Inventor
TAKEI SATOSHI
JP22 patents
⚠️ This page may combine multiple inventors who share the name “TAKEI SATOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NISSAN CHEMICAL IND LTD
12 patentsUS7226721B2Jun 5, 2007
Underlayer coating forming composition for lithography containing compound having protected carboxyl group
NISSAN CHEMICAL IND LTD15 citations84
US8048615B2Nov 1, 2011
Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating
NISSAN CHEMICAL IND LTD17 citations83
US7727902B2Jun 1, 2010
Composition for forming nitride coating film for hard mask
NISSAN CHEMICAL IND LTD13 citations83
US7361718B2Apr 22, 2008
Alkali-soluble gap fill material forming composition for lithography
NISSAN CHEMICAL IND LTD9 citations83
US7517633B2Apr 14, 2009
Composition for forming gap-filling material for lithography
NISSAN CHEMICAL IND LTD9 citations82
US7687223B2Mar 30, 2010
Underlayer coating forming composition for lithography containing cyclodextrin compound
NISSAN CHEMICAL IND LTD4 citations63
US9134610B2Sep 15, 2015
Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating
NISSAN CHEMICAL IND LTD2 citations62
US8007979B2Aug 30, 2011
Acrylic polymer-containing gap fill material forming composition for lithography
NISSAN CHEMICAL IND LTD6 citations62
US7842620B2Nov 30, 2010
Method for manufacturing semiconductor device using quadruple-layer laminate
NISSAN CHEMICAL IND LTD6 citations62
US7365023B2Apr 29, 2008
Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating
NISSAN CHEMICAL IND LTD2 citations62
US7425347B2Sep 16, 2008
Composition for forming anti-reflective coating for use in lithography
NISSAN CHEMICAL IND LTD6 citations58
US9946158B2Apr 17, 2018
Composition for forming resist underlayer film for nanoimprint
NISSAN CHEMICAL IND LTD1 citations51
TAKEI SATOSHI
5 patentsUS8426111B2Apr 23, 2013
Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating
TAKEI SATOSHI6 citations82
US10509320B2Dec 17, 2019
Underlying coating forming composition for lithography containing compound having protected carboxyl group
TAKEI SATOSHI1 citations61
US8088546B2Jan 3, 2012
Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom
TAKEI SATOSHI2 citations61
US8916327B2Dec 23, 2014
Underlayer coating forming composition containing dextrin ester compound
TAKEI SATOSHI1 citations50
US8163460B2Apr 24, 2012
Underlayer coating forming composition for lithography containing polysilane compound
TAKEI SATOSHI0 citations40