P
US8110489B2ExpiredUtilityPatentIndex 92

Process for forming cobalt-containing materials

Assignee: GANGULI SESHADRIPriority: Jul 25, 2001Filed: Apr 11, 2007Granted: Feb 7, 2012
Est. expiryJul 25, 2021(expired)· nominal 20-yr term from priority
Inventors:GANGULI SESHADRICHU SCHUBERT SCHANG MEIYU SANG HOMORAES KEVINPHAN SEE-ENG
H10P 72/7624H10P 72/0468H10P 70/234H10P 70/23H10P 14/432H10P 14/43H10D 64/0112H10W 20/047H10W 20/035H10W 20/033H10D 30/60H10D 30/0212C23C 16/18C23C 16/56C23C 16/42H10D 64/01125
92
PatentIndex Score
15
Cited by
542
References
52
Claims

Abstract

Embodiments of the invention described herein generally provide methods and apparatuses for forming cobalt silicide layers, metallic cobalt layers, and other cobalt-containing materials. In one embodiment, a method for forming a cobalt silicide containing material on a substrate is provided which includes exposing a substrate to at least one preclean process to expose a silicon-containing surface, depositing a cobalt silicide material on the silicon-containing surface, depositing a metallic cobalt material on the cobalt silicide material, and depositing a metallic contact material on the substrate. In another embodiment, a method includes exposing a substrate to at least one preclean process to expose a silicon-containing surface, depositing a cobalt silicide material on the silicon-containing surface, expose the substrate to an annealing process, depositing a barrier material on the cobalt silicide material, and depositing a metallic contact material on the barrier material.

Claims

exact text as granted — not AI-modified
1. A method for forming a cobalt silicide containing material on a substrate, comprising:
 exposing a substrate to at least one preclean process to expose a silicon-containing surface; 
 depositing a cobalt silicide material on the silicon-containing surface; 
 depositing a metallic cobalt material on the cobalt silicide material; and 
 depositing a metallic contact material on the substrate, wherein the cobalt silicide material or the metallic cobalt material is exposed to a silicon-containing reducing gas and a plasma treatment during a silicon soak process. 
 
     
     
       2. The method of  claim 1 , wherein the cobalt silicide material and the metallic cobalt material are deposited in the same processing chamber. 
     
     
       3. The method of  claim 1 , wherein the cobalt silicide material is deposited by exposing the substrate to a cobalt precursor and a silicon precursor during a chemical vapor deposition process or an atomic layer deposition process. 
     
     
       4. The method of  claim 3 , wherein the cobalt silicide material comprises a silicon/cobalt atomic ratio of greater than 0.5. 
     
     
       5. The method of  claim 4 , wherein the silicon/cobalt atomic ratio is within a range from about 1 to about 2. 
     
     
       6. The method of  claim 1 , wherein the metallic contact material comprises a material selected from the group consisting of tungsten, copper, aluminum, and combinations thereof. 
     
     
       7. The method of  claim 6 , wherein the deposition of the metallic contact material comprises forming a seed layer and forming a bulk layer thereon. 
     
     
       8. The method of  claim 7 , wherein the seed layer comprises tungsten and the bulk layer comprises tungsten. 
     
     
       9. The method of  claim 1 , wherein a barrier material is deposited on the metallic cobalt material and the metallic contact material is deposited on the barrier layer. 
     
     
       10. The method of  claim 9 , wherein the barrier material comprises a material selected from the group consisting of tantalum, tantalum nitride, titanium, titanium nitride, tungsten, tungsten nitride, alloys thereof, and derivatives thereof. 
     
     
       11. The method of  claim 3 , wherein the cobalt precursor comprises a compound selected from the group consisting of tricarbonyl allyl cobalt, cyclopentadienyl cobalt bis(carbonyl), methylcyclopentadienyl cobalt bis(carbonyl), ethylcyclopentadienyl cobalt bis(carbonyl), pentmethylcyclopentadienyl cobalt bis(carbonyl), dicobalt octa(carbonyl), nitrosyl cobalt tris(carbonyl), bis(cyclopentadienyl) cobalt, (cyclopentadienyl) cobalt (cyclohexadienyl), cyclopentadienyl cobalt (1,3-hexadienyl), (cyclobutadienyl) cobalt (cyclopentadienyl), bis(methylcyclopentadienyl) cobalt, (cyclopentadienyl) cobalt (5-methylcyclopentadienyl), bis(ethylene)cobalt (pentamethylcyclopentadienyl), derivatives thereof, complexes thereof, plasmas thereof, and combinations thereof. 
     
     
       12. The method of  claim 11 , wherein the cobalt precursor comprises a cyclopentadienyl cobalt bis(carbonyl). 
     
     
       13. The method of  claim 3 , wherein the cobalt precursor comprises the general chemical formula (CO) x CO y L z , wherein:
 X is 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, or 12; 
 Y is 1, 2, 3, 4, or 5; 
 Z is 1, 2, 3, 4, 5, 6, 7, or 8; and 
 L is a ligand independently selected from the group consisting of cyclopentadienyl, alkylcyclopentadienyl, methylcyclopentadienyl, pentamethylcyclopentadienyl, pentadienyl, alkylpentadienyl, cyclobutadienyl, butadienyl, allyl, ethylene, propylene, alkenes, dialkenes, alkynes, nitrosyl, ammonia, derivatives thereof, and combinations thereof. 
 
     
     
       14. The method of  claim 3 , wherein the silicon precursor comprises a compound selected from the group consisting of silane, disilane, derivatives thereof, plasmas thereof, and combinations thereof. 
     
     
       15. The method of  claim 3 , wherein the substrate is heated to a temperature of at least 100° C. during the chemical vapor deposition process or the atomic layer deposition process. 
     
     
       16. The method of  claim 15 , wherein the temperature is within a range from about 300° C. to about 400° C. 
     
     
       17. The method of  claim 1 , wherein the cobalt silicide material is exposed to a plasma prior to depositing the metallic cobalt material. 
     
     
       18. The method of  claim 17 , wherein the plasma is generated from hydrogen gas by a radio frequency. 
     
     
       19. The method of  claim 3 , wherein the cobalt silicide material is deposited during the atomic layer deposition process by conducting a deposition cycle to deposit a cobalt silicide layer; and
 repeating the deposition cycle to form a plurality of the cobalt silicide layers, wherein the deposition cycle comprises exposing the substrate to a reducing gas comprising the silicon precursor while sequentially exposing the substrate to the cobalt precursor and a plasma. 
 
     
     
       20. The method of  claim 19 , wherein the plasma comprises a hydrogen plasma. 
     
     
       21. The method of  claim 1 , wherein the cobalt silicide material is exposed to the silicon-containing reducing gas and the plasma treatment during the silicon soak process. 
     
     
       22. The method of  claim 1 , wherein the metallic cobalt material is exposed to the silicon-containing reducing gas and the plasma treatment during the silicon soak process. 
     
     
       23. The method of  claim 1 , wherein the cobalt silicide material is deposited during a pulsed chemical vapor deposition process by conducting a deposition cycle to deposit a cobalt silicide layer; and
 repeating the deposition cycle to form a plurality of the cobalt silicide layers, wherein the deposition cycle comprises exposing the substrate to a silicon precursor, a cobalt precursor, and a plasma. 
 
     
     
       24. The method of  claim 1 , wherein the silicon-containing surface comprises polycrystalline silicon. 
     
     
       25. A method for forming a cobalt silicide containing material on a substrate, comprising:
 exposing a substrate to at least one preclean process to expose a silicon-containing surface; 
 depositing a cobalt silicide material on the silicon-containing surface; 
 exposing the substrate to an annealing process; 
 depositing a barrier material on the cobalt silicide material; and 
 depositing a metallic contact material on the barrier material, wherein the cobalt silicide material or the barrier material is exposed to a silicon-containing reducing gas and a plasma treatment during a silicon soak process. 
 
     
     
       26. The method of  claim 25 , wherein the substrate is heated to a temperature of at least about 600° C. within an annealing chamber during the annealing process. 
     
     
       27. The method of  claim 25 , wherein the cobalt silicide material is deposited by exposing the substrate to a cobalt precursor and a silicon precursor during a chemical vapor deposition process or an atomic layer deposition process. 
     
     
       28. The method of  claim 27 , wherein the cobalt silicide material comprises a silicon/cobalt atomic ratio of greater than 0.5. 
     
     
       29. The method of  claim 28 , wherein the silicon/cobalt atomic ratio is within a range from about 1 to about 2. 
     
     
       30. The method of  claim 25 , wherein the metallic contact material comprises a material selected from the group consisting of tungsten, copper, aluminum, and combinations thereof. 
     
     
       31. The method of  claim 30 , wherein the deposition of the metallic contact material comprises forming a seed layer and forming a bulk layer thereon. 
     
     
       32. The method of  claim 31 , wherein the seed layer comprises tungsten and the bulk layer comprises tungsten. 
     
     
       33. The method of  claim 25 , wherein the barrier material comprises a material selected from the group consisting of tantalum, tantalum nitride, titanium, titanium nitride, tungsten, tungsten nitride, cobalt, alloys thereof, and derivatives thereof. 
     
     
       34. The method of  claim 27 , wherein the cobalt precursor comprises a compound selected from the group consisting of tricarbonyl allyl cobalt, cyclopentadienyl cobalt bis(carbonyl), methylcyclopentadienyl cobalt bis(carbonyl), ethylcyclopentadienyl cobalt bis(carbonyl), pentmethylcyclopentadienyl cobalt bis(carbonyl), dicobalt octa(carbonyl), nitrosyl cobalt tris(carbonyl), bis(cyclopentadienyl) cobalt, (cyclopentadienyl) cobalt (cyclohexadienyl), cyclopentadienyl cobalt (1,3-hexadienyl), (cyclobutadienyl) cobalt (cyclopentadienyl), bis(methylcyclopentadienyl) cobalt, (cyclopentadienyl) cobalt (5-methylcyclopentadienyl), bis(ethylene) cobalt (pentamethylcyclopentadienyl), derivatives thereof, complexes thereof, plasmas thereof, and combinations thereof. 
     
     
       35. The method of  claim 34 , wherein the cobalt precursor comprises cyclopentadienyl cobalt bis(carbonyl). 
     
     
       36. The method of  claim 27 , wherein the cobalt precursor comprises the general chemical formula (CO) x CO y L z , wherein:
 X is 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, or 12; 
 Y is 1, 2, 3, 4, or 5; 
 Z is 1, 2, 3, 4, 5, 6, 7, or 8; and 
 
       L is a ligand independently selected from the group consisting of cyclopentadienyl, alkylcyclopentadienyl, methylcyclopentadienyl, pentamethylcyclopentadienyl, pentadienyl, alkylpentadienyl, cyclobutadienyl, butadienyl, allyl, ethylene, propylene, alkenes, dialkenes, alkynes, nitrosyl, ammonia, derivatives thereof, and combinations thereof. 
     
     
       37. The method of  claim 27 , wherein the silicon precursor comprises a compound selected from the group consisting of silane, disilane, derivatives thereof, plasmas thereof, and combinations thereof. 
     
     
       38. The method of  claim 27 , wherein the substrate is heated to a temperature of at least 100° C. during the chemical vapor deposition process or the atomic layer deposition process. 
     
     
       39. The method of  claim 38 , wherein the temperature is within a range from about 300° C. to about 400° C. 
     
     
       40. The method of  claim 25 , wherein the cobalt silicide material is exposed to a plasma prior to depositing the barrier material. 
     
     
       41. The method of  claim 40 , wherein the plasma is generated from hydrogen gas by a radio frequency. 
     
     
       42. The method of  claim 27 , wherein the cobalt silicide material is deposited during the atomic layer deposition process by conducting a deposition cycle to deposit a cobalt silicide layer; and
 repeating the deposition cycle to form a plurality of the cobalt silicide layers, wherein the deposition cycle comprises exposing the substrate to a reducing gas comprising the silicon precursor while sequentially exposing the substrate to the cobalt precursor and a plasma. 
 
     
     
       43. The method of  claim 42 , wherein the plasma comprises a hydrogen plasma. 
     
     
       44. The method of  claim 42 , wherein the barrier material is exposed to the silicon-containing reducing gas during the silicon soak process. 
     
     
       45. The method of  claim 44 , further comprising exposing the barrier material to the plasma treatment during the silicon soak process. 
     
     
       46. The method of  claim 25 , wherein the cobalt silicide material is deposited during a pulsed chemical vapor deposition process by conducting a deposition cycle to deposit a cobalt silicide layer; and
 repeating the deposition cycle to form a plurality of the cobalt silicide layers, wherein the deposition cycle comprises exposing the substrate to a silicon precursor, a cobalt precursor, and a plasma. 
 
     
     
       47. The method of  claim 25 , wherein the silicon-containing surface comprises polycrystalline silicon. 
     
     
       48. A method for forming a metallic silicide containing material on a substrate, comprising:
 exposing a substrate to a plasma comprising hydrogen, ammonia, or combinations thereof during a reactive preclean process to expose a silicon-containing surface; 
 depositing a metallic silicide material on the silicon-containing surface; 
 exposing the metallic silicide material to a silicon-containing reducing gas and a plasma treatment during a silicon soak process; 
 depositing a barrier material on the metallic silicide material; and 
 depositing a tungsten contact material over the barrier material, further comprising:
 depositing a tungsten nucleation layer on the barrier material during an atomic layer deposition process; and 
 depositing a tungsten bulk layer over the tungsten nucleation layer during a chemical vapor deposition process. 
 
 
     
     
       49. The method of  claim 48 , wherein the metallic silicide material comprises at least one material selected from the group consisting of cobalt, nickel, platinum, palladium, combinations thereof, and alloys thereof. 
     
     
       50. The method of  claim 49 , wherein the barrier material is exposed to the silicon-containing reducing gas during the silicon soak process. 
     
     
       51. The method of  claim 50 , further comprising exposing the barrier material to the plasma treatment during the silicon soak process. 
     
     
       52. The method of  claim 48 , wherein the silicon-containing surface comprises polycrystalline silicon or silicon oxide.

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