Inventor

DRYNAN JOHN M

US25 patents

⚠️ This page may combine multiple inventors who share the name “DRYNAN JOHN M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

DRYNAN JOHN M

MICRON TECHNOLOGY INC

Methods of depositing a layer comprising tungsten and methods of forming a transistor gate line

Planarization of metal container structures

Interconnect line selectively isolated from an underlying contact plug

Method of etching a substantially amorphous TA2O5 comprising layer

Semiconductor device precursor structures to a double-sided capacitor or a contact

Method of forming a contact using a sacrificial structure

Method of forming a double-sided capacitor

Methods of forming a double-sided capacitor or a contact using a sacrificial structure

Interconnect line selectively isolated from an underlying contact plug

Interconnect line selectively isolated from an underlying contact plug

Methods of forming conductive contacts to conductive structures

Interconnect line selectively isolated from an underlying contact plug

Interconnect line selectively isolated from an underlying contact plug

Interconnect line selectively isolated from an underlying contact plug

Interconnect line selectively isolated from an underlying contact plug

Planarization of metal container structures

Dynamic random access memory circuitry comprising insulative collars

Integrated circuitry comprising insulative collars and integrated circuitry comprising sidewall spacers over a conductive line projecting outwardly from a first insulative material

Dynamic random access memory circuitry and integrated circuitry

Method of forming a patterned substantially crystalline ta2o5 comprising material, and method of forming a capacitor having a capacitor dielectric region comprising substantially crystalline ta2o5 comprising material

Interconnect line selectively isolated from an underlying contact plug

Semiconductor constructions comprising multi-level patterns of radiation-imageable material

Methods of forming wire bonds for semiconductor constructions

Methods of forming wire bonds for semiconductor constructions

DRYNAN JOHN M

Interconnect line selectively isolated from an underlying contact plug