Inventor
NADAHARA SOICHI
JP31 patents
⚠️ This page may combine multiple inventors who share the name “NADAHARA SOICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
20 patentsUS6431185B1Aug 13, 2002
Apparatus and method for cleaning a semiconductor substrate
TOSHIBA KK60 citations96
US5989988ANov 23, 1999
Semiconductor device and method of manufacturing the same
TOSHIBA KK76 citations96
US5360748ANov 1, 1994
Method of manufacturing a semiconductor device
TOSHIBA KK53 citations96
US6436723B1Aug 20, 2002
Etching method and etching apparatus method for manufacturing semiconductor device and semiconductor device
TOSHIBA KK34 citations93
US5098852AMar 24, 1992
Method of manufacturing a semiconductor device by mega-electron volt ion implantation
TOSHIBA KK69 citations93
US7057259B2Jun 6, 2006
Semiconductor wafer with ID mark, equipment for and method of manufacturing semiconductor device from them
TOSHIBA KK35 citations92
US6492271B1Dec 10, 2002
Semiconductor device and method of manufacturing the same
TOSHIBA KK27 citations92
US6333274B2Dec 25, 2001
Method of manufacturing a semiconductor device including a seamless shallow trench isolation step
TOSHIBA KK39 citations92
US6286524B1Sep 11, 2001
Wafer drying apparatus and method with residual particle removability enhancement
TOSHIBA KK46 citations92
US7253500B2Aug 7, 2007
Semiconductor wafer and a method for manufacturing a semiconductor wafer
TOSHIBA KK5 citations74
US7015566B2Mar 21, 2006
Semiconductor wafer and a method for manufacturing a semiconductor wafer
TOSHIBA KK9 citations74
US6645876B2Nov 11, 2003
Etching for manufacture of semiconductor devices
TOSHIBA KK12 citations73
US7101259B2Sep 5, 2006
Polishing method and apparatus
TOSHIBA KK7 citations72
US5815942AOct 6, 1998
Vapor drying system and method
TOSHIBA KK7 citations70
US7268053B2Sep 11, 2007
Semiconductor wafer and a method for manufacturing a semiconductor wafer
TOSHIBA KK1 citations63
US6673163B2Jan 6, 2004
Apparatus and method for cleaning a semiconductor substrate
TOSHIBA KK5 citations63
US6159303ADec 12, 2000
Liquid displacement apparatus and liquid displacement method
TOSHIBA KK4 citations63
US7776756B1Aug 17, 2010
Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device
TOSHIBA KK3 citations62
US7267742B2Sep 11, 2007
Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device
TOSHIBA KK3 citations62
US6639317B2Oct 28, 2003
Semiconductor device in trench
TOSHIBA KK0 citations52
EBARA CORP
5 patentsUS7055535B2Jun 6, 2006
Holding unit, processing apparatus and holding method of substrates
EBARA CORP38 citations92
US6543080B1Apr 8, 2003
Apparatus and method for cleaning semiconductor substrate
EBARA CORP35 citations92
US6667238B1Dec 23, 2003
Polishing method and apparatus
EBARA CORP15 citations91
US6679950B2Jan 20, 2004
Cleaning method and cleaner
EBARA CORP5 citations63
US7305275B2Dec 4, 2007
Material supply system in semiconductor device manufacturing plant
EBARA CORP6 citations61