Inventor
SHIBA MASATAKA
JP39 patents
⚠️ This page may combine multiple inventors who share the name “SHIBA MASATAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
33 patentsUS6542830B1Apr 1, 2003
Process control system
HITACHI LTD93 citations96
US6456951B1Sep 24, 2002
Method and apparatus for processing inspection data
HITACHI LTD58 citations96
US5329333AJul 12, 1994
Exposure apparatus and method
HITACHI LTD45 citations96
US4819033AApr 4, 1989
Illumination apparatus for exposure
HITACHI LTD55 citations96
US4669875AJun 2, 1987
Foreign particle detecting method and apparatus
HITACHI LTD79 citations96
US4668089AMay 26, 1987
Exposure apparatus and method of aligning exposure mask with workpiece
HITACHI LTD85 citations96
US6002989ADec 14, 1999
System for quality control where inspection frequency of inspection apparatus is reset to minimize expected total loss based on derived frequency function and loss value
HITACHI LTD84 citations94
US5153916AOct 6, 1992
Method and apparatus for detecting focal plane
HITACHI LTD76 citations94
US4906852AMar 6, 1990
Projection alignment method and apparatus
HITACHI LTD23 citations93
US4676637AJun 30, 1987
Exposure apparatus with foreign particle detector
HITACHI LTD44 citations93
US6650409B1Nov 18, 2003
Semiconductor device producing method, system for carrying out the same and semiconductor work processing apparatus included in the same system
HITACHI LTD39 citations92
US6485891B1Nov 26, 2002
Exposure apparatus and method
HITACHI LTD21 citations92
US6334097B1Dec 25, 2001
Method of determining lethality of defects in circuit pattern inspection method of selecting defects to be reviewed and inspection system of circuit patterns involved with the methods
HITACHI LTD29 citations92
US6016187AJan 18, 2000
Exposure apparatus and method
HITACHI LTD20 citations92
US5767949AJun 16, 1998
Exposure apparatus and method
HITACHI LTD20 citations92
US5747201AMay 5, 1998
Controlling method of forming thin film, system for said controlling method, exposure method and system for said exposure method
HITACHI LTD28 citations92
US5409538AApr 25, 1995
Controlling method of forming thin film, system for said controlling method, exposure method and system for said exposure method
HITACHI LTD26 citations92
US5191624AMar 2, 1993
Optical information storing apparatus and method for production of optical deflector
HITACHI LTD22 citations92
US5121449AJun 9, 1992
Information detecting system of scanning type
HITACHI LTD25 citations92
US5008702AApr 16, 1991
Exposure method and apparatus
HITACHI LTD33 citations92
US6757621B2Jun 29, 2004
Process management system
HITACHI LTD35 citations91
US5526094AJun 11, 1996
Exposure apparatus and method
HITACHI LTD11 citations82
US4458302AJul 3, 1984
Reflection type optical focusing apparatus
HITACHI LTD19 citations82
US6556955B2Apr 29, 2003
Method of determining lethality of defects in circuit pattern inspection, method of selecting defects to be reviewed, and inspection system of circuit patterns involved with the methods
HITACHI LTD7 citations74
US4795261AJan 3, 1989
Reduction projection type aligner
HITACHI LTD12 citations74
US4777374AOct 11, 1988
Pattern position detecting method and apparatus for detecting the position of an alignment direction of a wafer target pattern
HITACHI LTD10 citations74
US4701050AOct 20, 1987
Semiconductor exposure apparatus and alignment method therefor
HITACHI LTD12 citations74
US6335146B1Jan 1, 2002
Exposure apparatus and method
HITACHI LTD5 citations73
US5195070AMar 16, 1993
Optical information processing apparatus and optical pickup therefor
HITACHI LTD15 citations73
US4993837AFeb 19, 1991
Method and apparatus for pattern detection
HITACHI LTD12 citations73
US4725737AFeb 16, 1988
Alignment method and apparatus for reduction projection type aligner
HITACHI LTD17 citations73
US5324953AJun 28, 1994
Reduced-projection exposure system with chromatic aberration correction system including diffractive lens such as holographic lens
HITACHI LTD4 citations63
US5187756AFeb 16, 1993
Surface acoustic waveguide device and manufacturing method
HITACHI LTD3 citations63
RENESAS TECH CORP
4 patentsUS7277155B2Oct 2, 2007
Exposure apparatus and method
RENESAS TECH CORP4 citations73
US7012671B2Mar 14, 2006
Exposure apparatus and method
RENESAS TECH CORP2 citations62
US7604925B2Oct 20, 2009
Exposure apparatus and method
RENESAS TECH CORP0 citations52
US7598020B2Oct 6, 2009
Exposure apparatus and method
RENESAS TECH CORP0 citations52