Inventor
USHIDA KAZUO
JP24 patents
⚠️ This page may combine multiple inventors who share the name “USHIDA KAZUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
16 patentsUS5883704AMar 16, 1999
Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system
NIKON CORP183 citations99
US6049374AApr 11, 2000
Illumination apparatus, a projection exposure apparatus having the same, a method of manufacturing a device using the same, and a method of manufacturing the projection exposure apparatus
NIKON CORP61 citations96
US5636000AJun 3, 1997
Projection optical system and projection exposure apparatus using the same
NIKON CORP62 citations96
US4931830AJun 5, 1990
Projection exposure apparatus
NIKON CORP108 citations96
US6262793B1Jul 17, 2001
Method of manufacturing and using correction member to correct aberration in projection exposure apparatus
NIKON CORP55 citations95
US6449031B1Sep 10, 2002
Method for use of a critical dimensional test structure
NIKON CORP17 citations92
US5943172AAug 24, 1999
Projection optical system and projection exposure apparatus
NIKON CORP34 citations92
US5831776ANov 3, 1998
Projection optical system and projection exposure apparatus
NIKON CORP38 citations92
US5805344ASep 8, 1998
Projection optical system and projection exposure apparatus
NIKON CORP34 citations92
US5311362AMay 10, 1994
Projection exposure apparatus
NIKON CORP28 citations92
US4965630AOct 23, 1990
Projection exposure apparatus
NIKON CORP50 citations91
US5754340AMay 19, 1998
Projection optical system and projection exposure apparatus using the same
NIKON CORP16 citations74
US6958803B2Oct 25, 2005
Projection exposure apparatus and method with adjustment of rotationally asymmetric optical characteristics
NIKON CORP10 citations73
US5576801ANov 19, 1996
Projection exposure apparatus
NIKON CORP12 citations73
US5530518AJun 25, 1996
Projection exposure apparatus
NIKON CORP15 citations73
US6610460B2Aug 26, 2003
Exposure method
NIKON CORP2 citations62
NIPPON KOGAKU KK
6 patentsUS4734746AMar 29, 1988
Exposure method and system for photolithography
NIPPON KOGAKU KK72 citations96
USRE38320ENov 18, 2003
Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system
NIPPON KOGAKU KK20 citations92
US4403835ASep 13, 1983
Objective lens for microscope
NIPPON KOGAKU KK12 citations74
US4592624AJun 3, 1986
Objective lens for microscope of low magnification
NIPPON KOGAKU KK2 citations63
USRE38403EJan 27, 2004
Projection optical system and projection exposure apparatus
NIPPON KOGAKU KK2 citations62
USRE39662EMay 29, 2007
Projection exposure apparatus
NIPPON KOGAKU KK1 citations52