Inventor
KULSHRESHTHA PRASHANT KUMAR
US43 patents
Patents
43 patentsUS10418243B2Sep 17, 2019
Ultra-high modulus and etch selectivity boron-carbon hardmask films
APPLIED MATERIALS INC6 citations83
US10403535B2Sep 3, 2019
Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system
APPLIED MATERIALS INC11 citations83
US9390910B2Jul 12, 2016
Gas flow profile modulated control of overlay in plasma CVD films
APPLIED MATERIALS INC5 citations83
US11469107B2Oct 11, 2022
Highly etch selective amorphous carbon film
APPLIED MATERIALS INC4 citations80
US9711360B2Jul 18, 2017
Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in PECVD system
APPLIED MATERIALS INC5 citations73
US11728168B2Aug 15, 2023
Ultra-high modulus and etch selectivity boron-carbon hardmask films
APPLIED MATERIALS INC2 citations72
US10679830B2Jun 9, 2020
Cleaning process for removing boron-carbon residuals in processing chamber at high temperature
APPLIED MATERIALS INC2 citations72
US10504727B2Dec 10, 2019
Thick tungsten hardmask films deposition on high compressive/tensile bow wafers
APPLIED MATERIALS INC2 citations72
US10373822B2Aug 6, 2019
Gas flow profile modulated control of overlay in plasma CVD films
APPLIED MATERIALS INC2 citations72
US11600470B2Mar 7, 2023
Targeted heat control systems
APPLIED MATERIALS INC2 citations71
US11031262B2Jun 8, 2021
Loadlock integrated bevel etcher system
APPLIED MATERIALS INC2 citations71
US10636684B2Apr 28, 2020
Loadlock integrated bevel etcher system
APPLIED MATERIALS INC1 citations71
US10403515B2Sep 3, 2019
Loadlock integrated bevel etcher system
APPLIED MATERIALS INC1 citations71
US11613808B2Mar 28, 2023
Clean processes for boron carbon film deposition
APPLIED MATERIALS INC2 citations70
US12211694B2Jan 28, 2025
Ultra-high modulus and etch selectivity boron-carbon hardmask films
APPLIED MATERIALS INC0 citations62
US12000048B2Jun 4, 2024
Pedestal for substrate processing chambers
APPLIED MATERIALS INC0 citations62
US11584994B2Feb 21, 2023
Pedestal for substrate processing chambers
APPLIED MATERIALS INC1 citations62
US10971364B2Apr 6, 2021
Ultra-high modulus and etch selectivity boron carbon hardmask films
APPLIED MATERIALS INC0 citations62
US10930475B2Feb 23, 2021
Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films
APPLIED MATERIALS INC0 citations62
US9837265B2Dec 5, 2017
Gas flow profile modulated control of overlay in plasma CVD films
APPLIED MATERIALS INC1 citations62
US12334384B2Jun 17, 2025
Methods and apparatus for minimizing substrate backside damage
APPLIED MATERIALS INC0 citations61
US12211728B2Jan 28, 2025
Electrostatic chuck design with improved chucking and arcing performance
APPLIED MATERIALS INC0 citations61
US11756819B2Sep 12, 2023
Methods and apparatus for minimizing substrate backside damage
APPLIED MATERIALS INC0 citations61
US11682574B2Jun 20, 2023
Electrostatic chuck design with improved chucking and arcing performance
APPLIED MATERIALS INC0 citations61
US10950445B2Mar 16, 2021
Deposition of metal silicide layers on substrates and chamber components
APPLIED MATERIALS INC0 citations60
US10923334B2Feb 16, 2021
Selective deposition of hardmask
APPLIED MATERIALS INC0 citations60
US12564021B2Feb 24, 2026
Method of processing a substrate
APPLIED MATERIALS INC0 citations59
US12112949B2Oct 8, 2024
Highly etch selective amorphous carbon film
APPLIED MATERIALS INC0 citations59
US12014927B2Jun 18, 2024
Highly etch selective amorphous carbon film
APPLIED MATERIALS INC0 citations59
US12136549B2Nov 5, 2024
Plasma-enhanced chemical vapor deposition of carbon hard-mask
APPLIED MATERIALS INC0 citations58
US11430641B1Aug 30, 2022
Processing systems and methods to control process drift
APPLIED MATERIALS INC0 citations57
US11821082B2Nov 21, 2023
Reduced defect deposition processes
APPLIED MATERIALS INC0 citations56
US10128088B2Nov 13, 2018
Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films
APPLIED MATERIALS INC0 citations52
US12100609B2Sep 24, 2024
Electrostatic chucking process
APPLIED MATERIALS INC0 citations51
US11322352B2May 3, 2022
Nitrogen-doped carbon hardmask films
APPLIED MATERIALS INC0 citations51
US12191115B2Jan 7, 2025
Dual RF for controllable film deposition
APPLIED MATERIALS INC0 citations50
US11830706B2Nov 28, 2023
Heated pedestal design for improved heat transfer and temperature uniformity
APPLIED MATERIALS INC0 citations50
US11814716B2Nov 14, 2023
Faceplate having blocked center hole
APPLIED MATERIALS INC0 citations49
US10734232B2Aug 4, 2020
Deposition of metal silicide layers on substrates and chamber components
APPLIED MATERIALS INC0 citations49
US12027366B2Jul 2, 2024
Reduced hydrogen deposition processes
APPLIED MATERIALS INC0 citations48
US11810764B2Nov 7, 2023
Faceplate with edge flow control
APPLIED MATERIALS INC0 citations48
US11560623B2Jan 24, 2023
Methods of reducing chamber residues
APPLIED MATERIALS INC0 citations48
US12539530B2Feb 3, 2026
Throttle valve and foreline cleaning using a microwave source
APPLIED MATERIALS INC0 citations47