Inventor

WU PO-CHI

TW64 patents

⚠️ This page may combine multiple inventors who share the name “WU PO-CHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WU PO-CHI

TAIWAN SEMICONDUCTOR MFG CO LTD

Fin field effect transistor (FinFET) device structure

Structure and formation method of semiconductor device structure

Semiconductor structure with unleveled gate structure

Fin field effect transistor (FinFET) device structure with uneven gate structure

FinFET and method of forming same

Semiconductor device and method

Semiconductor structure and manufacturing method thereof

Semiconductor structure with unleveled gate structure and method for forming the same

Method for forming Fin field effect transistor (FinFET) device structure

Fin field effect transistor (FinFET) device structure with uneven gate structure and method for forming the same

Metal gate with silicon sidewall spacers

Semiconductor device structure and method for forming the same

Semiconductor device structure and method for forming the same

Method for fabricating metal gate devices and resulting structures

Semiconductor device structure and method for forming the same

Metal gate with silicon sidewall spacers

Structure and formation method of semiconductor device structure

Structure and formation method of semiconductor device structure

FinFET device comprising plurality of dummy protruding features

Semiconductor structure and manufacturing method thereof

FinFET device over convex insulating structure

Semiconductor structure and manufacturing method thereof

Semiconductor device and method of manufacture

Method of semiconductor fabrication with height control through active region profile

Method for fabricating metal gate devices and resulting structures

Semiconductor device structure and method for forming the same

Semiconductor device structure with work function layer and method for forming the same

Method for forming semiconductor device structure with gate and resulting structures

Semiconductor device structure and method for forming the same

Semiconductor device structure and method for forming the same

Method for forming semiconductor device structure with gate

Semiconductor device for recessed fin structure having rounded corners

Semiconductor device and method

FinFET device comprising plurality of dummy protruding features

Semiconductor device and method

Semiconductor device and method

Structure and formation method of semiconductor device structure

Metal gate with silicon sidewall spacers

Method for fabricating metal gate devices and resulting structures

Method for forming semiconductor device structure with gate and resulting structures

Semiconductor device structure and method for forming the same

Semiconductor device structure with work function layer and method for forming the same

Metal gate with silicon sidewall spacers

Method for manufacturing semiconductor structure with unleveled gate structure

Fin field effect transistor (FinFET) device and method

Structure and formation method of semiconductor device structure

Fin field effect transistor (FinFET) device structure and method for forming the same

Semiconductor device for recessed fin structure having rounded corners

TAIWAN SEMICONDUCTOR MFG

Metal gate transistor and method for tuning metal gate profile

WU PO-CHI

Corner rounding to improve metal fill in replacement gate process