Inventor

CHU SCHUBERT S

US67 patents

⚠️ This page may combine multiple inventors who share the name “CHU SCHUBERT S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHU SCHUBERT S

APPLIED MATERIALS INC

Method to grow thin epitaxial films at low temperature

Vortex chamber lids for atomic layer deposition

Apparatus and process for plasma-enhanced atomic layer deposition

Selective process for source and drain formation

Vapor deposition processes for tantalum carbide nitride materials

Chemical delivery apparatus for CVD or ALD

Method to grow thin epitaxial films at low temperature

Method of recovering valuable material from exhaust gas stream of a reaction chamber

Chemical delivery apparatus for CVD or ALD

Chemical delivery apparatus for CVD or ALD

Thermal processing susceptor

Thermal processing susceptor

Apparatus and method for selective deposition

Integrated system and method for source/drain engineering

Multi zone spot heating in EPI

Multi zone spot heating in EPI

Wafer spot heating with beam width modulation

Multi zone spot heating in epi

Selective process for source and drain formation

Method and apparatus for wafer outgassing control

Integrated method for wafer outgassing reduction

Method to enhance growth rate for selective epitaxial growth

Susceptor design to reduce edge thermal peak

Self-aligned EPI contact flow

Methods and apparatus for deposition processes

Apparatus and method for selective deposition

Diode laser for wafer heating for EPI processes

Integrated epitaxy and preclean system

Epitaxy system integrated with high selectivity oxide removal and high temperature contaminant removal

System and method to detect substrate and/or substrate support misalignment using imaging

Methods and systems for cleaning high aspect ratio structures

Integrated system for semiconductor process

Lamp heating for process chamber

Chemical delivery apparatus for CVD or ALD

Thermal processing susceptor

Semiconductor processing tool platform configuration with reduced footprint

Thermal processing susceptor

Temperature calibration with band gap absorption method

Temperature calibration with band gap absorption method

Lamp infrared radiation profile control by lamp filament design and positioning

EPI thickness tuning by pulse or profile spot heating

Integrated epitaxy and preclean system

Susceptor design to eliminate deposition valleys in the wafer

Methods for detection using optical emission spectroscopy

GANGULI SESHADRI

Process for forming cobalt-containing materials

Process for forming cobalt-containing materials

APPLIED MATERISALS INC

Apparatus and process for plasma-enhanced atomic layer deposition

MA PAUL

Apparatus and process for plasma-enhanced atomic layer deposition

MYO NYI O

Methods and apparatus for deposition processes

CHU SCHUBERT S

Ampoule with a thermally conductive coating