citations96
US6100188AAug 8, 2000
Stable and low resistance metal/barrier/silicon stack structure and related process for manufacturing
TEXAS INSTRUMENTS INC55 citations96
US6077774AJun 20, 2000
Method of forming ultra-thin and conformal diffusion barriers encapsulating copper
TEXAS INSTRUMENTS INC82 citations96
US6008117ADec 28, 1999
Method of forming diffusion barriers encapsulating copper
TEXAS INSTRUMENTS INC78 citations96
US5892282AApr 6, 1999
Barrier-less plug structure
TEXAS INSTRUMENTS INC46 citations96
US5528153AJun 18, 1996
Method for non-destructive, non-contact measurement of dielectric constant of thin films
TEXAS INSTRUMENTS INC68 citations96
US6334249B2Jan 1, 2002
Cavity-filling method for reducing surface topography and roughness
TEXAS INSTRUMENTS INC48 citations93
US6323553B1Nov 27, 2001
Reduced temperature contact/via filling
TEXAS INSTRUMENTS INC25 citations93
US6245672B1Jun 12, 2001
Method of forming diffusion barriers for copper metallization in integrated cirucits
TEXAS INSTRUMENTS INC20 citations93
US6150252ANov 21, 2000
Multi-stage semiconductor cavity filling process
TEXAS INSTRUMENTS INC38 citations93
US6120842ASep 19, 2000
TiN+Al films and processes
TEXAS INSTRUMENTS INC22 citations93
US6077782AJun 20, 2000
Method to improve the texture of aluminum metallization
TEXAS INSTRUMENTS INC25 citations93
US6054382AApr 25, 2000
Method of improving texture of metal films in semiconductor integrated circuits
TEXAS INSTRUMENTS INC36 citations93
US5985763ANov 16, 1999
Method for producing barrier-less plug structures
TEXAS INSTRUMENTS INC26 citations93
US5573979ANov 12, 1996
Sloped storage node for a 3-D dram cell structure
TEXAS INSTRUMENTS INC56 citations93
US6184129B1Feb 6, 2001
Low resistivity poly-silicon gate produced by selective metal growth
TEXAS INSTRUMENTS INC43 citations92
US6194313B1Feb 27, 2001
Method for reducing recess for the formation of local interconnect and or plug trench fill for etchback process
TEXAS INSTRUMENTS INC41 citations91
US5998296ADec 7, 1999
Method of forming contacts and vias in semiconductor
TEXAS INSTRUMENTS INC28 citations90
US6660650B1Dec 9, 2003
Selective aluminum plug formation and etchback process
TEXAS INSTRUMENTS INC15 citations84
US6573167B2Jun 3, 2003
Using a carbon film as an etch hardmask for hard-to-etch materials
TEXAS INSTRUMENTS INC13 citations84
US6329282B1Dec 11, 2001
Method of improving the texture of aluminum metallization for tungsten etch back processing
TEXAS INSTRUMENTS INC15 citations84
US6680249B2Jan 20, 2004
Si-rich surface layer capped diffusion barriers
TEXAS INSTRUMENTS INC14 citations83
US6689686B2Feb 10, 2004
System and method for electroplating fine geometries
TEXAS INSTRUMENTS INC8 citations74
US6037013AMar 14, 2000
Barrier/liner with a SiNx-enriched surface layer on MOCVD prepared films
TEXAS INSTRUMENTS INC15 citations74
US6641867B1Nov 4, 2003
Methods for chemical vapor deposition of tungsten on silicon or dielectric
TEXAS INSTRUMENTS INC8 citations71
US6911689B2Jun 28, 2005
Versatile system for chromium based diffusion barriers in electrode structures
TEXAS INSTRUMENTS INC4 citations62
US6451677B1Sep 17, 2002
Plasma-enhanced chemical vapor deposition of a nucleation layer in a tungsten metallization process
TEXAS INSTRUMENTS INC6 citations60
US6677232B2Jan 13, 2004
Method for fabricating metal conductors and multi-level interconnects in a semiconductor device
TEXAS INSTRUMENTS INC2 citations57
US6424040B1Jul 23, 2002
Integration of fluorinated dielectrics in multi-level metallizations
TEXAS INSTRUMENTS INC0 citations52
APPLIED MATERIALS INC
16 patentsUS6811680B2Nov 2, 2004
Planarization of substrates using electrochemical mechanical polishing
APPLIED MATERIALS INC102 citations98
US7175505B1Feb 13, 2007
Method for adjusting substrate processing times in a substrate polishing system
APPLIED MATERIALS INC21 citations93
US6884724B2Apr 26, 2005
Method for dishing reduction and feature passivation in polishing processes
APPLIED MATERIALS INC50 citations93
US7323416B2Jan 29, 2008
Method and composition for polishing a substrate
APPLIED MATERIALS INC20 citations92
US7993485B2Aug 9, 2011
Methods and apparatus for processing a substrate
APPLIED MATERIALS INC24 citations91
US6811470B2Nov 2, 2004
Methods and compositions for chemical mechanical polishing shallow trench isolation substrates
APPLIED MATERIALS INC20 citations90
US8043870B2Oct 25, 2011
CMP pad thickness and profile monitoring system
APPLIED MATERIALS INC18 citations84
US6677239B2Jan 13, 2004
Methods and compositions for chemical mechanical polishing
APPLIED MATERIALS INC16 citations84
US7037174B2May 2, 2006
Methods for reducing delamination during chemical mechanical polishing
APPLIED MATERIALS INC15 citations82
US7520795B2Apr 21, 2009
Grooved retaining ring
APPLIED MATERIALS INC8 citations81
US6896776B2May 24, 2005
Method and apparatus for electro-chemical processing
APPLIED MATERIALS INC4 citations63
US7749048B2Jul 6, 2010
Polishing pad conditioning process
APPLIED MATERIALS INC2 citations62
US8012000B2Sep 6, 2011
Extended pad life for ECMP and barrier removal
APPLIED MATERIALS INC2 citations61
US7390429B2Jun 24, 2008
Method and composition for electrochemical mechanical polishing processing
APPLIED MATERIALS INC3 citations61
US7244168B2Jul 17, 2007
Methods for reducing delamination during chemical mechanical polishing
APPLIED MATERIALS INC3 citations60
US7323095B2Jan 29, 2008
Integrated multi-step gap fill and all feature planarization for conductive materials
APPLIED MATERIALS INC0 citations52