Inventor
YANG CHIN-CHENG
TW69 patents
⚠️ This page may combine multiple inventors who share the name “YANG CHIN-CHENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MACRONIX INT CO LTD
40 patentsUS8383512B2Feb 26, 2013
Method for making multilayer connection structure
MACRONIX INT CO LTD58 citations98
US9425209B1Aug 23, 2016
Multilayer 3-D structure with mirror image landing regions
MACRONIX INT CO LTD22 citations88
US10446437B2Oct 15, 2019
Interlevel connectors in multilevel circuitry, and method for forming the same
MACRONIX INT CO LTD19 citations86
US9941153B1Apr 10, 2018
Pad structure and manufacturing method thereof
MACRONIX INT CO LTD8 citations84
US9478546B2Oct 25, 2016
LC module layout arrangement for contact opening etch windows
MACRONIX INT CO LTD15 citations84
US8012675B2Sep 6, 2011
Method of patterning target layer on substrate
MACRONIX INT CO LTD11 citations84
US7998826B2Aug 16, 2011
Method of forming mark in IC-fabricating process
MACRONIX INT CO LTD10 citations84
US7645546B2Jan 12, 2010
Method for determining an overlay correlation set
MACRONIX INT CO LTD16 citations84
US7449792B2Nov 11, 2008
Pattern registration mark designs for use in photolithography and methods of using the same
MACRONIX INT CO LTD10 citations84
US6905899B2Jun 14, 2005
Methods for forming a photoresist pattern using an anti-optical proximity effect
MACRONIX INT CO LTD12 citations84
US7927960B2Apr 19, 2011
Method of improving overlay performance in semiconductor manufacture
MACRONIX INT CO LTD6 citations74
US7358145B2Apr 15, 2008
Method of fabricating shallow trench isolation structure
MACRONIX INT CO LTD8 citations74
US6983444B2Jan 3, 2006
Mask for reducing proximity effect
MACRONIX INT CO LTD8 citations74
US9412612B2Aug 9, 2016
Method of forming semiconductor device
MACRONIX INT CO LTD3 citations73
US9269660B2Feb 23, 2016
Multilayer connection structure
MACRONIX INT CO LTD3 citations73
US10153233B1Dec 11, 2018
Interconnect structure and fabricating method thereof
MACRONIX INT CO LTD3 citations72
US10497566B1Dec 3, 2019
Layout design for fanout patterns in self-aligned double patterning process
MACRONIX INT CO LTD2 citations68
US12406922B2Sep 2, 2025
Semiconductor structure and manufacturing method thereof
MACRONIX INT CO LTD0 citations63
US12094814B2Sep 17, 2024
Memory device and flash memory device with improved support for staircase regions
MACRONIX INT CO LTD0 citations63
US9147692B2Sep 29, 2015
Method for forming separate narrow lines, method for fabricating memory structure, and product thereof
MACRONIX INT CO LTD2 citations63
US9097975B2Aug 4, 2015
Double patterning by PTD and NTD process
MACRONIX INT CO LTD3 citations63
US7952213B2May 31, 2011
Overlay mark arrangement for reducing overlay shift
MACRONIX INT CO LTD4 citations63
US7880274B2Feb 1, 2011
Method of enabling alignment of wafer in exposure step of IC process after UV-blocking metal layer is formed over the whole wafer
MACRONIX INT CO LTD3 citations63
US7862986B2Jan 4, 2011
Patterning process
MACRONIX INT CO LTD5 citations63
US7684040B2Mar 23, 2010
Overlay mark and application thereof
MACRONIX INT CO LTD4 citations63
US7611961B2Nov 3, 2009
Method for fabricating semiconductor wafer with enhanced alignment performance
MACRONIX INT CO LTD4 citations63
US7599063B2Oct 6, 2009
Method for checking alignment accuracy using overlay mark
MACRONIX INT CO LTD2 citations63
US7566526B2Jul 28, 2009
Method of exposure for lithography process and mask therefor
MACRONIX INT CO LTD2 citations63
US7566516B2Jul 28, 2009
Photomask and method of manufacturing the same
MACRONIX INT CO LTD3 citations63
US7563690B2Jul 21, 2009
Method for forming shallow trench isolation region
MACRONIX INT CO LTD3 citations63
US7493588B2Feb 17, 2009
Mixing and matching method and integration system for providing backup strategries for optical environments and method for operating the same
MACRONIX INT CO LTD2 citations63
US6864185B2Mar 8, 2005
Fine line printing by trimming the sidewalls of pre-developed resist image
MACRONIX INT CO LTD4 citations63
US8343713B2Jan 1, 2013
Method for patterning material layer
MACRONIX INT CO LTD2 citations60
US11901311B2Feb 13, 2024
Memory device and manufacturing method thereof
MACRONIX INT CO LTD0 citations52
US10854616B2Dec 1, 2020
Semiconductor structure and method forming the same
MACRONIX INT CO LTD0 citations52
US10474027B2Nov 12, 2019
Method for forming an aligned mask
MACRONIX INT CO LTD0 citations52
US10153263B2Dec 11, 2018
Patterned material layer and patterning method
MACRONIX INT CO LTD0 citations52
US9396966B1Jul 19, 2016
Patterning method and semiconductor structure
MACRONIX INT CO LTD1 citations52
US9343477B2May 17, 2016
Semiconductor device and method for fabricating the same
MACRONIX INT CO LTD0 citations52
US9209016B1Dec 8, 2015
Coating method and coating system
MACRONIX INT CO LTD1 citations52
YANG CHIN-CHENG
6 patentsUS8530147B2Sep 10, 2013
Patterning process
YANG CHIN-CHENG7 citations84
US8278770B2Oct 2, 2012
Overlay mark
YANG CHIN-CHENG7 citations84
US8084872B2Dec 27, 2011
Overlay mark, method of checking local aligmnent using the same and method of controlling overlay based on the same
YANG CHIN-CHENG7 citations84
US8999838B2Apr 7, 2015
Semiconductor devices and methods of manufacturing the same
YANG CHIN-CHENG2 citations63
US8183123B2May 22, 2012
Method of forming mark in IC-fabricating process
YANG CHIN-CHENG5 citations63
US9188883B2Nov 17, 2015
Alignment mark
YANG CHIN-CHENG0 citations52
YANG CHIN CHENG
3 patentsNCR CO
1 patentShowing the top 50 of 69 patents by PatentIndex Score.