P

Inventor

LIN CHAO HUNG

TW60 patents
⚠️ This page may combine multiple inventors who share the name “LIN CHAO HUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

UNITED MICROELECTRONICS CORP

37 patents
US9530778B1Dec 27, 2016

Semiconductor devices having metal gate and method for manufacturing semiconductor devices having metal gate

UNITED MICROELECTRONICS CORP40 citations94
US9349833B1May 24, 2016

Semiconductor device and method of forming the same

UNITED MICROELECTRONICS CORP32 citations94
US9142641B1Sep 22, 2015

Method for manufacturing finFET

UNITED MICROELECTRONICS CORP21 citations93
US9905464B2Feb 27, 2018

Semiconductor device and method of forming the same

UNITED MICROELECTRONICS CORP9 citations84
US9704737B2Jul 11, 2017

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP10 citations84
US9589966B2Mar 7, 2017

Static random access memory

UNITED MICROELECTRONICS CORP9 citations84
US9559164B2Jan 31, 2017

Nanowire transistor device and method for manufacturing nanowire transistor device

UNITED MICROELECTRONICS CORP9 citations84
US9502410B1Nov 22, 2016

Semiconductor structure and manufacturing method thereof

UNITED MICROELECTRONICS CORP13 citations84
US9484263B1Nov 1, 2016

Method of removing a hard mask on a gate

UNITED MICROELECTRONICS CORP8 citations84
US9455194B1Sep 27, 2016

Method for fabricating semiconductor device

UNITED MICROELECTRONICS CORP7 citations84
US9947792B2Apr 17, 2018

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP3 citations73
US9916978B2Mar 13, 2018

Method for fabricating a Fin field effect transistor (FinFET)

UNITED MICROELECTRONICS CORP5 citations73
US9881831B2Jan 30, 2018

Method for fabricating semiconductor device including fin shaped structure

UNITED MICROELECTRONICS CORP2 citations73
US9847402B2Dec 19, 2017

Method of using polysilicon as stop layer in a replacement metal gate process

UNITED MICROELECTRONICS CORP2 citations73
US9786662B1Oct 10, 2017

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP2 citations73
US9773887B2Sep 26, 2017

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP3 citations73
US9722078B2Aug 1, 2017

Semiconductor device including fin shaped structure and method for fabricating the same

UNITED MICROELECTRONICS CORP2 citations73
US9659873B2May 23, 2017

Semiconductor structure with aligning mark and method of forming the same

UNITED MICROELECTRONICS CORP2 citations73
US9653290B2May 16, 2017

Method for manufacturing nanowire transistor device

UNITED MICROELECTRONICS CORP3 citations73
US9384978B1Jul 5, 2016

Method of forming trenches

UNITED MICROELECTRONICS CORP3 citations73
US11387148B2Jul 12, 2022

Semiconductor device

UNITED MICROELECTRONICS CORP0 citations62
US10692777B2Jun 23, 2020

Semiconductor device

UNITED MICROELECTRONICS CORP0 citations52
US10497810B2Dec 3, 2019

Method for fabricating semiconductor device

UNITED MICROELECTRONICS CORP0 citations52
US10319641B2Jun 11, 2019

Semiconductor device having gate structure

UNITED MICROELECTRONICS CORP0 citations52
US10256146B2Apr 9, 2019

Method of forming semiconductor device

UNITED MICROELECTRONICS CORP0 citations52
US10236383B2Mar 19, 2019

Method for fabricating semiconductor device

UNITED MICROELECTRONICS CORP0 citations52
US10103062B2Oct 16, 2018

Method for fabricating semiconductor device having gate structure

UNITED MICROELECTRONICS CORP0 citations52
US10068808B2Sep 4, 2018

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP0 citations52
US9960123B2May 1, 2018

Method of forming semiconductor structure with aligning mark in dicing region

UNITED MICROELECTRONICS CORP1 citations52
US9954108B2Apr 24, 2018

Semiconductor device including fin shaped structure including silicon germanium layer

UNITED MICROELECTRONICS CORP0 citations52
US9859148B2Jan 2, 2018

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP0 citations52
US9831133B2Nov 28, 2017

Semiconductor devices having metal gate and method for manufacturing semiconductor devices having metal gate

UNITED MICROELECTRONICS CORP1 citations52
US9761692B1Sep 12, 2017

Method of using polysilicon as stop layer in a replacement metal gate process

UNITED MICROELECTRONICS CORP0 citations52
US9583394B2Feb 28, 2017

Manufacturing method of semiconductor structure

UNITED MICROELECTRONICS CORP1 citations52
US9553026B1Jan 24, 2017

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP0 citations52
US9502252B2Nov 22, 2016

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP0 citations52
US9349653B2May 24, 2016

Manufacturing method of semiconductor structure for preventing surface of fin structure from damage and providing improved process window

UNITED MICROELECTRONICS CORP0 citations52

OMNIVISION TECH INC

4 patents

LIN CHAO-HUNG

2 patents

QUANTA COMP INC

2 patents

LIU TSUNG-CHIN

1 patent

(unassigned)

1 patent

HTC CORP

1 patent

GM GLOBAL TECH OPERATIONS LLC

1 patent

OPTRONICS TECHNOLOGY INC A

1 patent

Showing the top 50 of 60 patents by PatentIndex Score.