Inventor

SAKAMOTO RIKIMARU

JP101 patents

⚠️ This page may combine multiple inventors who share the name “SAKAMOTO RIKIMARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAKAMOTO RIKIMARU

NISSAN CHEMICAL IND LTD

Diarylamine novolac resin

Resist underlayer film forming composition containing phenylindole-containing novolac resin

Condensation type polymer-containing anti-reflective coating for semiconductor

Anti-reflective coating forming composition for lithography containing polymer having ethylenedicarbonyl structure

Composition for forming anti-reflective coating for use in lithography

Composition for forming resist underlayer film for EUV lithography

Resist underlayer film-forming composition containing indolocarbazole novolak resin

Resist underlayer film-forming composition containing novolac resin reacted with aromatic methylol compound

Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group

Method for roughening surface using wet treatment

Coating composition for pattern reversal on soc pattern

Underlayer film-forming composition for self-assembled films

Resist underlayer film forming composition that contains novolac resin having polynuclear phenol

Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring

Resist underlayer film forming composition

Composition for forming highly adhesive resist underlayer film

Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same

Resist underlayer film-forming composition and method for forming resist pattern using the same

Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same

Silicon-containing EUV resist underlayer film-forming composition including additive

Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography process

Anti-reflective coating containing sulfur atom

Resist underlayer film-forming composition containing substituted crosslinkable compound

Resist underlayer film-forming composition containing indolocarbazole novolak resin

Resist underlayer film-forming composition containing novolac polymer having secondary amino group

Photocrosslinkable group-containing composition for coating stepped substrate

Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonate

Composition for coating resist pattern

Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group

Resist underlayer film-forming composition including a compound having an amino group protected with a tert-butoxycarbonyl group

Resist underlayer film-forming composition

Resist underlayer film-forming composition

Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same

Composition for forming anti-reflective coating for use in lithography

Composition for forming anti-reflective coating

Silicon-containing EUV resist underlayer film forming composition

NISSAN CHEMICAL CORP

Photocurable composition and method for producing semiconductor device

Upper-layer film forming composition and method for producing a phase-separated pattern

Photocurable composition and method for producing semiconductor device

Resist underlayer film-forming composition

Method for producing resist pattern coating composition with use of solvent replacement method

Resist underlayer film forming composition containing triaryldiamine-containing novolac resin

Self-organized film-forming composition for use in forming a micro-phase-separated pattern

Resist underlayer film-forming composition comprising polymer having structural unit having urea linkage

HOYA CORP

Resist underlayer coating forming composition for mask blank, mask blank and mask

Mask blank and transfer mask

SAKAMOTO RIKIMARU

Composition for forming resist underlayer film with reduced outgassing

Resist underlayer film forming composition, and method for forming resist pattern using the same

HIROI YOSHIOMI

Composition containing hydroxylated condensation resin for forming resist underlayer film

ENOMOTO TOMOYUKI

Resist underlayer film forming composition for electron beam lithography