Inventor
RESNICK DOUGLAS J
US33 patents
⚠️ This page may combine multiple inventors who share the name “RESNICK DOUGLAS J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MOTOROLA INC
13 patentsUS6368924B1Apr 9, 2002
Amorphous carbon layer for improved adhesion of photoresist and method of fabrication
MOTOROLA INC40 citations96
US6024885AFeb 15, 2000
Process for patterning magnetic films
MOTOROLA INC52 citations95
US6300042B1Oct 9, 2001
Lithographic printing method using a low surface energy layer
MOTOROLA INC38 citations92
US5464711ANov 7, 1995
Process for fabricating an X-ray absorbing mask
MOTOROLA INC39 citations92
US7163888B2Jan 16, 2007
Direct imprinting of etch barriers using step and flash imprint lithography
MOTOROLA INC15 citations79
US6576520B2Jun 10, 2003
Amorphous carbon layer for improved adhesion of photoresist and method of fabrication
MOTOROLA INC6 citations74
US6562553B2May 13, 2003
Lithographic printing method using a low surface energy layer
MOTOROLA INC5 citations73
US6368752B1Apr 9, 2002
Low stress hard mask formation method during refractory radiation mask fabrication
MOTOROLA INC9 citations73
US6630746B1Oct 7, 2003
Semiconductor device and method of making the same
MOTOROLA INC7 citations72
US6083806AJul 4, 2000
Method of forming an alignment mark
MOTOROLA INC10 citations72
US5266183ANov 30, 1993
Method for plating an x-ray mask
MOTOROLA INC4 citations62
US5590239ADec 31, 1996
Planar uniform heating surface with additional circumscribing ring
MOTOROLA INC2 citations59
US5509041AApr 16, 1996
X-ray lithography method for irradiating an object to form a pattern thereon
MOTOROLA INC6 citations59
MOLECULAR IMPRINTS INC
6 patentsUS7547398B2Jun 16, 2009
Self-aligned process for fabricating imprint templates containing variously etched features
MOLECULAR IMPRINTS INC20 citations90
USRE47483EJul 2, 2019
Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template
MOLECULAR IMPRINTS INC3 citations73
US9452574B2Sep 27, 2016
Fabrication of seamless large area master templates for imprint lithography using step and repeat tools
MOLECULAR IMPRINTS INC3 citations73
US7874831B2Jan 25, 2011
Template having a silicon nitride, silicon carbide or silicon oxynitride film
MOLECULAR IMPRINTS INC2 citations62
US7985530B2Jul 26, 2011
Etch-enhanced technique for lift-off patterning
MOLECULAR IMPRINTS INC1 citations52
US7906274B2Mar 15, 2011
Method of creating a template employing a lift-off process
MOLECULAR IMPRINTS INC0 citations41
CANON KK
4 patentsUS10580659B2Mar 3, 2020
Planarization process and apparatus
CANON KK3 citations73
US10663869B2May 26, 2020
Imprint system and imprinting process with spatially non-uniform illumination
CANON KK4 citations72
US11126083B2Sep 21, 2021
Superstrate and a method of using the same
CANON KK1 citations62
US10079152B1Sep 18, 2018
Method for forming planarized etch mask structures over existing topography
CANON KK0 citations42
FREESCALE SEMICONDUCTOR INC
3 patentsUS6852454B2Feb 8, 2005
Multi-tiered lithographic template and method of formation and use
FREESCALE SEMICONDUCTOR INC35 citations92
US7432024B2Oct 7, 2008
Lithographic template and method of formation and use
FREESCALE SEMICONDUCTOR INC6 citations72
US7083880B2Aug 1, 2006
Lithographic template and method of formation and use
FREESCALE SEMICONDUCTOR INC7 citations72