Inventor · disambiguated record
See-Eng Phan
Also filed as: PHAN SEE-ENG
18 granted patents·13 pending applications·1,121 citations·filing 2001–2024
96Inventor score
Top patents by PatentIndex Score
31 records- 0198US7520957B2Lid assembly for front end of line fabricationAPPLIED MATERIALS INC·Filed 2005·Granted Apr 21, 2009·162 cites·8 claims
- 0298US7494545B2Epitaxial deposition process and apparatusAPPLIED MATERIALS INC·Filed 2006·Granted Feb 24, 2009·246 cites·10 claims
- 0398US7396480B2Method for front end of line fabricationAPPLIED MATERIALS INC·Filed 2005·Granted Jul 8, 2008·285 cites·20 claims
- 0497US8846163B2Method for removing oxidesKAO CHIEN-TEH·Filed 2012·Granted Sep 30, 2014·190 cites·19 claims
- 0595US7767024B2Method for front end of line fabricationAPPPLIED MATERIALS INC·Filed 2008·Granted Aug 3, 2010·28 cites·28 claims
- 0693US6726805B2Pedestal with integral shieldAPPLIED MATERIALS INC·Filed 2002·Granted Apr 27, 2004·56 cites·27 claims
- 0792US8187970B2Process for forming cobalt and cobalt silicide materials in tungsten contact applicationsGANGULI SESHADRI·Filed 2010·Granted May 29, 2012·12 cites·9 claims
- 0892US6652713B2Pedestal with integral shieldAPPLIED MATERIALS INC·Filed 2001·Granted Nov 25, 2003·47 cites·36 claims
- 0991US8563424B2Process for forming cobalt and cobalt silicide materials in tungsten contact applicationsGANGULI SESHADRI·Filed 2012·Granted Oct 22, 2013·10 cites·20 claims
- 1091US8110489B2Process for forming cobalt-containing materialsGANGULI SESHADRI·Filed 2007·Granted Feb 7, 2012·15 cites·52 claims
- 1191US6837968B2Lower pedestal shieldAPPLIED MATERIALS INC·Filed 2003·Granted Jan 4, 2005·40 cites·17 claims
- 1285US2024218503A1Selective cobalt deposition on copper surfacesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1384US7252737B2Pedestal with integral shieldAPPLIED MATERIALS INC·Filed 2004·Granted Aug 7, 2007·22 cites·10 claims
- 1480US12249494B2Remote plasma cleaning of chambers for electronics manufacturing systemsAPPLIED MATERIALS INC·Filed 2023·Granted Mar 11, 2025·0 cites·20 claims
- 1580US11959167B2Selective cobalt deposition on copper surfacesAPPLIED MATERIALS INC·Filed 2022·Granted Apr 16, 2024·0 cites·20 claims
- 1677US8815724B2Process for forming cobalt-containing materialsGANGULI SESHADRI·Filed 2012·Granted Aug 26, 2014·3 cites·10 claims
- 1768US11854773B2Remote plasma cleaning of chambers for electronics manufacturing systemsAPPLIED MATERIALS INC·Filed 2021·Granted Dec 26, 2023·0 cites·20 claims
- 1863US7513971B2Flat style coil for improved precision etch uniformityAPPLIED MATERIALS INC·Filed 2003·Granted Apr 7, 2009·5 cites·29 claims
- 1961US2014076234A1Multi chamber processing systemAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 2061US2009111280A1Method for removing oxidesAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 2160US11384429B2Selective cobalt deposition on copper surfacesAPPLIED MATERIALS INC·Filed 2017·Granted Jul 12, 2022·0 cites·20 claims
- 2256US2011223755A1Method for removing oxidesKAO CHIEN-TEH·Filed 2011·Application pending·0 cites
- 2355US2015325446A1Selective cobalt deposition on copper surfacesAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 2455US2009004850A1Process for forming cobalt and cobalt silicide materials in tungsten contact applicationsGANGULI SESHADRI·Filed 2008·Application pending·0 cites
- 2553US2005230350A1In-situ dry clean chamber for front end of line fabricationAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 2652US2009269507A1Selective cobalt deposition on copper surfacesYU SANG-HO·Filed 2008·Application pending·0 cites
- 2745US2006093730A1Monitoring a flow distribution of an energized gasAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 2842US2006051966A1In-situ chamber clean process to remove by-product deposits from chemical vapor etch chamberAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 2941US2008268635A1Process for forming cobalt and cobalt silicide materials in copper contact applicationsYU SANG-HO·Filed 2008·Application pending·0 cites
- 3037US2011124192A1Process for forming cobalt-containing materialsGANGULI SESHADRI·Filed 2011·Application pending·0 cites
- 3129US2012122320A1Method Of Processing Low K Dielectric FilmsLAKSHMANAN ANNAMALAI·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →