Inventor

WU HUI-JUNG

US44 patents

⚠️ This page may combine multiple inventors who share the name “WU HUI-JUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WU HUI-JUNG

LAM RES CORP

Tin oxide films in semiconductor device manufacturing

Tin oxide films in semiconductor device manufacturing

Tin oxide films in semiconductor device manufacturing

Tin oxide mandrels in patterning

Selective formation of dielectric barriers for metal interconnects in semiconductor devices

Tin oxide films in semiconductor device manufacturing

Tin oxide films in semiconductor device manufacturing

Tin oxide mandrels in patterning

Chamfer-less via integration scheme

Liner and barrier applications for subtractive metal integration

Self-aligned vertical integration of three-terminal memory devices

Liner and barrier applications for subtractive metal integration

Film stack simplification for high aspect ratio patterning and vertical scaling

HONEYWELL INT INC

Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography

Simplified method to produce nanoporous silicon-based films

Low dielectric constant polyorganosilicon coatings generated from polycarbosilanes

Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography

Low dielectric constant films used as copper diffusion barrier

Nanoporous material fabricated using a dissolvable reagent

Polycarbosilane adhesion promoters for low dielectric constant polymeric materials

Polycarbosilane adhesion promoters for low dielectric constant polymeric materials

Low dielectric constant polyorganosilicon materials generated from polycarbosilanes

ALLIED SIGNAL INC

Use of multifunctional reagents for the surface modification of nanoporous silica films

Multifunctional reagents for the surface modification of nanoporous silica films

Low dielectric constant polyorganosilicon coatings generated from polycarbosilanes

Edge bead removal for nanoporous dielectric silica coatings

Nanoporous silica treated with siloxane polymers for ULSI applications

Nanoporous silica via combined stream deposition

Use of multifunctional si-based oligomer/polymer for the surface modification of nanoporous silica films

Simplified process for producing nanoporous silica

NOVELLUS SYSTEMS INC

Protective self-aligned buffer layers for damascene interconnects

Protective self-aligned buffer layers for damascene interconnects

Deposition of doped copper seed layers having improved reliability

Protective self-aligned buffer layers for damascene interconnects

COLGATE PALMOLIVE CO

Cosmetic composition containing silicon-modified amides as thickening agents and method of forming same

Cosmetic composition containing thickening agent of siloxane polymer with hydrogen-bonding groups

YU JENGYI

Interfacial capping layers for interconnects

Metal and silicon containing capping layers for interconnects

CHROMA ATE INC

Low-thermal resistance pressing device for a socket

Chip-fixing device for a socket

HONEYWELL INT

Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography

ALLIEDSIGNAL

Simplified process for producing nanoporous silica

CHATTOPADHYAY KAUSHIK

Methods for reducing UV and dielectric diffusion barrier interaction

WU HUI-JUNG

Reducing UV and dielectric diffusion barrier interaction through the modulation of optical properties