Inventor · disambiguated record
Carola Blaesing-Bangert
Also filed as: BLAESING-BANGERT CAROLA
13 granted patents·1 pending application·121 citations·filing 1999–2023
90Inventor score
Top patents by PatentIndex Score
14 records- 0183US6377870B1Device and method for delivering various transparent substrates into a high-precision measuring instrumentLEICA MICROSYSTEMS·Filed 2000·Granted Apr 23, 2002·31 cites·17 claims
- 0277US10585274B2Method for capturing and compensating ambient effects in a measuring microscopeZEISS CARL SMT GMBH·Filed 2018·Granted Mar 10, 2020·2 cites·22 claims
- 0374US6323953B1Method and device for measuring structures on a transparent substrateLEICA MICROSYSTEMS·Filed 1999·Granted Nov 27, 2001·43 cites·38 claims
- 0467US9354048B2Method for measuring a lithography mask or a mask blankZEISS CARL SMS GMBH·Filed 2015·Granted May 31, 2016·1 cites·21 claims
- 0567US6778260B2Coordinate measuring stage and coordinate measuring instrumentLEICA MICROSYSTEMS·Filed 2002·Granted Aug 17, 2004·9 cites·18 claims
- 0664US6816253B1Substrate holder, and use of the substrate holder in a highly accurate measuring instrumentLEICA MICROSYSTEMS·Filed 2000·Granted Nov 9, 2004·8 cites·21 claims
- 0763US9528825B2Method for calibrating a position-measuring system and position-measuring systemZEISS CARL SMS GMBH·Filed 2014·Granted Dec 27, 2016·2 cites·19 claims
- 0858US7081963B2Substrate holder, and use of the substrate holder in a highly accurate measuring instrumentLEICA MICROSYSTEMS·Filed 2004·Granted Jul 25, 2006·5 cites·7 claims
- 0957US12353126B2Method and device for qualifying a mask of a lithography systemZEISS CARL SMT GMBH·Filed 2023·Granted Jul 8, 2025·0 cites·20 claims
- 1057US6441899B1Apparatus and method for loading substrates of various sizes into substrate holdersLEICA MICROSYSTEMS·Filed 2000·Granted Aug 27, 2002·6 cites·16 claims
- 1152US11243464B2Method and apparatus for transforming measurement data of a photolithographic mask for the EUV range from first surroundings into second surroundingsZEISS CARL SMT GMBH·Filed 2019·Granted Feb 8, 2022·0 cites·19 claims
- 1250US12321091B2Device and method for determining placements of pattern elements of a reflective photolithographic mask in the operating environment thereofZEISS CARL SMT GMBH·Filed 2021·Granted Jun 3, 2025·0 cites·27 claims
- 1343US6226087B1Method for measuring the positions of structures on a mask surfaceLEICA MICROSYSTEMS·Filed 1999·Granted May 1, 2001·14 cites·21 claims
- 1437US2004120579A1Method and microscope for detecting images of an objectLEICA MICROSYSTEMS·Filed 2003·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →