Inventor
FURUSAWA YOSHIKAZU
JP15 patents
⚠️ This page may combine multiple inventors who share the name “FURUSAWA YOSHIKAZU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
12 patentsUS7648895B2Jan 19, 2010
Vertical CVD apparatus for forming silicon-germanium film
TOKYO ELECTRON LTD337 citations98
USD588078SMar 10, 2009
Heat dissipation deterrence link for semiconductor manufacture
TOKYO ELECTRON LTD13 citations84
US7208428B2Apr 24, 2007
Method and apparatus for treating article to be treated
TOKYO ELECTRON LTD17 citations82
US9758865B2Sep 12, 2017
Silicon film forming method, thin film forming method and cross-sectional shape control method
TOKYO ELECTRON LTD4 citations73
US7273818B2Sep 25, 2007
Film formation method and apparatus for semiconductor process
TOKYO ELECTRON LTD7 citations73
US9540743B2Jan 10, 2017
Amorphous silicon crystallizing method, crystallized silicon film forming method, semiconductor device manufacturing method and film forming apparatus
TOKYO ELECTRON LTD3 citations68
US7064084B2Jun 20, 2006
Oxide film forming method
TOKYO ELECTRON LTD4 citations62
US9478423B2Oct 25, 2016
Method of vapor-diffusing impurities
TOKYO ELECTRON LTD0 citations52
USD588079SMar 10, 2009
Heat dissipation deterrence link for semiconductor manufacture
TOKYO ELECTRON LTD1 citations52
US10619247B2Apr 14, 2020
Substrate processing apparatus, injector, and substrate processing method
TOKYO ELECTRON LTD0 citations51
US8906792B2Dec 9, 2014
Impurity diffusion method, substrate processing apparatus, and method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations41
US10573518B2Feb 25, 2020
Film forming method and vertical thermal processing apparatus
TOKYO ELECTRON LTD0 citations40