Inventor

YOSHITAKE YASUHIRO

JP61 patents

⚠️ This page may combine multiple inventors who share the name “YOSHITAKE YASUHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YOSHITAKE YASUHIRO

HITACHI LTD

Method and system for processing a semi-conductor device

Method and equipment for detecting pattern defect

Process control system

Method and apparatus for processing inspection data

Pattern detecting method, pattern detecting apparatus, projection exposing apparatus using the same and exposure system

Illumination apparatus for exposure

Inspection system and method for manufacturing electronic devices using the inspection system

Illuminating method and illuminating apparatus for carrying out the same, and projection exposure method and projection exposure apparatus for carrying out the same

Method and system for monitoring a semiconductor device manufacturing process

Method and its apparatus for manufacturing semiconductor device

Method for producing a semiconductor device

Semiconductor exposing system having apparatus for correcting change in wavelength of light source

Exposure processing method and exposure system for the same

Method of determining lethality of defects in circuit pattern inspection method of selecting defects to be reviewed and inspection system of circuit patterns involved with the methods

Process management system

Overlay inspection apparatus for semiconductor substrate and method thereof

Semiconductor device inspection and analysis method and its apparatus and a method for manufacturing a semiconductor device

Method and apparatus for optical alignment of semiconductor by using a hologram

Method and equipment for detecting pattern defect

Method and apparatus for measuring displacement of a sample

Method and equipment for detecting pattern defect

Method and equipment for detecting pattern defect

Process and apparatus for manufacturing semiconductor device

Method of determining lethality of defects in circuit pattern inspection, method of selecting defects to be reviewed, and inspection system of circuit patterns involved with the methods

Overlay inspection apparatus for semiconductor substrate and method thereof

Method and apparatus for pattern detection

Reduced-projection exposure system with chromatic aberration correction system including diffractive lens such as holographic lens

Exposure method

Method and apparatus for measuring minute displacement by subject light diffracted and reflected from a grating to heterodyne interference

HITACHI HIGH TECH CORP

Dimension measuring SEM system, method of evaluating shape of circuit pattern and a system for carrying out the method

Method and apparatus for reviewing defect

Defect inspection system

Method for optically detecting height of a specimen and charged particle beam apparatus using the same

Method and apparatus for inspecting a semiconductor device

Defect inspection apparatus and pattern chip

Defect inspection device, pattern chip, and defect inspection method

SHIBATA YUKIHIRO

Method and apparatus for inspecting defects

Method and apparatus for inspecting defects

UENO TAKETO

Defect inspection system

Defect inspection system

UNIV ROCHESTER

Refractive/diffractive optical system for broad-band through-the-lens imaging of alignment marks on substrates in stepper machines

RENESAS TECH CORP

Method for controlling semiconductor device production process and a method for producing semiconductor devices

UENO TAKEO

Method and apparatus for inspecting defects

(unassigned)

Exposure mask with appended mask error data

HIROSE TAKENORI

Method and apparatus for inspecting defects of patterns formed on a hard disk medium

YOSHITAKE YASUHIRO

Method and apparatus for inspecting defects

TACHIZAKI TAKEHIRO

Distance measuring device and distance measuring method

SANDISK TECHNOLOGIES LLC

Optical inspection tool and method

WATANABE MASAHIRO

Pattern inspection device of substrate surface and pattern inspection method of the same

NAKATA TOSHIHIKO

Method and apparatus for measuring displacement of a sample using a wire grid polarizer to generate interference light