P

Inventor

YANG CHIN-CHENG

TW69 patents
⚠️ This page may combine multiple inventors who share the name “YANG CHIN-CHENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MACRONIX INT CO LTD

40 patents
US8383512B2Feb 26, 2013

Method for making multilayer connection structure

MACRONIX INT CO LTD58 citations98
US9425209B1Aug 23, 2016

Multilayer 3-D structure with mirror image landing regions

MACRONIX INT CO LTD22 citations88
US10446437B2Oct 15, 2019

Interlevel connectors in multilevel circuitry, and method for forming the same

MACRONIX INT CO LTD19 citations86
US9941153B1Apr 10, 2018

Pad structure and manufacturing method thereof

MACRONIX INT CO LTD8 citations84
US9478546B2Oct 25, 2016

LC module layout arrangement for contact opening etch windows

MACRONIX INT CO LTD15 citations84
US8012675B2Sep 6, 2011

Method of patterning target layer on substrate

MACRONIX INT CO LTD11 citations84
US7998826B2Aug 16, 2011

Method of forming mark in IC-fabricating process

MACRONIX INT CO LTD10 citations84
US7645546B2Jan 12, 2010

Method for determining an overlay correlation set

MACRONIX INT CO LTD16 citations84
US7449792B2Nov 11, 2008

Pattern registration mark designs for use in photolithography and methods of using the same

MACRONIX INT CO LTD10 citations84
US6905899B2Jun 14, 2005

Methods for forming a photoresist pattern using an anti-optical proximity effect

MACRONIX INT CO LTD12 citations84
US7927960B2Apr 19, 2011

Method of improving overlay performance in semiconductor manufacture

MACRONIX INT CO LTD6 citations74
US7358145B2Apr 15, 2008

Method of fabricating shallow trench isolation structure

MACRONIX INT CO LTD8 citations74
US6983444B2Jan 3, 2006

Mask for reducing proximity effect

MACRONIX INT CO LTD8 citations74
US9412612B2Aug 9, 2016

Method of forming semiconductor device

MACRONIX INT CO LTD3 citations73
US9269660B2Feb 23, 2016

Multilayer connection structure

MACRONIX INT CO LTD3 citations73
US10153233B1Dec 11, 2018

Interconnect structure and fabricating method thereof

MACRONIX INT CO LTD3 citations72
US10497566B1Dec 3, 2019

Layout design for fanout patterns in self-aligned double patterning process

MACRONIX INT CO LTD2 citations68
US12406922B2Sep 2, 2025

Semiconductor structure and manufacturing method thereof

MACRONIX INT CO LTD0 citations63
US12094814B2Sep 17, 2024

Memory device and flash memory device with improved support for staircase regions

MACRONIX INT CO LTD0 citations63
US9147692B2Sep 29, 2015

Method for forming separate narrow lines, method for fabricating memory structure, and product thereof

MACRONIX INT CO LTD2 citations63
US9097975B2Aug 4, 2015

Double patterning by PTD and NTD process

MACRONIX INT CO LTD3 citations63
US7952213B2May 31, 2011

Overlay mark arrangement for reducing overlay shift

MACRONIX INT CO LTD4 citations63
US7880274B2Feb 1, 2011

Method of enabling alignment of wafer in exposure step of IC process after UV-blocking metal layer is formed over the whole wafer

MACRONIX INT CO LTD3 citations63
US7862986B2Jan 4, 2011

Patterning process

MACRONIX INT CO LTD5 citations63
US7684040B2Mar 23, 2010

Overlay mark and application thereof

MACRONIX INT CO LTD4 citations63
US7611961B2Nov 3, 2009

Method for fabricating semiconductor wafer with enhanced alignment performance

MACRONIX INT CO LTD4 citations63
US7599063B2Oct 6, 2009

Method for checking alignment accuracy using overlay mark

MACRONIX INT CO LTD2 citations63
US7566526B2Jul 28, 2009

Method of exposure for lithography process and mask therefor

MACRONIX INT CO LTD2 citations63
US7566516B2Jul 28, 2009

Photomask and method of manufacturing the same

MACRONIX INT CO LTD3 citations63
US7563690B2Jul 21, 2009

Method for forming shallow trench isolation region

MACRONIX INT CO LTD3 citations63
US7493588B2Feb 17, 2009

Mixing and matching method and integration system for providing backup strategries for optical environments and method for operating the same

MACRONIX INT CO LTD2 citations63
US6864185B2Mar 8, 2005

Fine line printing by trimming the sidewalls of pre-developed resist image

MACRONIX INT CO LTD4 citations63
US8343713B2Jan 1, 2013

Method for patterning material layer

MACRONIX INT CO LTD2 citations60
US11901311B2Feb 13, 2024

Memory device and manufacturing method thereof

MACRONIX INT CO LTD0 citations52
US10854616B2Dec 1, 2020

Semiconductor structure and method forming the same

MACRONIX INT CO LTD0 citations52
US10474027B2Nov 12, 2019

Method for forming an aligned mask

MACRONIX INT CO LTD0 citations52
US10153263B2Dec 11, 2018

Patterned material layer and patterning method

MACRONIX INT CO LTD0 citations52
US9396966B1Jul 19, 2016

Patterning method and semiconductor structure

MACRONIX INT CO LTD1 citations52
US9343477B2May 17, 2016

Semiconductor device and method for fabricating the same

MACRONIX INT CO LTD0 citations52
US9209016B1Dec 8, 2015

Coating method and coating system

MACRONIX INT CO LTD1 citations52

YANG CHIN-CHENG

6 patents

YANG CHIN CHENG

3 patents

NCR CO

1 patent

Showing the top 50 of 69 patents by PatentIndex Score.