P

Inventor

DIAZ CARLOS H

US258 patents
⚠️ This page may combine multiple inventors who share the name “DIAZ CARLOS H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

30 patents
US10157799B2Dec 18, 2018

Multi-gate device and method of fabrication thereof

TAIWAN SEMICONDUCTOR MFG CO LTD135 citations99
US10109721B2Oct 23, 2018

Horizontal gate-all-around device having wrapped-around source and drain

TAIWAN SEMICONDUCTOR MFG CO LTD140 citations99
US9899398B1Feb 20, 2018

Non-volatile memory device having nanocrystal floating gate and method of fabricating same

TAIWAN SEMICONDUCTOR MFG CO LTD148 citations99
US9887269B2Feb 6, 2018

Multi-gate device and method of fabrication thereof

TAIWAN SEMICONDUCTOR MFG CO LTD151 citations99
US9881993B2Jan 30, 2018

Method of forming semiconductor structure with horizontal gate all around structure

TAIWAN SEMICONDUCTOR MFG CO LTD143 citations99
US9818872B2Nov 14, 2017

Multi-gate device and method of fabrication thereof

TAIWAN SEMICONDUCTOR MFG CO LTD166 citations99
US9419003B1Aug 16, 2016

Semiconductor devices and methods of manufacture thereof

TAIWAN SEMICONDUCTOR MFG CO LTD50 citations98
US10276697B1Apr 30, 2019

Negative capacitance FET with improved reliability performance

TAIWAN SEMICONDUCTOR MFG CO LTD19 citations94
US10269965B1Apr 23, 2019

Multi-gate semiconductor device and method for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD15 citations94
US9634091B2Apr 25, 2017

Silicon and silicon germanium nanowire formation

TAIWAN SEMICONDUCTOR MFG CO LTD28 citations94
US9614086B1Apr 4, 2017

Conformal source and drain contacts for multi-gate field effect transistors

TAIWAN SEMICONDUCTOR MFG CO LTD27 citations94
US9478624B2Oct 25, 2016

Self-aligned wrapped-around structure

TAIWAN SEMICONDUCTOR MFG CO LTD31 citations94
US9425324B2Aug 23, 2016

Semiconductor device and channel structure thereof

TAIWAN SEMICONDUCTOR MFG CO LTD38 citations94
US10163729B2Dec 25, 2018

Silicon and silicon germanium nanowire formation

TAIWAN SEMICONDUCTOR MFG CO LTD14 citations93
US9941374B2Apr 10, 2018

Contacts for highly scaled transistors

TAIWAN SEMICONDUCTOR MFG CO LTD10 citations93
US9935016B2Apr 3, 2018

Silicon and silicon germanium nanowire formation

TAIWAN SEMICONDUCTOR MFG CO LTD15 citations93
US9754840B2Sep 5, 2017

Horizontal gate-all-around device having wrapped-around source and drain

TAIWAN SEMICONDUCTOR MFG CO LTD18 citations93
US9691695B2Jun 27, 2017

Monolithic 3D integration inter-tier vias insertion scheme and associated layout structure

TAIWAN SEMICONDUCTOR MFG CO LTD13 citations93
US9660107B1May 23, 2017

3D cross-bar nonvolatile memory

TAIWAN SEMICONDUCTOR MFG CO LTD14 citations93
US9559181B2Jan 31, 2017

Structure and method for FinFET device with buried sige oxide

TAIWAN SEMICONDUCTOR MFG CO LTD20 citations93
US9508858B2Nov 29, 2016

Contacts for highly scaled transistors

TAIWAN SEMICONDUCTOR MFG CO LTD11 citations93
US11716859B2Aug 1, 2023

Memory device, semiconductor device, and method of fabricating semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD8 citations85
US11276763B2Mar 15, 2022

Contacts for highly scaled transistors

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US10943833B2Mar 9, 2021

Silicon and silicon germanium nanowire formation

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10930795B2Feb 23, 2021

Nanowire stack GAA device with inner spacer and methods for producing the same

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10497792B2Dec 3, 2019

Contacts for highly scaled transistors

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US10269901B2Apr 23, 2019

Semiconductor liner of semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10191694B2Jan 29, 2019

3D cross-bar nonvolatile memory

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US10170404B2Jan 1, 2019

Monolithic 3D integration inter-tier vias insertion scheme and associated layout structure

TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US10164033B2Dec 25, 2018

Conformal source and drain contacts for multi-gate field effect transistors

TAIWAN SEMICONDUCTOR MFG CO LTD12 citations84

TAIWAN SEMICONDUCTOR MFG

15 patents
US9209247B2Dec 8, 2015

Self-aligned wrapped-around structure

TAIWAN SEMICONDUCTOR MFG782 citations99
US6391752B1May 21, 2002

Method of fabricating a silicon-on-insulator semiconductor device with an implanted ground plane

TAIWAN SEMICONDUCTOR MFG159 citations99
US6359311B1Mar 19, 2002

Quasi-surrounding gate and a method of fabricating a silicon-on-insulator semiconductor device with the same

TAIWAN SEMICONDUCTOR MFG179 citations99
US9184269B2Nov 10, 2015

Silicon and silicon germanium nanowire formation

TAIWAN SEMICONDUCTOR MFG39 citations98
US9006786B2Apr 14, 2015

Fin structure of semiconductor device

TAIWAN SEMICONDUCTOR MFG48 citations98
US7834345B2Nov 16, 2010

Tunnel field-effect transistors with superlattice channels

TAIWAN SEMICONDUCTOR MFG57 citations98
US6500739B1Dec 31, 2002

Formation of an indium retrograde profile via antimony ion implantation to improve NMOS short channel effect

TAIWAN SEMICONDUCTOR MFG137 citations95
US9224736B1Dec 29, 2015

Structure and method for SRAM FinFET device

TAIWAN SEMICONDUCTOR MFG20 citations93
US9006842B2Apr 14, 2015

Tuning strain in semiconductor devices

TAIWAN SEMICONDUCTOR MFG26 citations93
US7141459B2Nov 28, 2006

Silicon-on-insulator ULSI devices with multiple silicon film thicknesses

TAIWAN SEMICONDUCTOR MFG24 citations93
US6673683B1Jan 6, 2004

Damascene gate electrode method for fabricating field effect transistor (FET) device with ion implanted lightly doped extension regions

TAIWAN SEMICONDUCTOR MFG42 citations92
US6582995B2Jun 24, 2003

Method for fabricating a shallow ion implanted microelectronic structure

TAIWAN SEMICONDUCTOR MFG22 citations92
US6380021B1Apr 30, 2002

Ultra-shallow junction formation by novel process sequence for PMOSFET

TAIWAN SEMICONDUCTOR MFG49 citations92
US6368928B1Apr 9, 2002

Method of forming an indium retrograde profile via use of a low temperature anneal procedure to reduce NMOS short channel effects

TAIWAN SEMICONDUCTOR MFG33 citations89
US6194285B1Feb 27, 2001

Formation of shallow trench isolation (STI)

TAIWAN SEMICONDUCTOR MFG35 citations89

TEXAS INSTRUMENTS INC

3 patents

HEWLETT PACKARD CO

2 patents

Showing the top 50 of 258 patents by PatentIndex Score.