Inventor

SOMEYA YASUNOBU

JP27 patents

⚠️ This page may combine multiple inventors who share the name “SOMEYA YASUNOBU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SOMEYA YASUNOBU

NISSAN CHEMICAL IND LTD

Diarylamine novolac resin

Resist underlayer film forming composition containing phenylindole-containing novolac resin

Method for roughening surface using wet treatment

Resist underlayer film forming composition for lithography containing polyether structure-containing resin

Resist underlayer film forming composition that contains novolac resin having polynuclear phenol

Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring

Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography process

Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure

Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resin

Bottom layer film-forming composition of self-organizing film containing styrene structure

Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure

Bottom layer film-formation composition of self-organizing film containing polycyclic organic vinyl compound

Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure

NISSAN CHEMICAL CORP

Upper-layer film forming composition and method for producing a phase-separated pattern

Resist underlayer film forming composition having a disulfide structure

Protective film forming composition having an acetal structure

Self-organized film-forming composition for use in forming a micro-phase-separated pattern

Resist underlayer film-forming composition containing alicyclic compound-terminated polymer

Resist underlayer film-forming composition and method for forming resist pattern using the same

Protective film forming composition having a diol structure

Method for manufacturing semiconductor substrate having group-III nitride compound layer

Composition for forming coating film and method for manufacturing semiconductor device

Underlayer film-forming composition for use in forming a microphase-separated pattern

Composition for forming block copolymer layer for formation of microphase-separated pattern

SHINJO TETSUYA

Composition for forming a resist underlayer film including hydroxyl group-containing carbazole novolac resin

Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin

SOMEYA YASUNOBU

Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure