Inventor

VERGHESE MOHITH

US39 patents

⚠️ This page may combine multiple inventors who share the name “VERGHESE MOHITH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VERGHESE MOHITH

ASM IP HOLDING BV

Semiconductor device dielectric interface layer

Multi-zone reactor, system including the reactor, and method of using the same

Reactant vaporizer and related systems and methods

Reactant vaporizer and related systems and methods

Multi-zone reactor, system including the reactor, and method of using the same

Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate

Methods of vapor deposition with multiple vapor sources

Semiconductor processing apparatus and methods for monitoring and controlling a semiconductor processing apparatus

Reactant vaporizer and related systems and methods

Cross-flow reactor and method

APPLIED MATERIALS INC

Bottom fed sublimation bed for high saturation efficiency in semiconductor applications

Bottom fed sublimation bed for high saturation efficiency in semiconductor applications

Ampoule for a semiconductor manufacturing precursor

Ampoule for a semiconductor manufacturing precursor

Methods of lowering deposition rate

Quartz crystal microbalance concentration monitor

Low temperature deposition of pure molybdenum films

Low temperature deposition of pure molybenum films

Bottom fed sublimation bed for high saturation efficiency in semiconductor applications

Enhancing gapfill performance of dram word line

ASM INC

Reactant source vessel

Reactor surface passivation through chemical deactivation

Reactor surface passivation through chemical deactivation

Reactor surface passivation through chemical deactivation

Reaction system for growing a thin film

Selective etching of reactor surfaces

SCHMIDT RYAN M

Gas mixer and manifold assembly for ALD reactor

Gas mixer and manifold assembly for ALD reactor

Gas mixer and manifold assembly for ALD reactor

ASM INT

Method for controlling the sublimation of reactants

System for controlling the sublimation of reactants

VERGHESE MOHITH

Reaction system for growing a thin film

Reaction system for growing a thin film

RAISANEN PETRI

Semiconductor device dielectric interface layer

TUOMINEN MARKO

System for controlling the sublimation of reactants

SHERO ERIC

Reactive site deactivation against vapor deposition

POMAREDE CHRISTOPHE

Multiple vapor sources for vapor deposition

RAGHAVAN SRINI

Selective etching of reactor surfaces

SHERO ERIC J

High concentration water pulses for atomic layer deposition